Organically modified mineral materials containing engrafted bacteria for chemical contaminant decomposition

• US 6,503,740 B1
• Filed: 07/17/2000
• Issued: 01/07/2003
• Est. Priority Date: 02/22/2000
• Status: Expired due to Term

• Current Assignee: AquaBlok, Ltd
• Original Assignee: Biomin, Inc.
• Inventors: Alther, George
• Primary Examiner(s): Naff, David M.
• Application Number:
  US09/617,571
• Time in Patent Office: 904 Days
• Field of Search: 435/176, 435/177, 210/601, 210/610, 210/615, 210/616
• US Class Current: 435/176
• CPC Class Codes: B09C 1/10 microbiologically, biologically or by using enzymes
• CPC Class Codes: C02F 2101/363 PCB's; PCP's
• CPC Class Codes: C02F 2101/366 Dioxine; Furan
• CPC Class Codes: C02F 2305/06 Nutrients for stimulating the growth of microorganisms
• CPC Class Codes: C02F 3/348 characterised by the way or the form in which the microorganisms are added or dosed
• CPC Class Codes: C12N 11/14 Enzymes or microbial cells immobilised on or in an inorganic carrier

Abstract

A treatment media is provided capable of acting upon at least one chemical contaminant in an aqueous composition and assisting in the decomposition thereof. The treatment media is a biologically activated organically modified material which includes a mineral based substrate, selected from the group consisting of clays, clay analogs, synthetic resins, zeolites and mixtures thereof. The mineral based substrate is treated with an organic modification compound selected from the group consisting of quaternary amines, pyridinium compounds, phosphonium amines, and mixtures thereof. At least one strain of bacteria is engrafted to the mineral-based substrate, the bacteria being capable of facilitating decomposition of the chemical contaminant. Quaternary amines used provide enhancement of bacterial colonies and do not adversely effect bacterial activity when employed as the organic modification compound to treat the mineral based substrate. Preferred quaternary amines include ditallow dimethyl ammonium chloride, hexadecyl ammonium chloride, octadecyl ammonium chloride, di-methyl di-hydrogenated tallow ammonium chloride, and dicocodimethyl ammonium chloride.

Claims

1. A self-cleaning treatment media capable of acting upon at least one chemical contaminant in an aqueous composition assisting in the decomposition of that contaminant to at least one suitable lower molecular weight compound, the treatment media comprising:

a mineral-based substrate present in granular form, the mineral-based substrate being a charged material selected from the group consisting of clays, clay analogs, synthetic resins and mixtures thereof;

a compound capable of providing organic surface modification to a portion of the mineral-based substrate, the organic modification compound comprising quaternary amines, wherein the quaternary amines are selected from the group consisting of ditallow dimethyl ammonium chloride, hexadecyl ammonium chloride, octadecyl ammonium chloride, di-methyl di-hydrogenated tallow ammonium chloride, dicocodimethyl ammonium chloride, and mixtures thereof, and wherein the mineral-based substrate contains the organic modification compound; and

at least one strain of microbial material engrafted on the surface of the mineral-based substrate containing the organic surface modification compound, the microbial material capable of facilitating decomposition of the at least one chemical contaminant in the aqueous composition;

wherein the strain of microbial material has a biological activity, and wherein the organic surface modification compound is one which permits sufficient biological activity of the microbial material when the microbial material and the organic surface modification compound are both present on the mineral-based substrate.

2. The treatment media of claim 1 wherein the mineral-based substrate and the organic surface modification compound are present in a ratio between about 10 parts to about 100 parts and about 5 parts to about 150 parts, surface modification compound to mineral-based substrate respectively.

3. The treatment media of claim 1 wherein the strain of microbial material is present in sufficient quantity to provide at least partial decomposition of the at least one chemical contaminant.

4. A self-cleaning treatment media capable of acting upon at least one chemical contaminant in an aqueous composition and assisting in the decomposition thereof, the treatment media comprising:

a charged mineral based substrate, selected from the group consisting of clay, clay analogs, synthetic resins, zeolites, and mixtures thereof;

an organic modification compound comprising quaternary amines, wherein the quaternary amines are selected from the group consisting of ditallow dimethyl ammonium chloride, hexadecyl ammonium chloride, octadecyl ammonium chloride, di-methyl di-hydrogenated tallow ammonium chloride, dicocodimethyl ammonium chloride, and mixtures thereof, and wherein the mineral-based substrate contains the organic modification compound; and

at least one strain of bacteria engrafted to the mineral-based substrate containing the organic modification compound, the bacteria capable of facilitating decomposition of the chemical contaminant.

5. The treatment media of claim 4 wherein the mineral-based substrate is a clay consisting of bentonite.

6. The treatment media of claim 4 wherein the organic modification compound is present in a ratio of between about 10% to about 100%, quaternary amine to mineral-based substrate, respectively.

7. The treatment media of claim 4 further comprising microbial nutrients present in sufficient quantity to sustain the engrafted bacteria, the nutrients selected from the group consisting of carbohydrate sources, nitrogen sources, mineral sources, alcohol sources, and mixtures thereof.

8. The treatment media of claim 4 further comprising a source of microbial oxygen, wherein the oxygen source is selected from the group consisting of sea marl, calcified non-marl seaweed, and mixtures thereof.

9. The treatment media of claim 4 wherein the mineral-based substrate is a clay or clay analog selected from the group consisting of bentonite, smectite, montmorillonite, paligorskite, attapulgite, sepiolite, saponite, kaolinite, halloysite, hectorite, beidellite, stevensite, fire clay, ground shale, mud, silt, and mixtures thereof.