Apparatus and method for contacting a conductive layer
First Claim
1. A method of forming an electrostatic discharge device contact comprising the steps of:
- forming a pad on a substrate;
forming a composite protective layer between and over conductive plates and over and around the pad, wherein the protective layer isolates the conductive plates and pad and protects them from damage, and wherein the protective layer comprises a dielectric region underlying an electrostatic discharge region extending partially over the pad;
patterning a photoresist over the electrostatic discharge region, wherein the photoresist pattern partially covers the electrostatic discharge region; and
etching an opening through the protective layer and adjacent the electrostatic discharge region, wherein the photoresist and the electrostatic discharge region serve as masks during etching through a portion of the protective layer below the electrostatic discharge region, thereby forming the opening to the pad.
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Abstract
A structure and method for creating a contact between a conductive layer and a pad for dissipating electrostatic charges comprising the steps of, forming a pad and a composite insulating layer between and over conductive plates on a substrate, wherein the insulating layer isolates and protects the conductive plates and pad from damage, the insulating layer comprising a dielectric region underlying a conductive layer. A passivation layer is formed over at least a portion of the conductive layer and a photoresist is patterned over at least a portion of the passivation. An opening is etched through the passivation and the insulating layers, wherein the photoresist and the conductive layer serve as masks. Finally, a conductive material is deposited in the opening to form an electrical contact between the pad and the conductive layer.
39 Citations
36 Claims
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1. A method of forming an electrostatic discharge device contact comprising the steps of:
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forming a pad on a substrate;
forming a composite protective layer between and over conductive plates and over and around the pad, wherein the protective layer isolates the conductive plates and pad and protects them from damage, and wherein the protective layer comprises a dielectric region underlying an electrostatic discharge region extending partially over the pad;
patterning a photoresist over the electrostatic discharge region, wherein the photoresist pattern partially covers the electrostatic discharge region; and
etching an opening through the protective layer and adjacent the electrostatic discharge region, wherein the photoresist and the electrostatic discharge region serve as masks during etching through a portion of the protective layer below the electrostatic discharge region, thereby forming the opening to the pad. - View Dependent Claims (2, 3, 4, 5, 6, 7)
forming a passivation layer over the dielectric region and the electrostatic discharge region.
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3. The method of claim 2, further comprising the step of:
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patterning a photoresist on the passivation layer, wherein the photoresist pattern partially covers the electrostatic discharge region; and
etching an opening through the passivation layer and the insulating layer, wherein the photoresist and the electrostatic discharge region serve as masks during a subsequent etch step.
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4. The method of claim 1, further comprising the step of:
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etching an opening through the protective layer to the pad; and
depositing a conductive material in the opening to form an electrical contact between the pad and the electrostatic discharge region.
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5. The method of claim 4, wherein the conductive material comprises a conductive polymer.
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6. The method of claim 4, wherein the conductive material comprises a wire bond.
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7. The method of claim 4, wherein the conductive material comprises solder.
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8. A method of forming an electrostatic discharge device contact comprising the steps of:
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forming a pad on a substrate;
depositing a composite protective layer between and over conductive plates and over and arround the pad, wherein the protective layer isolates the conductive plates and pad and protects them from damage, and wherein the protective layer comprises a dielectric region underlying a conductive layer;
forming a passivation layer over at least a portion of the conductive layer;
patterning a photoresist over at least a portion of the passivation layer and the conductive layer;
etching an opening through the passivation layer, the conductive layer and the protective layer, wherein the photoresist and the conductive layer serve as masks during etching through the protective layer; and
depositing a conductive material in the opening to form an electrical contact between the pad and the conductive layer. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36)
forming a composite passivation layer disposed over at least a portion of the dielectric layer.
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34. The method of claim 33, wherein the passivation layer comprises silicon carbide.
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35. The method of claim 33, wherein the passivation layer comprises silicon nitride.
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36. The method of claim 33, wherein the passivation layer has a thickness of between approximately 2,000 and 3,000 angstroms.
Specification