Chamber having improved gas energizer and method
First Claim
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1. A chamber capable of processing a substrate, the chamber comprising:
- (a) a gas distributor having an aperture through which gas may be introduced into the chamber;
(b) a wall comprising a window that allows microwave energy to pass through and a thermal conductor having first and second portions, the first portion contacting the window and being in the path of the microwave energy, and the thermal conductor comprising boron nitride or aluminum nitride;
(c) a gas energizer capable of passing microwave energy through the window and thermal conductor of the wall to energize the gas in the chamber; and
(d) a heat sink adapted to remove heat from the window, the heat sink contacting the second portion of the thermal conductor, and the heat sink being substantially out of the path of the microwave energy passed through the window and the thermal conductor.
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Abstract
A chamber 35 for energizing a gas comprises a gas distributor 85 having an aperture 250 for introducing gas into the chamber 35 and a wall 175 comprising boron nitride. The chamber 35 further comprises a gas energizer 90 capable of passing electromagnetic energy through the wall 175 to energize the gas in the chamber 35.
28 Citations
20 Claims
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1. A chamber capable of processing a substrate, the chamber comprising:
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(a) a gas distributor having an aperture through which gas may be introduced into the chamber;
(b) a wall comprising a window that allows microwave energy to pass through and a thermal conductor having first and second portions, the first portion contacting the window and being in the path of the microwave energy, and the thermal conductor comprising boron nitride or aluminum nitride;
(c) a gas energizer capable of passing microwave energy through the window and thermal conductor of the wall to energize the gas in the chamber; and
(d) a heat sink adapted to remove heat from the window, the heat sink contacting the second portion of the thermal conductor, and the heat sink being substantially out of the path of the microwave energy passed through the window and the thermal conductor. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A chamber capable of processing a substrate, the chamber comprising:
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(a) a gas distributor having an aperture through which gas may be introduced into the chamber;
(b) a wall comprising;
(i) a window that allows microwave energy to pass through, and (ii) a thermal conductor comprising boron nitride or aluminum nitride and having first and second portions, at least the first portion bonded to the window and in the path of the microwave energy, and the first portion of the thermal conductor having (1) a dissipation factor for absorbing RF or microwave energy of less than about 10%, (2) an anisotropic thermal conductivity, and (3) a thermal conductivity in one direction of at least about 80 W/mK;
(c) a gas energizer capable of passing microwave energy through the window and thermal conductor to energize the gas in the chamber; and
(d) a heat sink adapted to remove heat from the thermal conductor, the heat sink being substantially out of the path of the microwave energy and bonded to the second portion of the thermal conductor. - View Dependent Claims (15, 16, 17, 18, 19, 20)
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Specification