Stage mechanism, exposure apparatus and device manufacturing method in which a coil unit of a driving mechanism is moved substantially in synchronism with a stage

• US 6,479,991 B1
• Filed: 04/01/1999
• Issued: 11/12/2002
• Est. Priority Date: 04/01/1998
• Status: Expired due to Fees

• Current Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Original Assignee: Canon Kabushiki Kaisha (Canon Inc.)
• Inventors: Korenaga, Nobushige
• Primary Examiner(s): Snow, Walter E.
• Application Number:
  US09/283,191
• Time in Patent Office: 1,321 Days
• Field of Search: 324/226, 324/228, 324/207.11, 324/262, 355/53, 744/71.XY, 318/653, 318/652
• US Class Current: 324/226
• CPC Class Codes: G03F 7/70758 Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Abstract

A stage system includes a movable stage, a first driving mechanism, having magnet and a coil unit, for moving the stage along a predetermined direction, the coil unit including a coil and a yoke, wherein the magnet is connected to the stage side, and a second driving mechanism for moving the coil unit along the predetermined direction. While a position or a speed of the stage is controlled as the stage is driven through the first driving mechanism, the coil unit is moved substantially in synchronism with the stage.

Claims

1. A stage system, comprising:

a movable stage;

a first driving mechanism, having a magnet and a coil unit, for moving said stage along a predetermined direction, said coil unit including a coil and a yoke, wherein said magnet is connected to the stage side; and

a second driving mechanism for moving said coil unit along the predetermined direction,

wherein, while a position or a speed of said stage is controlled as said stage is driven through said first driving mechanism, said coil unit is moved substantially in synchronism with said stage.

2. A stage system according to claim 1, wherein said second driving mechanism includes a feed screw.

3. A stage system according to claim 1, wherein said second driving mechanism includes a linear motor.

4. A stage system according to claim 1, wherein said magnet and said coil have substantially the same size with respect to the movement direction.

5. A stage system according to claim 1, wherein said yoke comprises a ferromagnetic material of a flat plate shape.

6. A stage system according to claim 1, wherein said coil is wound around said yoke.

7. A stage system according to claim 1, wherein said coil comprises a flat coil.

8. A stage system according to claim 1, wherein said first driving mechanism includes a plurality of coils.

9. A stage system according to claim 1, wherein said first driving mechanism moves said stage two-dimensionally.

10. A stage system according to claim 1, wherein said coil comprises a first coil for producing a driving force in a first direction with respect to said magnet, and a second coil for producing a driving force in a second direction with respect to said magnet.

11. A stage system according to claim 1, wherein said second driving mechanism is operable to move, two-dimensionally, one of said magnet and said coil of said first driving mechanism as connected to said second driving mechanism.

12. A stage system according to claim 1, wherein said yoke has a recess formed in a peripheral portion thereof.

17. An exposure apparatus according to claim 1, wherein said second driving mechanism includes a linear motor.

13. An exposure apparatus, comprising:

a stage being movable while holding one of a wafer and a reticle thereon;

a first driving mechanism, having a magnet and a coil unit, for moving said stage along a predetermined direction, said coil unit including a coil and a yoke, wherein said magnet is connected to the stage side; and

a second driving mechanism for moving said coil unit along the predetermined direction,

wherein, while a position or a speed of said stage is controlled as said stage is driven through said first driving mechanism, said coil unit is moved substantially in synchronism with said stage.

14. A device manufacturing method, comprising the steps of:

providing an exposure apparatus as recited in claim 13; and

transferring a pattern of a reticle into a wafer.

15. A method according to claim 14 further comprising:

applying a photosensitive material to the wafer before exposure; and

developing the wafer after the exposure.

18. An exposure apparatus according to claim 13, wherein said magnet and said coil have substantially the same size with respect to the movement direction.

19. An exposure apparatus according to claim 13, wherein said yoke comprises a ferromagnetic material of a flat plate shape.

20. An exposure apparatus according to claim 13, wherein said coil is wound around said yoke.

21. An exposure apparatus according to claim 13, wherein said coil comprises a flat coil.

22. An exposure apparatus according to claim 13, wherein said first driving mechanism includes a plurality of coils.

23. An exposure apparatus according to claim 13, wherein said first driving mechanism moves said stage two-dimensionally.

24. An exposure apparatus according to claim 13, wherein said coil comprises a first coil for producing a driving force in a first direction with respect to said magnet, and a second coil for producing a driving force in a second direction with respect to said magnet.

25. An exposure apparatus according to claim 13, wherein said second driving mechanism is operable to move, two-dimensionally, one of said magnet and said coil of said first driving mechanism as connected to said second driving mechanism.

26. An exposure apparatus according to claim 13, wherein said yoke has a recess formed in a peripheral portion thereof.

16. An exposure apparatus according to clams 13, wherein said second driving mechanism includes a feed screw.