Packaged MEMS device and method for making the same

• US 6,519,075 B2
• Filed: 01/25/2001
• Issued: 02/11/2003
• Est. Priority Date: 11/03/2000
• Status: Expired due to Term

• Current Assignee: Avago Technologies International Sales Pte Limited (Broadcom, Inc.)
• Original Assignee: Agere Systems Incorporated (Broadcom, Inc.), Lucent Technologies, Inc. (Nokia Corporation)
• Inventors: Jin, Sungho, Soh, Hyongsok, Pardo, Flavio, Greywall, Dennis S., Carr, Dustin W.
• Primary Examiner(s): Epps, Georgia
• Assistant Examiner(s): O'NEILL, GARY WILLIAM
• Application Number:
  US09/769,192
• Publication Number:
  US 20020054422A1
• Time in Patent Office: 747 Days
• Field of Search: 359/245, 359/248, 359/290, 359/291, 359/295, 359/298, 359/308, 359/871, 385/140, 385/24, 385/73, 310/36, 310/37, 438/106, 735/040.2
• US Class Current: 359/291
• CPC Class Codes: B81B 2201/042 Micromirrors, not used as optical switches
• CPC Class Codes: B81C 2203/035 Soldering
• CPC Class Codes: B81C 3/002 Aligning microparts
• CPC Class Codes: G02B 2006/12104 Mirror; Reflectors or the like
• CPC Class Codes: G02B 26/0841 the reflecting element being moved or deformed by electrostatic means
• CPC Class Codes: G02B 6/266 the optical element being an attenuator
• CPC Class Codes: G02B 6/3518 the reflective optical element being an intrinsic part of a MEMS device, i.e. fabricated together with the MEMS device MEMS devices in general B81B; manufacture of MEM devices in general B81C; micromechanical devices controlling the direction of light G02B26/0833
• CPC Class Codes: G02B 6/3556 NxM switch, i.e. regular arrays of switches elements of matrix type constellation
• CPC Class Codes: G02B 6/356 in an optical cross-connect device, e.g. routing and switching aspects of interconnecting different paths propagating different wavelengths to (re)configure the various input and output links switching polarized beams G02B6/3594; power equalizers G02B6/356 and G02B6/3594; path selecting means H04Q11/0001
• CPC Class Codes: G02B 6/357 Electrostatic force electrostatic forces controlling reflecting elements in general G02B26/0841
• CPC Class Codes: G02B 6/3584 constructional details of an associated actuator having a MEMS construction, i.e. constructed using semiconductor technology such as etching MEMS per se B81B, B81C
• CPC Class Codes: G02B 6/3594 Characterised by additional functional means, e.g. means for variably attenuating or branching or means for switching differently polarized beams

Abstract

A MEMs device comprises a component layer including a frame structure and at least one component movably coupled to the frame and an actuator layer including at least one conductive path and at least one actuator for moving the component. The component layer and the actuator layer are bonded together with solder or other materials in lateral alignment. Advantageously the layers are provided with metallization pads and are bonded together in lateral alignment with predetermined vertical gap spacing by solder bonds between the pads. In a preferred embodiment the MEMs device, however bonded, comprises a component layer, an actuator layer and an intervening spacer. The spacer provides the walls of a cavity between the component and the pertinent actuators to permit movement of the component. The walls cover the bulk of the peripheral boundary of the cavity to provide aerodynamic isolation. Advantageously the walls are conductive to provide electrostatic isolation. The device has particular utility in optical cross connection, variable attenuation and power gain equalization.

Claims

1. A micro-electro-mechanical device comprising:

a component layer comprising a frame, a plurality of components disposed in an array in the frame, the components movably coupled to the frame, and a plurality of solder wettable metallized regions on the frame;

an actuation layer comprising a plurality of actuators for moving the component, a plurality of conductive paths, and a plurality of solder wettable metallized regions, the actuation layer having a plurality-of electrodes laterally aligned for controlling the movement of the components;

the component layer and the actuation layer bonded together with a bonding solder material by solder joints between metallized regions on the respective layers with a gap spacing and in lateral alignment so that the movement of the component is controlled by an electrical signal applied to the actuator;

the component layer comprises at least one mirror component and the actuation layer comprises a plurality of electrodes for controlling each mirror; and

,

one or more spacers between the component layer and the actuator layer to control the gap spacing between the layers, the spacers free of the bonding solder material.

2. The device of claim 1 wherein the component is coupled to the frame via a movable gimbal.

3. The device of claim 1 wherein the vertical gap spacing between the component layer and actuation layer is within 10% of a predetermined gap spacing and the lateral alignment is with an accuracy of 5% of the component effective diameter.

4. The device of claim 3 wherein the vertical gap spacing between the component layer and actuation layer is within 5% of a predetermined gap spacing and the lateral alignment is with an accuracy of 1% of the component effective diameter.

5. The device of claim 1 wherein the component layer comprises silicon.

6. The device of claim 1 wherein the actuator layer comprises silicon.

7. The device of claim 1 wherein the component layer comprises a metal layer comprising Au, Ag, or Al.

8. The device of claim 1 wherein said one or more spacers is pre-attached to one of the component layer or the actuator layer and solder bonded to metallization pads on the other layer.

9. The device of claim 1 wherein said one or more spacers comprises a metal, ceramic, silicon or polymer material.

10. The device of claim 1 wherein said one or more spacer blocks more than 20% of the peripheral boundary around each component in the array of components for aerodynamic isolation from mirror movement in adjacent cells.

11. The device of claim 1 wherein said one or more spacers comprises conductive walls extending around the component for electrostatic isolation.

12. The device of claim 1 wherein said one or more spacers has a CTE which differs by less than 20% from the CTE of the solder.

13. The device of claim 1 wherein said one or more spacers is attached to either the component layer or the actuator layer.

14. The device of claim 1 wherein said one or more spacers comprises a permanent spacer.

15. The device of claim 1 wherein said one or more spacers comprises a drop-in permanent spacer which is trapped between the component layer and the actuator layer by compressive stress caused by solder joint solidification and thermal contraction.

16. The device of claim 1 wherein said one or more spacers comprises a spacer laterally aligned and constrained by an alignment notch.

22. The device of claim 1 wherein the component layer comprises a composite layer of silicon, insulator and silicon.

23. The device of claim 22 wherein the component comprises a mirror is formed on the layer of silicon proximal the actuator layer.

24. The device of claim 22 wherein the component comprises a mirror formed on the layer of silicon distal from the actuator layer.

25. The device of claim 24 wherein the layer of silicon proximal the actuation layer is configured to at least partially enclose the region underlying the mirror between the mirror and the actuation layer.

26. The device of claim 25 wherein the layer of silicon proximal the actuation layer is doped with impurities or coated with conductive material to provide electrostatic shielding of the mirror.

37. The MEMs device of claim 1 wherein the frame and sidewalls are hermetically sealed about the component layer.

17. A method of making a MEMs device comprising a component layer including an array of components movably coupled to the layer and an actuator layer including at least one conductive path and a plurality of actuators for moving the components, comprising the steps of:

a) forming a plurality of solder-wettable metallization pads on a surface of the component layer and on a mating surface of the actuator level;

b) applying solder between metallization pads of the respective layers;

c) heating and bonding together the respective layers;

d) determining the gap spacing between respective layers with one or more spacers; and

,

e) forming solder joints of predetermined gap spacing as set by the one or more spacers, between the metallization pads of the respective layers, the spacers free of the solder material.

18. The method of claim 17 wherein the quantity of solder between metallization pads is chosen to provide the predetermined gap spacing.

19. The method of claim 17 further comprising the step of disposing a spacer between the layers to control the spacing between them.

20. The method of claim 19 wherein the spacer is removed after formation of the solder joints.

21. The method of claim 19 wherein the spacer is left between the layers after formation of the solder joints.

27. A micro-electro-mechanical (MEMS) device comprising:

a) a component layer comprising a frame and a plurality of components movably connected to the frame;

b) an actuator layer having at least one actuator for moving at least one component;

c) a bonding layer comprising bonding material to bond the component layer to the actuator layer.

d) at least one spacer, to separate the component layer and the actuator layer by a vertical gap spacing, the spacer providing between the actuator and the component a cavity with conductive peripheral walls; and

,

e) the component layer, the spacer and the actuator layer attached together with accurate lateral alignment and accurate gap spacing, the spacer free of the bonding material.

28. The MEMs device of claim 27 wherein the component layer and the actuator layer are bonded together.

29. The MEMs device of claim 27 wherein the component layer and the actuator layer are attached together by solder bonding, fusion bonding, glass frit bonding or adhesive bonding.

30. The MEMs device of claim 27 wherein the conductive peripheral walls block at least 20% of the peripheral area around the cavity of each cell in the array of components.

31. The MEMs device of claim 27 wherein the conductive peripheral walls have electrical resistivity of less than 10 ohm-cm.

32. The MEMs device of claim 27 wherein the conductive peripheral walls comprise metal or conductively doped semiconductor.

33. The MEMs device of claim 27 wherein the spacer comprises ferromagnetic material.

34. A micro-electro-mechanical (MEMs) device comprising:

a) a component layer comprising a frame and an array of components in the component layer and movably connected to the frame;

b) an actuator layer having an array of actuators for moving the component; and

c) a bonding layer comprising bonding material to bond the component layer to the actuator layer.

d) a stiffener frame disposed over the component layer, the frame having side walls bonded to the actuator layer, the frame free of the bonding material.

36. The MEMs device of claim 34 wherein the sidewalls are elastically compliant.

35. A micro-electro-mechanical (MEMs) device comprising:

a) a component layer comprising a frame and at least one component movably connected to the frame;

b) an actuator layer having at least one actuator for moving the component; and

c) a frame disposed over the component layer, the frame having side walls bonded to the actuator layer, wherein the frame comprises at least one transparent plate overlying the component layer.