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Transparent phase shift mask for fabrication of small feature sizes

  • US 6,479,194 B1
  • Filed: 02/07/2000
  • Issued: 11/12/2002
  • Est. Priority Date: 02/07/2000
  • Status: Expired due to Term
First Claim
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1. A mask comprising:

  • an opaque region;

    a first clear region, said first clear region being adjacent to said opaque region;

    a second clear region contiguous to a first side of said first clear region, said second clear region causing a phase shift in light passing through said second clear region by 180 degrees relative to a phase of light passing through said first clear region;

    a third clear region contiguous to a second side of said first clear region, said third clear region causing a phase shift in light passing through said third clear region by 180 degrees relative to said phase of light passing through said first clear region;

    said first, second, and third clear regions causing destructive interference of light passing through said first, second, and third clear regions.

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