Method of tuning BAW resonators

• US 6,476,536 B1
• Filed: 04/27/2001
• Issued: 11/05/2002
• Est. Priority Date: 04/27/2001
• Status: Expired due to Term

• Current Assignee: Avago Technologies International Sales Pte Limited (Broadcom, Inc.)
• Original Assignee: Nokia Corporation
• Inventors: Pensala, Tuomas
• Primary Examiner(s): Dougherty, Thomas M.
• Application Number:
  US09/845,089
• Publication Number:
  US 20020158716A1
• Time in Patent Office: 557 Days
• Field of Search: 310/312, 310/313.R, 310/365
• US Class Current: 310/312
• CPC Class Codes: H03H 3/013 for obtaining desired frequency or temperature coefficient H03H3/0076 H03H3/04, H03H3/10 take precedence

Abstract

A method of tuning a bulk acoustic wave device having a piezoelectric layer formed between a top electrode and a bottom electrode, wherein the top electrode has a frame-like structure at an edge portion for reducing spurious resonance in the electrical response of the device. The frame-like structure surrounds a center zone of the top electrode. In order to down-shift the resonance frequency of the device, a tuning layer is provided on the top electrode. In particular, the tuning layer is designed such that it covers at least the entire center zone in order to reduce the spurious resonance introduced by the tuning layer itself. Preferably, the tuning layer covers the center zone as well as the frame-like structure to further reduce the spurious resonance.

Claims

1. A method of tuning a bulk acoustic wave device comprising a substrate and a plurality of acoustic wave generating and controlling layers formed on the substrate, wherein the acoustic wave generating and controlling layers include a piezoelectric layer formed between a first electrode and a second electrode for generating piezoelectrically excited acoustic signals, wherein the first electrode has a frame-like structure at an edge portion of the first electrode for reducing spurious resonance components in the acoustic waves, and the frame-like structure surrounds a center zone having a surface area, and wherein the device has a resonance frequency which can be down-shifted by modifying the first electrode, said method comprises the step of providing a tuning layer on top of the first electrode for modifying the first electrode such that the tuning layer covers at least the surface area of the center zone for reducing spurious resonance resulting from the tuning layer, wherein said tuning layer covers at least part of the frame-like structure.

3. The method of claim 1, wherein the first electrode is made from a first material, and said tuning layer is made from a second material different from the first material.

4. The method of claim 1, wherein the first electrode and said tuning layer are made from the same material.

5. The method of claim 1, wherein the tuning layer is made from an electrically conducting material.

6. The method of claim 1, wherein the tuning layer is made from an electrically non-conducting material.

2. A method of tuning a bulk acoustic wave device comprising a substrate and a plurality of acoustic wave generating and controlling layers formed on the substrate, wherein the acoustic wave generating and controlling layers include a piezoelectric layer formed between a first electrode and a second electrode for generating piezoelectrically excited acoustic signals, wherein the first electrode has a frame-like structure at an edge portion of the first electrode for reducing spurious resonance components in the acoustic waves, and the frame-like structure surrounds a center zone having a surface area, and wherein the device has a resonance frequency which can be down-shifted by modifying the first electrode, said method comprises the step of providing a tuning layer on top of the first electrode for modifying the first electrode such that the tuning layer covers at least the surface area of the center zone for reducing spurious resonance resulting from the tuning layer, wherein said tuning layer covers substantially all of the frame-like structure.

7. A bulk acoustic wave device comprising a substrate and a plurality of acoustic wave generating and controlling layers formed on the substrate, wherein the acoustic wave generating and controlling layers include a piezoelectric layer formed between a first electrode and a second electrode for generating piezoelectrically excited acoustic signals, wherein the first electrode has a frame-like structure at an edge portion of the first electrode for reducing spurious resonance components in the acoustic signals and the frame-like structure surrounds a center zone having a surface area, and wherein the device has a resonance frequency which can be down-shifted by modifying the first electrode, said device comprising a tuning layer provided on top of the first electrode for modifying the first electrode such that the tuning layer covers at least the surface area of the center zone, wherein said tuning layer covers at least part of the frame-like structure as well as the surface area of the center zone.

9. The device of claim 7, further comprising a passivation layer covering part of the piezoelectric layer for protecting said device, wherein at least part of the passivation layer is formed between the piezolectric layer and the frame-like structure, and wherein the frame-like structure is formed between said at least part of the passivation layer and said tuning layer.

8. A bulk acoustic wave device comprising a substrate and a plurality of acoustic wave generating and controlling layers formed on the substrate, wherein the acoustic wave generating and controlling layers include a piezoelectric layer formed between a first electrode and a second electrode for generating piezoelectrically excited acoustic signals, wherein the first electrode has a frame-like structure at an edge portion of the first electrode for reducing spurious resonance components in the acoustic signals and the frame-like structure surrounds a center zone having a surface area, and wherein the device has a resonance frequency which can be down-shifted by modifying the first electrode, said device comprising a tuning layer provided on top of the first electrode for modifying the first electrode such that the tuning layer covers at least the surface area of the center zone, wherein said tuning layer covers substantially all of the frame-like structure as well as the surface area of the center zone.