Semiconductor wafer holder

• US 6,497,403 B2
• Filed: 12/28/2000
• Issued: 12/24/2002
• Est. Priority Date: 12/28/2000
• Status: Expired due to Fees

• Current Assignee: Intel Corporation, SunEdison, Inc.
• Original Assignee: SunEdison, Inc.
• Inventors: Ries, Michael J.
• Primary Examiner(s): Hail, III, Joseph J.
• Assistant Examiner(s): SHANLEY, DANIEL G
• Application Number:
  US09/751,897
• Publication Number:
  US 20020084566A1
• Time in Patent Office: 726 Days
• Field of Search: 269/266, 269/289.R, 269/315, 269/303, 269/309, 269/310, 269/900, 269/903, 269/290, 269/291, 269/317, 269/53, 269/54.4
• US Class Current: 269/266
• CPC Class Codes: H01L 21/68742 characterised by a lifting arrangement, e.g. lift pins
• CPC Class Codes: H01L 21/6875 characterised by a plurality of individual support members, e.g. support posts or protrusions

Abstract

A holder for holding a semiconductor wafer for treatment in wafer treating apparatus including a plurality of supports for generally point support of the wafer at a plurality of points on the wafer. Each support bears a fraction of weight of the wafer and is movable up and down and subject to force biasing it to move upward. The total of the forces exerted on the supports biasing them upward is adapted to counterbalance the weight of the wafer.

Claims

1. The combination of a semiconductor wafer and a holder for holding the semiconductor wafer for treatment in wafer treating apparatus, said holder comprising a plurality of supports for generally point support of the wafer at a plurality of points on the wafer, each support bearing a fraction of weight of the wafer and made of material capable of withstanding high temperatures, each support being movable up and down on a fixed lower member and subject to force biasing it to move upward, the total of the forces exerted on the supports biasing them upward being adapted to counterbalance the weight of the wafer.

2. A holder as set forth in claim 1 wherein each support is resiliently yieldable downwardly against the respective upwardly biasing force.

3. A holder as set forth in claim 1 wherein the upwardly biasing force on each support is established by a flow of pressurized gas.

4. A method of operating the holder set forth in claim 1 to raise or lower the wafer resting thereon comprising increasing or decreasing the biasing force on each support.

5. A method of operating the holder set forth in claim 1 comprising raising the supports to facilitate delivery of the wafer to the holder and to facilitate removal of the wafer from the holder.

6. A holder as set forth in claim 1 wherein the supports are made of quartz.

7. A holder as set forth in claim 1 wherein the supports are arranged such that there is open space between adjacent supports.

8. A holder for holding a semiconductor wafer for treatment in a wafer treating apparatus, said holder comprising:

a plurality of wafer rests for the resting of the wafer thereon, each rest being extensible up and down and comprising;

a lower elongate member fixed in generally vertically extending position, and

a generally vertically extending cylinder constituting a wafer-holding pin including a lower end receiving the lower elongate member and slidable up and down relative to said lower members and an upper closed end having a tapered tip for generally point engagement with a bottom surface of the wafer,

the cylinders providing at their upper ends for generally point support of the wafer at a plurality of points distributed around the bottom of the wafer, each cylinder bearing a fraction of the weight of the wafer, and a system for flow of gas under pressure into and out of each cylinder for establishing an upwardly biasing force on each cylinder,

the total of the forces exerted on the cylinder biasing them upward being adapted to counterbalance the weight of the wafer.

9. A holder as set forth in claim 8 wherein the rests are made of material capable of withstanding high temperatures.

10. A holder as set forth in claim 9 wherein the supports are arranged such that there is open space between adjacent supports.

11. A holder as set forth in claim 10 wherein the rests are made of quartz.

12. A holder as set forth in claim 8 wherein said gas flow system comprises the lower elongate members of the wafer rests, each lower elongate member comprising a tubular member extending into the respective cylinder through the lower end of the cylinder, the cylinder being thereby guided for its said up and down movement, said tubular member being adapted to deliver gas under pressure therethrough.

13. A method of operating the holder set forth in claim 12 to raise or lower the wafer resting on said upper members comprising increasing or decreasing the flow of gas to increase or decrease the force on said upper members.

14. A holder as set forth in claim 8 wherein said gas flow system includes, as to each wafer rest, an outlet for flow of gas out of the respective cylinder at the lower end of the cylinder so that the gas exits in a direction opposite the upper end of each cylinder.

15. A holder as set forth in claim 14 wherein the outlet is a passage between the cylinder and the tubular member.

16. A method of operating the holder set forth in claim 14 to raise or lower the wafer resting on the pins comprising increasing or decreasing the flow of gas to increase or decrease the upward force on said cylinders.

17. A holder as set forth in claim 8 wherein said gas flow system comprises the lower elongate members of the wafer rests, each lower elongate member comprising a tubular member extending into the respective cylinder through the lower end of the cylinder, the cylinder being thereby guided for its said up and down movement, gas under pressure being delivered through said tubular member;

and

wherein said gas flow system includes, as to each wafer rest, an outlet for flow of gas out of the respective cylinder at the lower end of the cylinder.

18. A holder for holding a semiconductor wafer for treatment in wafer treating apparatus, said holder comprising:

a plurality of wafer rests for resting a wafer thereon, each rest being extensible up and down and comprising;

an upper member having an upper end for resting thereon of the wafer, each upper member being movable up and down on a fixed lower member,

said upper members of said rests providing at their upper ends for generally point support of the wafer at a plurality of points,

each upper member bearing a fraction of weight of the wafer, and being subject to force biasing it to move upward relative to the fixed lower member, the total of the forces exerted on the upper members biasing them upward being adapted to counterbalance the weight of the wafer,

the rests being spaced apart and the space between adjacent rests being open.

19. A holder as set forth in claim 18 wherein the rests are made of material capable of withstanding high temperatures.

20. A holder as set forth in claim 18 wherein the rests are made of quartz.

21. A holder as set forth in claim 18 wherein each upper member is constituted by a wafer-holding pin having a pointed upper end for the point support of the wafer at said plurality of points distributed on a bottom surface of the wafer.

22. A holder as set forth in claim 21 wherein each pin is resiliently yieldable downwardly against the respective upwardly biasing force.

23. A holder as set forth in claim 22 wherein the upwardly biasing force on each of the pins is established by flow of gas under pressure between each pin and the respective lower member on which the pin is movable up and down.

24. A holder as set forth in claims 18 wherein as to each of the rests one of said members has a rigid cavity therein and the upwardly biasing force on each of the upper members is provided by flow of gas under pressure into and out of the cavity.

25. A holder as set forth in claims 24 wherein the gas exits each rest in a direction generally opposite the upper end of the rest.

26. A method of operating the holder set forth in claim 18 to raise or lower the wafer resting on said upper members comprising increasing or decreasing the force on said upper members.