Diffractive optical element and optical system incorporating the same

• US 6,493,143 B2
• Filed: 04/27/1998
• Issued: 12/10/2002
• Est. Priority Date: 04/30/1997
• Status: Expired due to Fees

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: Kato, Takashi
• Primary Examiner(s): Chang, Audrey
• Assistant Examiner(s): Curtis, Craig
• Application Number:
  US09/067,009
• Publication Number:
  US 20010001583A1
• Time in Patent Office: 1,688 Days
• Field of Search: 359/566, 359/565, 359/356, 359/569, 359/354, 359/708, 359/571, 372/44, 372/45, 372/46
• US Class Current: 359/566
• CPC Class Codes: G02B 27/0043 in projection exposure systems, e.g. microlithographic systems
• CPC Class Codes: G02B 27/4211 correcting chromatic aberrations G02B27/0056, G02B27/4222, G02B27/4227 take precedence
• CPC Class Codes: G02B 5/1866 Transmission gratings characterised by their structure, e.g. step profile, contours of substrate or grooves, pitch variations, materials G02B5/1809, G02B5/1828, G02B5/1833, G02B5/1838 and G02B5/1847 take precedence

Abstract

A diffractive optical element, as well as an optical system incorporating the same, has a comparatively large minimum grating pitch and, hence, is easy to produce. The diffractive optical element has a diffraction grating surface and an aspherical surface formed on an identical substrate or on separate substrates. The pitch of the diffractive grating varies such that it progressively decreases radially outward from the center of the substrate and then kept constant towards the radially outer extremity of the substrate.

Claims

1. A diffractive optical element, comprising:

a substrate; and

a diffraction grating formed on the substrate, the pitch of said diffraction grating varying such that it progressively decreases outward over one region extending outward from a center towards a predetermined position and is then, in another region extending outward from the predetermined position towards the extremity of said diffraction grating, kept substantially constant,

wherein the pitch of said diffraction grating varies according to a spline function as the phase distribution function of said diffractive optical element.

2. A diffractive optical element according to claim 1, wherein a spherical or flat surface is formed in said one region and an aspherical surface is formed in said another region.

3. A diffractive optical element according to claim 1, wherein, in the opposite surface to the surface on which said diffraction grating is formed, a spherical or flat surface is formed in a region corresponding to said one region and an aspherical surface is formed in a region corresponding to said another region.

4. A diffractive optical element according to claim 1, wherein said substrate is transparent.

5. A diffractive optical element according to claim 1, wherein said diffraction grating is a binary-type grating.

6. An optical system comprising:

a diffractive optical element according to claim 1.

7. An exposure apparatus comprising:

an optical system according to claim 1, wherein a device pattern is transferred on a wafer by the light through said optical system.

8. A process for producing a device, comprising the steps of:

transferring a device pattern onto a resist on the wafer through the exposure apparatus of claim 7; and

developing the wafer.

9. An optical system comprising:

a first substrate having a diffraction grating, the pitch of said diffraction grating varying such that it progressively decreases outward over one region extending outward from a center towards a predetermined position and is then, in another region extending outward from the predetermined position towards the extremity of said diffraction grating, kept substantially constant; and

a second substrate having a surface which comprises an aspherical surface formed in a region corresponding to said another region and a spherical or flat surface formed in a region corresponding to said one region,

wherein the pitch of said diffraction grating varies according to a spline function as the phase distribution function of said diffractive optical element.

10. An optical system according to claim 9, wherein said substrate is transparent.

11. An optical system according to claim 9, wherein said diffraction grating is a binary-type grating.

12. An exposure apparatus comprising:

an optical system according to claim 9,

wherein a device pattern is transferred on a wafer by the light through said optical system.

13. A process for producing a device, comprising the steps of:

transferring a device pattern onto a resist on the wafer through the exposure apparatus of claim 12; and

developing the wafer.