Transparent phase shift mask for fabrication of small feature sizes

• US 6,479,194 B1
• Filed: 02/07/2000
• Issued: 11/12/2002
• Est. Priority Date: 02/07/2000
• Status: Expired due to Term

• Current Assignee: Newport Fab, LLC (Tower Semiconductor Limited)
• Original Assignee: Conexant Systems Incorporated (Synaptics Incorporated)
• Inventors: Talor, George Jr.
• Primary Examiner(s): ROSASCO, STEPHEN D
• Application Number:
  US09/499,244
• Time in Patent Office: 1,009 Days
• Field of Search: 430/5, 716/19, 716/21, 250/492.22, 250/492.2
• US Class Current: 430/5
• CPC Class Codes: G03F 1/26 Phase shift masks [PSM]; PSM blanks; Preparation thereof
• CPC Class Codes: G03F 1/30 Alternating PSM, e.g. Levenson-Shibuya PSM; Preparation thereof
• CPC Class Codes: G03F 1/34 Phase-edge PSM, e.g. chromeless PSM; Preparation thereof

Abstract

A resolution enhancement phase shift mask is disclosed. In one embodiment, a first clear region and second and third clear regions on each side of the first clear region and contiguous to the first clear region are used. All of the clear regions can be made of quartz. The second and third clear regions have an equal thickness. However, both the second and third clear regions are thinner than the first clear region. The difference in thickness between the first clear region and the second and third clear regions is calculated to cause a 180 degree phase shift in light passing through the second and third clear regions relative to light passing through the first clear region. The destructive interference caused at the phase boundaries of the first clear region and the second and third clear regions results in a dark unexposed area on the surface of an underlying photoresist layer; the dark unexposed area having geometry and dimensions corresponding to the geometry and dimensions of the first clear region. In this embodiment, a single mask, single exposure technique is used. The single mask comprises regions such as the first, second, and third clear regions referred to above for producing a desired image of small feature sizes on an underlying photoresist layer. For large features, an opaque material such as chrome can be used in the invention'"'"'s mask.

Claims

1. A mask comprising:

an opaque region;

a first clear region, said first clear region being adjacent to said opaque region;

a second clear region contiguous to a first side of said first clear region, said second clear region causing a phase shift in light passing through said second clear region by 180 degrees relative to a phase of light passing through said first clear region;

a third clear region contiguous to a second side of said first clear region, said third clear region causing a phase shift in light passing through said third clear region by 180 degrees relative to said phase of light passing through said first clear region;

said first, second, and third clear regions causing destructive interference of light passing through said first, second, and third clear regions.

2. The mask of claim 1 wherein said first clear region is a rectangle having first and second long sides and first and second short sides, and wherein said first long side is said first side of said first clear region and said second long side is said second side of said first clear region.

3. The mask of claim 2 wherein said first and second short sides of said rectangle are substantially equal to a smallest feature size in a semiconductor fabrication process.

4. The mask of claim 1 wherein said destructive interference of light passing through said first, second, and third regions produces an image corresponding to a first geometry and a first plurality of dimensions of said first region.

5. The mask of claim 4 wherein said image is a line having a width equal to a smallest feature size in a semiconductor fabrication process.

6. The mask of claim 1 wherein said first, second, and third regions are made of quartz.

7. The mask of claim 1 wherein said opaque region comprises chrome.

8. A method for making a mask, said method comprising the steps of:

forming an opaque region;

designating a first clear region as a region of 0 degree phase shift, said first clear region having a first geometry and a first plurality of dimensions, said first clear region being adjacent to said opaque region, said first clear region and said opaque region being surrounded by a second clear region designated as a region of 180 degree phase shift;

reducing a thickness of said second clear region so as to cause light passing through said second clear region to undergo a phase shift of 180 degrees relative to light passing through said first clear region;

said first and second clear regions causing destructive interference of said light passing through said first and second clear regions.

9. The method of claim 8 wherein said designating step comprises depositing and patterning a layer of photoresist so as to cause photoresist having substantially said first geometry and said first plurality of dimensions to remain on said mask.

10. The method of claim 8 wherein said first and second clear regions are made of quartz.

11. The mask of claim 8 wherein said opaque region comprises chrome.

12. A method for making a mask, said method comprising the steps of:

depositing a layer comprised of a substantially opaque material on a plate of substantially clear material;

designating a first region of said layer as corresponding to a non-phase shift region on said plate, designating a second region of said layer as corresponding to a phase shift region on said plate, and designating a third region of said layer as an opaque region on said plate;

etching said layer so as to cause said substantially opaque material to be removed from said second region of said layer;

reducing a thickness of said plate of substantially clear material in said phase shift region of said plate;

removing said substantially opaque material from said first region of said layer;

said phase shift and non-phase shift regions causing destructive interference of light passing through said phase shift and non-phase shift regions.

13. The method of claim 12 wherein said second region of said layer is contiguous to and surrounds said first region and said third region.

14. The method of claim 12 wherein said substantially opaque material is comprised of chrome.

15. The method of claim 12 wherein said substantially clear material is comprised of quartz.

16. The method of claim 12 wherein said phase shift region causes a phase shift of 180 degrees in light passing through said phase shift region.

17. The method of claim 12 wherein said non-phase shift region is a rectangle having first and second long sides and first and second short sides, and wherein said first and second short sides of said rectangle are substantially equal to a smallest feature size in a semiconductor fabrication process.

18. The method of claim 12 wherein said destructive interference of light passing through said phase shift and non-phase shift regions produces an image corresponding to a first geometry and a first plurality of dimensions of said non-phase shift region.

19. The method of claim 18 wherein said image is a line having a width substantially equal to a smallest feature size in a semiconductor fabrication process.

20. A method of using a mask, said method comprising the steps of:

creating a first image in a first exposure using a first mask, said first image including an unexposed line, first and second exposed regions, and an unexposed region, said unexposed line caused by destructive interference of light passing through first and second clear phase shift regions and a clear non-phase shift region of said first mask, said first and second exposed regions, respectively, corresponding to first and second clear phase shifts regions of said first mask, said unexposed region corresponding to an opaque region of said first mask;

creating a second image in a second exposure using a second mask, said second image including first and second unexposed regions, said first unexposed region corresponding to a first opaque region of said second mask, said first unexposed region of said second image being situated within said unexposed region of said first image, said second unexposed region corresponding to a second opaque region of said second mask, said second unexposed region of said second image covering said unexposed line of said first image;

said first and second exposures forming a pattern, said pattern including said first unexposed region of said second image and said unexposed line of said first image.

21. The method of claim 20 wherein said pattern is formed on a layer of photoresist situated on a semiconductor wafer.

22. The method of claim 20 wherein said unexposed line corresponds to a geometry and a plurality of dimensions of said clear non-phase shift region.

23. The method of claim 20 wherein said first and second clear phase shift regions cause a phase shift of 180 degrees in light passing through said first and second clear phase shift regions.

24. The method of claim 20 wherein said first and second clear phase shift regions and said clear non-phase shift region are comprised of quartz.

25. The method of claim 20 wherein said opaque region of said first mask and said first and second opaque regions of said second mask are comprised of chrome.