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RF-powered plasma accelerator/homogenizer

  • US 6,512,333 B2
  • Filed: 12/14/2001
  • Issued: 01/28/2003
  • Est. Priority Date: 05/20/1999
  • Status: Expired due to Fees
First Claim
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1. An RF-powered plasma accelerator/homogenizer that produces a quiescent plasma having a generally homogenous preselected plasma potential VPA from a primary plasma, comprising:

  • an RF-conductive accelerator/homogenizer structure having a total dielectric coated accelerator/homogenizer surface area ARF that comprises a plurality of dielectric coated accelerator/homogenizer surfaces quasi-uniformly dispersed throughout the primary plasma, an RF source reactively coupled to said RF-conductive accelerator/homogenizer structure with a coupling device, said RF source produces an RF voltage within said accelerator/homogenizer structure that causes said plurality of dielectric coated accelerator/homogenizer surfaces to absorb thermal electrons from the primary plasma; and

    a containment assembly coupled to said RF-conductive accelerator/homogenizer structure, said containment assembly comprises an RF-grounded structure having a total ground surface area AG, wherein ARF>

    AG, said containment assembly holds the quiescent plasma at the generally homogenous preselected plasma potential VPA.

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