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Integrated platen assembly for a chemical mechanical planarization system

  • US 6,503,131 B1
  • Filed: 08/16/2001
  • Issued: 01/07/2003
  • Est. Priority Date: 08/16/2001
  • Status: Expired due to Term
First Claim
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1. Apparatus for supporting a polishing material:

  • a platen having a support surface adapted to support the polishing material;

    a port disposed in the platen and fluidly coupled to the support surface;

    a housing having a supply port, a second port and an exit port, the second port fluidly coupled to the port disposed in the platen;

    a venturi body disposed in the housing, the venturi body having first aperture fluidly coupled to the second port and a second aperture disposed proximate the exit port; and

    a blocker valve fluidly coupled between the exit port and an exhaust port, the blocker valve having a first state whereby flow through the housing and blocker valve causes vacuum to be drawn through the port disposed in the platen by the venturi body.

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