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Methods involving direct write optical lithography

  • US 6,480,324 B2
  • Filed: 06/14/2001
  • Issued: 11/12/2002
  • Est. Priority Date: 05/29/1998
  • Status: Expired due to Fees
First Claim
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1. An optical lithography system, consisting essentially of:

  • a light source;

    a substrate; and

    a means for dynamically defining a light pattern on a surface of the substrate using unpatterned light from said light source without using a photomask.

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