Method for removing substances from gases
First Claim
1. A method of depleting excess reactant from an exhaust flow, comprising:
- reacting a first part of a gaseous reactant with at least one substrate within a primary reaction space, wherein said reacting comprises an atomic layer deposition (ALD) process;
exhausting an excess part of the gaseous reactant that has not reacted with said at least one substrate to a secondary reaction space downstream of the primary reaction space;
further reacting the excess part of the gaseous reactant with a material having a surface area between about 10 m2/g and 2000 m2/g, wherein said further reacting comprises an ALD process; and
exhausting by-product from reacting the first part of a gaseous material and from further reacting the excess part of the gaseous material from the secondary reaction space.
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Accused Products
Abstract
The present invention concerns a method and an apparatus for removing substances from gases discharged from gas phase reactors. In particular, the invention provides a method for removing substances contained in gases discharged from an ALD reaction process, comprising contacting the gases with a “sacrificial” material having a high surface area kept at essentially the same conditions as those prevailing during the gas phase reaction process. The sacrificial material is thus subjected to surface reactions with the substances contained in the gases to form a reaction product on the surface of the sacrificial material and to remove the substances from the gases. The present invention diminishes the amount of waste produced in the gas phase process and reduces wear on the equipment.
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Citations
16 Claims
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1. A method of depleting excess reactant from an exhaust flow, comprising:
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reacting a first part of a gaseous reactant with at least one substrate within a primary reaction space, wherein said reacting comprises an atomic layer deposition (ALD) process;
exhausting an excess part of the gaseous reactant that has not reacted with said at least one substrate to a secondary reaction space downstream of the primary reaction space;
further reacting the excess part of the gaseous reactant with a material having a surface area between about 10 m2/g and 2000 m2/g, wherein said further reacting comprises an ALD process; and
exhausting by-product from reacting the first part of a gaseous material and from further reacting the excess part of the gaseous material from the secondary reaction space. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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Specification