Gas distribution apparatus for semiconductor processing
First Claim
1. A gas distribution system useful for a reaction chamber used in semiconductor substrate processing, comprising:
- a plurality of gas supplies;
a mixing manifold wherein gas from the plurality of gas supplies is mixed together;
a plurality of gas supply lines delivering the mixed gas to different zones in the chamber, the gas supply lines including a first gas supply line delivering the mixed gas to a first zone in the chamber and a second gas supply line delivering the mixed gas to a second zone in the chamber;
at least one control valve controlling a rate of flow of the mixed gas in the first and/or second gas supply line such that a desired ratio of flow rates of the mixed gas is achieved in the first and second gas supply lines;
at least one flow measurement device measuring flow rate of the mixed gas in the first and/or second gas supply line; and
a controller operating the at least one control valve in response to the flow rate measured by the at least one flow measurement device.
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Accused Products
Abstract
A gas distribution system for processing a semiconductor substrate includes a plurality of gas supplies, a mixing manifold wherein gas from the plurality of gas supplies is mixed together, a plurality of gas supply lines delivering the mixed gas to different zones in the chamber, and a control valve. The gas supply lines include a first gas supply line delivering the mixed gas to a first zone in the chamber and a second gas supply line delivering the mixed gas to a second zone in the chamber. The control valve controls a rate of flow of the mixed gas in the first and/or second gas supply line such that a desired ratio of flow rates of the mixed gas is achieved in the first and second gas supply lines.
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Citations
11 Claims
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1. A gas distribution system useful for a reaction chamber used in semiconductor substrate processing, comprising:
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a plurality of gas supplies;
a mixing manifold wherein gas from the plurality of gas supplies is mixed together;
a plurality of gas supply lines delivering the mixed gas to different zones in the chamber, the gas supply lines including a first gas supply line delivering the mixed gas to a first zone in the chamber and a second gas supply line delivering the mixed gas to a second zone in the chamber;
at least one control valve controlling a rate of flow of the mixed gas in the first and/or second gas supply line such that a desired ratio of flow rates of the mixed gas is achieved in the first and second gas supply lines;
at least one flow measurement device measuring flow rate of the mixed gas in the first and/or second gas supply line; and
a controller operating the at least one control valve in response to the flow rate measured by the at least one flow measurement device. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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Specification