Trench-gate field-effect transistors and their manufacture

• US 6,509,608 B1
• Filed: 07/18/2000
• Issued: 01/21/2003
• Est. Priority Date: 07/20/1999
• Status: Expired due to Fees

• Current Assignee: NXP B.V. (NXP Semiconductors NV)
• Original Assignee: Koninklijke Philips Electronics N.V. (Koninklijke Philips N.V.)
• Inventors: Hueting, Raymond J. E.
• Primary Examiner(s): Nguyen, Tuan H.
• Application Number:
  US09/618,187
• Time in Patent Office: 917 Days
• Field of Search: 257/330, 257/331, 257/333, 438/133, 438/138, 438/270, 438/271
• US Class Current: 257/330
• CPC Class Codes: H01L 29/0865 Disposition
• CPC Class Codes: H01L 29/1095 Body region, i.e. base region, of DMOS transistors or IGBTs cell layout H01L29/0696
• CPC Class Codes: H01L 29/42368 the thickness being non-uniform
• CPC Class Codes: H01L 29/781 Inverted VDMOS transistors, i.e. Source-Down VDMOS transistors
• CPC Class Codes: H01L 29/7813 with trench gate electrode, e.g. UMOS transistors trench gate electrodes per se H01L29/4236

Abstract

In a trench-gate field-effect transistor of inverted configuration, the drain region (14) is adjacent to the surface with the insulated trench-gate structure (11,12). The gate dielectric 12 is thicker adjacent to the drain region (14), and preferably also the drain drift region (14a), than it is adjacent to the channel-accommodating portion (15a) of the transistor body region (15). Another portion (15b) of the transistor body region (15) is electrically shorted to the underlying source region (13) by a buried electrical short (35). This buried short is provided by a leaky p-n junction (35) between a highly doped (p+) bottom portion (15b) of the body region and the underlying source region (13), at an area that is separated laterally from the insulated gate electrode (11) by an active portion (13a) of the source region adjacent to the gate trench (20). This portion (13a) of the source region can be formed by dopant implantation and/or diffusion via the lower portion of the trench (20). It extends across the highly doped bottom portion (15b) of the body region to connect with the channel-accommodating portion (15a) adjacent to the trench-gate structure (11,12). A compact layout of drain and trench-gate structures is achievable at the body surface (10a), and a compact layout of the buried electrical short (35) is achievable with the underlying source region (13).

Claims

1. A trench-gate field-effect transistor comprising a semiconductor body into which an insulated gate electrode extends in a trench from a major surface of the body, successively through a drain region, a drain drift region, and a transistor body region to reach an underlying source region of the transistor, wherein the trench is lined with a gate dielectric that insulates the gate electrode from said drain, drain drift, body and source regions, the drain, drain drift and source regions are of a second conductivity type that is opposite to a first conductivity type of the body region, the drain region is adjacent to said major surface and has a higher doping concentration than the drain drift region, the gate dielectric is thicker adjacent to the drain region than adjacent to a channel-accommodating portion of the body region, the body region comprises an overlying layer that provides the channel-accommodating portion and that extends over a bottom portion of the body region that is more highly doped than the overlying layer, the highly doped bottom portion forms a leaky p-n junction with the underlying source region at an area that is separated laterally from the insulated gate electrode by an active portion of the source region, the active portion of the source region extends adjacent to the trench across the highly doped bottom portion of the body region to connect with the channel-accommodating portion of the body region, and the leaky p-n junction provides a buried electrical short that electrically shorts the body region to the underlying source region.

2. A transistor as claimed in claim 1, wherein the highly doped bottom portion of the body region is in the form of a layer that extends laterally to the trench where it is overdoped by the said active portion of the source region.

3. A transistor as claimed in claim 2, wherein the active portion of the source region has a doping profile of the second conductivity type corresponding to a dopant diffusion profile from the bottom of the trench.

4. A transistor as claimed in claim 1, wherein the drain drift region has a doping concentration of the second conductivity type that decreases from the vicinity of the drain region to the vicinity of the underlying body region.

5. A transistor as claimed in claim 1, wherein the gate dielectric has a thickness adjacent to the drain drift region that increases with distance from the channel-accommodating portion of the body region.

6. A transistor as claimed in claim 5, wherein the drain drift region has a substantially uniform doping concentration of the second conductivity type.

7. A transistor as claimed in claimed in claim 1, wherein the highly doped bottom portion of the body region, the channel-accommodating portion of the body region, the drain drift region and the drain region are in the form of stacked epitaxial layers on a monocrystalline semiconductor substrate that provides the underlying source region.

8. A transistor as claimed in claim 1, wherein the transistor is a power device having a plurality of the body regions which are located side-by-side in the semiconductor body, the insulated gate electrode in the trench comprises grid portions which extend between the channel-accommodating portions of neighbouring side-by-side body regions, and the active portion of the source region is present around the bottom of each grid portion of the trench.

9. A method of manufacturing a, trench-gate field-effect transistor having a semiconductor body into which an insulated gate electrode extends in a trench from a major surface of the body, successively through a drain region, a drain drift region, and a transistor body region to reach an underlying source region of the transistor, wherein the trench is lined with a gate dielectric that insulates the gate electrode from said drain, drain drift, body and source regions, the drain, drain drift and source regions are of a second conductivity type that is opposite to a first conductivity type of the body region, the drain region is adjacent to said major surface and has a higher doping concentration than the drain drift region, the gate dielectric is thicker adjacent to the drain region than adjacent to a channel-accommodating portion of the body region, the body region comprises an overlying layer that provides the channel-accommodating portion and that extends over a bottom portion of the body region that is more highly doped than the overlying layer, the highly doped bottom portion forms a leaky p-n junction with the underlying source region at an area that is separated laterally from the insulated gate electrode by an active portion of the source region, the active portion of the source region extends adjacent to the trench across the highly doped bottom portion of the body region to connect with the channel-accommodating portion of the body region, and the leaky p-n junction provides a buried electrical short that electrically shorts the body region to the underlying source region, including the steps of growing on a monocrystalline substrate stacked epitaxial layers for providing the highly doped bottom portion of the body region, the channel-accommodating portion of the body region, the drain drift region and the drain region, and thereafter etching a trench for the insulated gate electrode successively through the drain region, the drain drift region, and the transistor body region to reach the underlying source region.

10. A method of manufacturing a transistor as claimed in claim 9, wherein, before the gate electrode is provided in the trench, the doping concentration of the said active portion of the source region is implanted at the bottom of the trench in the semiconductor body to overdope the highly doped bottom portion of the body region.

11. A method of manufacturing a transistor as claimed in claim 9, wherein dopant of the second conductivity type is implanted into the drain drift region to provide the decreasing doping concentration of the drain drift region.