Solvated ruthenium precursors for direct liquid injection of ruthenium and ruthenium oxide
First Claim
1. A solvated ruthenium precursor formulation comprising:
- cyclohexadienetricarbonyl ruthenium; and
a solvent capable of solubilizing said ruthenium-containing precursor formulation.
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Abstract
A method is provided for forming a film of ruthenium or ruthenium oxide to the surface of a substrate by employing the techniques of chemical vapor deposition to decompose ruthenium precursor formulations. The ruthenium precursor formulations of the present invention include a ruthenium precursor compound and a solvent capable of solubilizing the ruthenium precursor compound. A method is further provided for making a vaporized ruthenium precursor for use in the chemical vapor deposition of ruthenium and ruthenium-containing materials onto substrates, wherein a ruthenium precursor formulation having a ruthenium-containing precursor compound and a solvent capable of solubilizing the ruthenium-containing precursor compound is vaporized.
63 Citations
23 Claims
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1. A solvated ruthenium precursor formulation comprising:
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cyclohexadienetricarbonyl ruthenium; and
a solvent capable of solubilizing said ruthenium-containing precursor formulation. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A solvated ruthenium precursor formulation comprising:
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tricarbonyl ruthenium; and
a solvent capable of solubilizing said tricarbonyl ruthenium. - View Dependent Claims (13, 14, 15)
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16. A solvated ruthenium precursor formulation comprising:
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cyclohexadienetricarbonyl ruthenium; and
a solvent selected from the group consisting of hexane, pentane, heptane, and butylacetate. - View Dependent Claims (17, 18, 19, 20, 21, 22, 23)
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Specification