Method of determining optimum exposure threshold for a given photolithographic model
First Claim
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1. A computer storage for storing instructions for determining an optimum process point for fabricating a device feature of a critical dimension, the instructions comprising:
- selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding values of a first process parameter representative of mask material edge position;
selecting an optimum threshold value having the largest rate of change around said measuring point; and
determining the first process parameter value corresponding to the optimum threshold value.
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Abstract
A system and method for enhancing process latitude (tolerances) in the fabrication of devices and integrated circuits. A measuring point is selected corresponding to a feature of critical dimension. Then the pattern is convolved with the model, and its value and rate of change are calculated over a range of corresponding values of a first process parameter. Next, an optimum threshold having the largest rate of change, or contrast, is selected. Finally, proximity correction is performed using relevant parameters.
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Citations
74 Claims
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1. A computer storage for storing instructions for determining an optimum process point for fabricating a device feature of a critical dimension, the instructions comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding values of a first process parameter representative of mask material edge position;
selecting an optimum threshold value having the largest rate of change around said measuring point; and
determining the first process parameter value corresponding to the optimum threshold value. - View Dependent Claims (2, 3, 4, 5, 6, 7)
selecting a point on one side of the measuring point;
calculating a value of the modeled behavior at each of the points; and
calculating a slope through each of the points, wherein the slope is a function of the values of the modeled behavior at each point.
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5. The computer storage of claim 4, wherein the instructions further include selecting a second point.
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6. The computer storage of claim 1, wherein the instructions further include:
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decrementing the value of the first process parameter;
calculating the value of the modeled behavior at the measuring point;
determining the value of the modeled behavior at a location offset from the measuring point in a first direction by a second value;
determining the value of the modeled behavior at a location offset from the measuring point in a second direction, opposite to the first direction, by the second value; and
calculating the rate of change of the modeled behavior corresponding to the first process parameter value.
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7. The computer storage of claim 6, wherein the instructions further include:
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calculating a difference of the modeled behavior values ascertained during determining the values of the modeled behavior; and
dividing the difference of the modeled behavior values by twice the second value.
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8. A computer storage for storing instructions for determining an optimum process point for fabricating a device feature of a critical dimension, the instructions comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding values of a first process parameter representative of mask material edge position;
selecting an optimum threshold value having the largest rate of change around said measuring point;
determining the first process parameter value corresponding to the optimum threshold value; and
providing the optimum threshold value to a proximity effect correction process which modifies the mask pattern to compensate for proximity effects. - View Dependent Claims (9, 10, 11)
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12. A computer storage for storing instructions for determining an optimum process point for fabricating a device feature of a critical dimension, the instructions comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding mask material edge positions; and
selecting an optimum threshold value having the largest rate of change around said measuring point. - View Dependent Claims (13, 14, 15, 16, 17)
selecting a point on one side of the measuring point;
calculating a value of the modeled behavior at each of the points; and
calculating a slope through each of the points, wherein the slope is a function of the values of the modeled behavior at each point.
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15. The computer storage of claim 12, wherein the instructions further comprise:
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shifting the mask material edge position by a first value;
calculating the value of the modeled behavior at the measuring point;
determining the value of the modeled behavior at a location offset from the measuring point in a first direction by a second value;
determining the value of the modeled behavior at a location offset from the measuring point in a second direction, opposite the first direction, by the second value; and
calculating the rate of change of the modeled behavior value corresponding to the mask material edge position.
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16. The computer storage of claim 15, wherein the instructions include:
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calculating a difference of the modeled behavior values ascertained during determining the values of the modeled behavior; and
dividing the difference of the modeled behavior values by twice the second value.
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17. The computer storage of claim 15, wherein the instructions further comprise providing the optimum threshold value to a proximity effect correction process which modifies the mask material edge position to compensate for proximity effects.
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18. A computer storage for storing instructions for determining an optimum process point for fabricating a device feature of a critical dimension, the instructions comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding mask material edge positions, the calculating modeled behavior values and their rates of change including;
shifting the mask material edge position by a first value;
calculating the value of the modeled behavior at the measuring point;
determining the value of the modeled behavior at a location offset from the measuring point in a first direction by a second value;
determining the value of the modeled behavior at a location offset from the measuring point in a second direction, opposite the first direction, by the second value; and
calculating the rate of change of the threshold, the calculating the rate of change of the threshold including;
calculating a difference of the modeled behavior values ascertained during determining the values of the modeled behavior; and
dividing the difference of the modeled behavior values by twice the second value;
selecting an optimum threshold value having the largest rate of change; and
providing the optimum threshold value to a proximity effect correction process which modifies the mask material edge position to compensate for proximity effects.
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19. A computer storage for storing instructions for determining an optimum process point for fabricating a device feature of critical dimension, the instructions comprising:
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selecting a plurality of measuring points, wherein each measuring point corresponds to the feature of the critical dimension;
calculating values and rates of change of modeled behavior over a range of values of a first process parameter for each measuring point, the range of values representative of mask material edge position;
selecting an optimum threshold value having the largest rate of change for each measuring point;
selecting a threshold value from the plurality of optimum threshold values; and
providing the selected threshold value to a proximity effect correction process which modifies the mask material edge position to compensate for proximity effects. - View Dependent Claims (20, 21)
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22. A computer for determining an optimum process point for fabricating a device feature of a critical dimension, comprising:
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means for selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
means for calculating modeled behavior values and their rates of change over a range of corresponding values of a first process parameter representative of mask material edge position;
means for selecting an optimum threshold value having the largest rate of change around said measuring point; and
means for determining the first process parameter value corresponding to the optimum threshold value. - View Dependent Claims (23, 24, 25, 26, 27, 28)
means for selecting a point on one side of the measuring point;
means for calculating a value of the modeled behavior at each of the points; and
means for calculating a slope through each of the points, wherein the slope is a function of the values of the modeled behavior at each point.
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26. The computer of claim 25, wherein the means for calculating modeled behavior values includes selecting a second point.
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27. The computer of claim 22, wherein the means for calculating threshold values and their rates of change includes:
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means for decrementing the value of the first process parameter;
means for calculating the value of the modeled behavior at the measuring point;
means for determining the value of the modeled behavior at a location offset from the measuring point in a first direction by a second value;
means for determining the value of the modeled behavior at a location offset from the measuring point in a second direction, opposite to the first direction, by the second value; and
means for calculating the rate of change of the modeled behavior corresponding to the first process parameter value.
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28. The computer of claim 27, wherein the means for calculating the rate of change includes:
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means for calculating a difference of the modeled behavior values ascertained during determining the values of the modeled behavior; and
means for dividing the difference of the modeled behavior values by twice the second value.
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29. A method, in a computer, for determining an optimum process point for fabricating a device feature of a critical dimension, comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of values of a first process parameter, including;
decrementing a value of the first process parameter by a first value;
calculating a value of the modeled behavior at the measuring point;
determining a value of the modeled behavior at a location offset from the measuring point by a second value in a first direction;
determining a value of the modeled behavior at a location offset from the measuring point by the second value in a second direction; and
determining a rate of change of the modeled behavior; and
determining whether a value and the rate of change of the modeled behavior has been calculated for a first process parameter equal to the first value, if so then end the method, and if not, then increment the first process parameter by a third value and repeat the above process in the order recited starting with calculating a value of the modeled behavior at the measuring period. - View Dependent Claims (30, 31, 32)
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33. A method for determining an optimum process point for fabricating a device feature of a critical dimension, comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding values of an optical parameter of a stepper with respect to a constant mask material edge;
selecting an optimum threshold value having a largest rate of change around the measuring point; and
determining an optical parameter value corresponding to the optimum threshold value. - View Dependent Claims (34, 35, 36, 40)
selecting a point on one side of the measuring point;
calculating a value of the modeled behavior at each of the points; and
calculating a slope through each of the points, wherein the slope is a function of the values of the modeled behavior at each point.
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40. The method of claim 33, wherein selecting a measuring point, calculating modeled behavior values and their rates of change, selecting an optimum threshold value, and determining an optical parameter value are performed in a computer.
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37. A method for determining an optimum process point for fabricating a device feature of a critical dimension, comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding values of an optical parameter of a stepper with respect to a constant mask material edge;
selecting an optimum threshold value having a largest rate of change around the measuring point; and
determining an optical parameter value corresponding to the optimum threshold value, wherein calculating modeled behavior values includes;
selecting a point on one side of the measuring point;
selecting a second point;
calculating a value of the modeled behavior at each of the points; and
calculating a slope through each of the points, wherein the slope is a function of the values of the modeled behavior at each point.
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38. A method for determining an optimum process point for fabricating a device feature of a critical dimension, comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding values of an optical parameter of a stepper;
selecting an optimum threshold value having a largest rate of change around the measuring point; and
determining an optical parameter value corresponding to the optimum threshold value, wherein calculating modeled behavior values and their rates of change includes;
decrementing a value of the optical parameter;
calculating a value of the modeled behavior at the measuring point;
determining a value of the modeled behavior at a location offset from the measuring point in a first direction by a second value;
determining a value of the modeled behavior at a location offset from the measuring point in a second direction, opposite to the first direction, by the second value; and
calculating a rate of change of the modeled behavior corresponding to the optical parameter value. - View Dependent Claims (39)
calculating a difference of the modeled behavior values ascertained during determining the values of the modeled behavior; and
dividing the difference of the modeled behavior values by twice the second value.
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41. A method for determining an optimum process point for fabricating a device feature of a critical dimension, comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding values of an optical parameter of a stepper with respect to a constant mask material edge;
selecting an optimum threshold value having a largest rate of change around the measuring point;
determining an optical parameter value corresponding to the optimum threshold value; and
providing the optimum threshold value to a proximity effect correction process which modifies a mask pattern to compensate for proximity effects. - View Dependent Claims (42, 43)
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44. A method for determining an optimum process point for fabricating a device feature of a critical dimension, comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding values of exposure time of a stepper with respect to a constant mask material edge;
selecting an optimum threshold value having a largest rate of change around the measuring point; and
determining the exposure time corresponding to the optimum threshold value. - View Dependent Claims (45, 49)
selecting a point on one side of the measuring point;
calculating a value of the modeled behavior at each of the points; and
calculating a slope through each of the points, wherein the slope is a function of the values of the modeled behavior at each point.
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49. The method of claim 44, wherein selecting a measuring point, calculating modeled behavior values and their rates of change, selecting an optimum threshold value, and determining the exposure time are performed in a computer.
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46. A method for determining an optimum process point for fabricating a device feature of a critical dimension, comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding values of exposure time of a stepper with respect to a constant mask material edge;
selecting an optimum threshold value having a largest rate of change around the measuring point; and
determining the exposure time corresponding to the optimum threshold value, wherein calculating modeled behavior values includes;
selecting a point on one side of the measuring point;
selecting a second point;
calculating a value of the modeled behavior at each of the points; and
calculating a slope through each of the points, wherein the slope is a function of the values of the modeled behavior at each point.
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47. A method for determining an optimum process point for fabricating a device feature of a critical dimension, comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding values of exposure time of a stepper;
selecting an optimum threshold value having a largest rate of change around the measuring point; and
determining the exposure time corresponding to the optimum threshold value, wherein calculating threshold values and their rates of change includes;
decrementing a value of the exposure time;
calculating a value of the modeled behavior at the measuring point;
determining a value of the modeled behavior at a location offset from the measuring point in a first direction by a second value;
determining a value of the modeled behavior at a location offset from the measuring point in a second direction, opposite to the first direction, by the second value; and
calculating a rate of change of the modeled behavior corresponding to the exposure time. - View Dependent Claims (48)
calculating a difference of the modeled behavior values ascertained during determining the values of the modeled behavior; and
dividing the difference of the modeled behavior values by twice the second value.
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50. A method for determining an optimum process point for fabricating a device feature of a critical dimension, comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding values of on/off axis settings of a stepper with respect to a constant mask material edge;
selecting an optimum threshold value having a largest rate of change around the measuring point; and
determining on/off axis settings corresponding to the optimum threshold value. - View Dependent Claims (51, 55)
selecting a point on one side of the measuring point;
calculating a value of the modeled behavior at each of the points; and
calculating a slope through each of the points, wherein the slope is a function of the values of the modeled behavior at each point.
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55. The method of claim 50, wherein selecting a measuring point, calculating modeled behavior values and their rates of change, selecting an optimum threshold value, and determining on/off axis settings are performed in a computer.
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52. A method for determining an optimum process point for fabricating a device feature of a critical dimension, comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding values of on/off axis settings of a stepper with respect to a constant mask material edge;
selecting an optimum threshold value having a largest rate of change around the measuring point; and
determining on/off axis settings corresponding to the optimum threshold value, wherein calculating modeled behavior values includes;
selecting a point on one side of the measuring point;
selecting a second point;
calculating a value of the modeled behavior at each of the points; and
calculating a slope through each of the points, wherein the slope is a function of the values of the modeled behavior at each point.
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53. A method for determining an optimum process point for fabricating a device feature of a critical dimension, comprising:
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selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;
calculating modeled behavior values and their rates of change over a range of corresponding values of on/off axis settings of a stepper;
selecting an optimum threshold value having a largest rate of change around the measuring point; and
determining on/off axis settings corresponding to the optimum threshold value, wherein calculating threshold values and their rates of change includes;
decrementing a value of the on/off axis setting;
calculating a value of the modeled behavior at the measuring point;
determining a value of the modeled behavior at a location offset from the measuring point in a first direction by a second value;
determining a value of the modeled behavior at a location offset from the measuring point in a second direction, opposite to the first direction, by the second value; and
calculating a rate of change of the modeled behavior corresponding to the on/off axis setting. - View Dependent Claims (54)
calculating a difference of the modeled behavior values ascertained during determining the values of the modeled behavior; and
dividing the difference of the modeled behavior values by twice the second value.
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56. A computer program product comprising a memory having computer program logic recorded thereon for enabling a processor in a computer system to determine an optimum process point for fabricating a device feature of a critical dimension, the computer program logic comprising:
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a first calculating process enabling the processor to calculate a modeled behavior value associated with the device feature and a rate of change of the modeled behavior value over a range of corresponding values of an optical parameter of a stepper with respect to a constant mask material edge;
a second calculating process enabling the processor to select an optimum threshold value having a largest rate of change; and
a determining process enabling the processor to determine the value of the optical parameter corresponding to the optimum threshold value. - View Dependent Claims (57, 58)
a providing process enabling the processor to provide the optimum threshold value to a proximity effect correction process which modifies a mask pattern to compensate for proximity effects.
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58. The computer program product of claim 56, wherein the optical parameter is one of focus, numerical aperture, exposure time and on or off axis settings of the stepper.
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59. A computer system, comprising:
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a processor;
a memory operatively coupled to the processor;
a first calculating process enabling the processor to calculate a modeled behavior value associated with a device feature and a rate of change of the modeled behavior value over a range of corresponding values of an optical parameter of a stepper with respect to a constant mask material edge;
a second calculating process enabling the processor to select an optimum threshold value having the largest rate of change; and
a determining process enabling the processor to determine a value of the optical parameter corresponding to the optimum threshold value. - View Dependent Claims (60, 61)
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62. A computer system, comprising:
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a processor;
a memory operatively coupled to the processor;
a first calculating process enabling the processor to calculate a modeled behavior value associated with a device feature and a rate of change of the modeled behavior value over a range of corresponding values of an optical parameter of a stepper;
a second calculating process enabling the processor to select an optimum threshold value having the largest rate of change; and
a determining process enabling the processor to determine a value of the optical parameter corresponding to the optimum threshold value, wherein the rate of change of the modeled value indicates a process latitude of an edge of the device feature.
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63. A computer system, comprising:
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a processor;
a memory operatively coupled to the processor;
a first calculating process enabling the processor to calculate a modeled behavior value associated with a device feature and a rate of change of the modeled behavior value over a range of corresponding values of an exposure time of a stepper with respect to a constant mask material edge;
a second calculating process enabling the processor to select an optimum threshold value having a largest rate of change; and
a determining process enabling the processor to determine a value of an exposure time corresponding to the optimum threshold value. - View Dependent Claims (64)
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65. A computer system, comprising:
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a processor;
a memory operatively coupled to the processor;
a first calculating process enabling the processor to calculate a modeled behavior value associated with a device feature and a rate of change of the modeled behavior value over a range of corresponding values of an exposure time of a stepper;
a second calculating process enabling the processor to select an optimum threshold value having a largest rate of change; and
a determining process enabling the processor to determine a value of an exposure time corresponding to the optimum threshold value, wherein the rate of change of the modeled behavior value indicates a process latitude of an edge of the device feature.
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66. A computer system, comprising:
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a processor;
a memory operatively coupled to the processor;
a first calculating process enabling the processor to calculate a modeled behavior value associated with a device feature and a rate of change of the modeled behavior value over a range of corresponding values of focus of a stepper with respect to a constant mask material edge;
a second calculating process enabling the processor to select an optimum threshold value having a largest rate of change; and
a determining process enabling the processor to determine a value of a focus corresponding to the optimum threshold value. - View Dependent Claims (67)
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68. A computer system, comprising:
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a processor;
a memory operatively coupled to the processor;
a first calculating process enabling the processor to calculate a modeled behavior value associated with a device feature and a rate of change of the modeled behavior value over a range of corresponding values of focus of a stepper;
a second calculating process enabling the processor to select an optimum threshold value having a largest rate of change; and
a determining process enabling the processor to determine a value of a focus corresponding to the optimum threshold value, wherein the rate of change of the modeled value indicates a process latitude of an edge of the device feature.
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69. A computer system, comprising:
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a processor;
a memory operatively coupled to the processor;
a first calculating process enabling the processor to calculate a modeled behavior value associated with a device feature and a rate of change of the modeled behavior value over a range of corresponding values of a numerical aperture of a stepper with respect to a constant mask material edge;
a second calculating process enabling the processor to select an optimum threshold value having a largest rate of change; and
a determining process enabling the processor to determine a value of a numerical aperture corresponding to the optimum threshold value. - View Dependent Claims (70)
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71. A computer system, comprising:
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a processor;
a memory operatively coupled to the processor;
a first calculating process enabling the processor to calculate a modeled behavior value associated with a device feature and a rate of change of the modeled behavior value over a range of corresponding values of a numerical aperture of a stepper;
a second calculating process enabling the processor to select an optimum threshold value having a largest rate of change; and
a determining process enabling the processor to determine a value of a numerical aperture corresponding to the optimum threshold value, wherein the rate of change of the modeled value indicates a process latitude of an edge of the device feature.
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72. A computer system, comprising:
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a processor;
a memory operatively coupled to the processor;
a first calculating process enabling the processor to calculate a modeled behavior value associated with a device feature and a rate of change of the modeled behavior value over a range of corresponding values of an on or off axis setting of a stepper with respect to a constant mask material edge;
a second calculating process enabling the processor to select an optimum threshold value having a largest rate of change; and
a determining process enabling the processor to determine a value of an on or off axis setting corresponding to the optimum threshold value. - View Dependent Claims (73)
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74. A computer system, comprising:
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a processor;
a memory operatively coupled to the processor;
a first calculating process enabling the processor to calculate a modeled behavior value associated with a device feature and a rate of change of the modeled behavior value over a range of corresponding values of an on or off axis setting of a stepper;
a second calculating process enabling the processor to select an optimum threshold value having a largest rate of change; and
a determining process enabling the processor to determine a value of an on or off axis setting corresponding to the optimum threshold value, wherein the rate of change of the modeled value indicates a process latitude of an edge of the device feature.
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Specification