Method of forming ferromagnetic tunnel junctions with enhanced magneto-resistance

• US 6,511,855 B2
• Filed: 02/11/2000
• Issued: 01/28/2003
• Est. Priority Date: 01/06/1998
• Status: Expired due to Term

• Current Assignee: Samsung Electronics Co. Ltd.
• Original Assignee: Hewlett-Packard Company (HP Inc.)
• Inventors: Anthony, Thomas C.
• Primary Examiner(s): Smith, Matthew
• Assistant Examiner(s): MALSAWMA, LALRINFAMKIM HMAR
• Application Number:
  US09/672,794
• Publication Number:
  US 20020114972A1
• Time in Patent Office: 1,082 Days
• Field of Search: 438/3, 438/260, 438/263, 438/264, 438/910, 438/964, 438/965, 438/979, 438/981, 257/9, 257/10, 257/14, 257/17, 257/25, 257/30, 257/31, 257/317, 257/321, 204/192.2, 205/90, 360/324.2
• US Class Current: 438/3
• CPC Class Codes: B82Y 25/00 Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
• CPC Class Codes: H01F 10/3254 the spacer being semiconducting or insulating, e.g. for spin tunnel junction [STJ]
• CPC Class Codes: H10N 50/10 Magnetoresistive devices
• CPC Class Codes: Y10T 428/12924 Fe-base has 0.01-1.7% carbon [i.e., steel]
• CPC Class Codes: Y10T 428/12931 Co-, Fe-, or Ni-base components, alternative to each other

Abstract

A tunnel junction having a topography and/or interface layers that enhance its magneto-resistance. The topography of the tunnel junction maximizes spin tunneling from areas of ferromagnetic crystalline grains having high polarization and minimizes the effects of defect scattering at grain boundaries. The interface layers enhance magnetic polarization properties of ferromagnetic layers near interfaces to an insulating layer in a tunnel junction.

Claims

1. A method for forming a tunnel junction, comprising the steps of:

forming a first ferromagnetic layer with an upper surface having a topography which includes a set of domed areas and a set of intervening low areas;

forming an insulating layer over the first ferromagnetic layer such that an upper surface of the insulating layer is substantially planar such that a path for electron migration between the first ferromagnetic layer and a second ferromagnetic layer in the tunnel junction is less above the domed areas than above the low areas.

2. The method of claim 1, wherein the step of forming a first ferromagnetic layer includes the step of forming one or more layers of materials below the first ferromagnetic layer wherein a thickness of the layers of materials is selected to cause formation of the domed areas during formation of the first ferromagnetic layer.

3. The method of claim 2, wherein the layers of materials provide a pinning layer that fixes an orientation of magnetization in the first ferromagnetic layer.

4. The method of claim 2, wherein the intervening low areas correspond to grain boundaries in a polycrystalline structure of the first ferromagnetic layer.

5. The method of claim 2, wherein one of the layers of materials is selected to provide a lattice mismatch with the first ferromagnetic layer.

6. The method of claim 1, further comprising the steps of forming an interface layer at an interface between the insulating layer and the first ferromagnetic layer.

7. The method of claim 6, further comprising the steps of forming an interface layer at an interface between the insulating layer and the second ferromagnetic layer.

8. The method of claim 7, wherein the interface layers are selected to enhance the magnetic polarization properties of the first and second ferromagnetic layers near the interfaces to the insulating layer.

9. A method for forming a tunnel junction, comprising the steps of:

forming a first ferromagnetic layer with an upper surface having a topography which includes a set of domed areas and a set of intervening low areas;

forming a first thin interface layer on the first ferromagnetic layer;

forming an insulating layer on the first thin interface layer wherein the first thin interface layer enhances magnetic polarization properties of the first ferromagnetic layer near an interface between the first ferromagnetic layer and the insulating layer.

10. A method for forming a tunnel junction, comprising:

forming a first ferromagnetic layer with an upper surface having a topography which includes a set of domed areas and a set of intervening low areas;

forming a first thin interface layer on the first ferromagnetic layer;

forming an insulating layer on the first thin interface layer,

forming a second thin interface layer on the insulating layer; and

forming a second ferromagnetic layer on the second thin interface layer;

wherein the first thin interface layer enhances magnetic polarization properties of the first ferromagnetic layer near an interface between the first ferromagnetic layer and the insulating layer;

wherein the second thin interface layer enhances magnetic polarization properties of the second ferromagnetic layer near an interface between the insulating layer and the second ferromagnetic layer.

11. The method of claim 10, wherein each interface layer is formed by forming a layer of ferromagnetic material less than 4 nanometers thick.