Transparent substrate with antireflection coating
First Claim
1. A process for producing a coated glass, the process comprisingdepositing a first dielectric material layer on a glass substrate by pyrolysis of dielectric material precursors;
- cathodically sputtering a second dielectric material layer on the first dielectric material layer;
forming the coated glass; and
heating the coated glass to a temperature at of least 550°
C., wherein the coated glass comprises the glass substrate; and
an antireflection coating on at least one surface of the substrate, where the coating is a stack of dielectric material layers having alternating high and low refractive indices, and at least one of the layers is a shield layer which prevents diffusion of alkali metal ions from the substrate through the shield layer.
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Abstract
The invention relates to a glass substrate having on at least one of its faces an antireflection coating formed by a stack of thin dielectric material layers having alternately high and low refractive indices. To prevent the modification of the optical properties of the coating in the case where the substrate is subject toga heat treatment such as tempering, bending or annealing, the layer or layers of the stack which are liable to deteriorate on contact with alkali ions such as sodium ions are separated form the substrate by at least one layer forming part of the antireflection coating and forming a “shield” with respect to the diffusion of alkali.
47 Citations
7 Claims
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1. A process for producing a coated glass, the process comprising
depositing a first dielectric material layer on a glass substrate by pyrolysis of dielectric material precursors; -
cathodically sputtering a second dielectric material layer on the first dielectric material layer;
forming the coated glass; and
heating the coated glass to a temperature at of least 550°
C., whereinthe coated glass comprises the glass substrate; and
an antireflection coating on at least one surface of the substrate, where the coating is a stack of dielectric material layers having alternating high and low refractive indices, and at least one of the layers is a shield layer which prevents diffusion of alkali metal ions from the substrate through the shield layer. - View Dependent Claims (2, 3, 4, 5, 6, 7)
the shield layer is a low refractive index dielectric material layer selected from the group consisting of SiO2, Al2O3, Al2O3: - F and mixtures thereof; and
the coated glass further comprises a high refractive index dielectric material layer between the glass substrate and the shield layer.
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5. The process according to claim 1, wherein
the shield layer is a high refractive index dielectric material layer; - and
the shield layer has an optical thickness of 25 nm to 60 nm.
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6. The process according to claim 1, wherein the high refractive index dielectric material layer and the shield layer is selected from the group consisting of tin oxide, doped tin oxide, zinc oxide, tantalum oxide and zirconium oxide.
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7. The process according to claim 1, wherein
the antireflection coating comprises, in order outward from the glass substrate, a high refractive index layer directly on the glass substrate; -
a first low refractive index layer, serving as the shield layer, including SiO2 or a mixture of SiO2 and Al2O3;
a layer including Nb2O5; and
a second low refractive index layer including SiO2 or a mixture of SiO2 and Al2O3.
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Specification