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Method of determining optimum exposure threshold for a given photolithographic model

  • US 6,519,501 B2
  • Filed: 01/23/2001
  • Issued: 02/11/2003
  • Est. Priority Date: 02/05/1998
  • Status: Expired due to Fees
First Claim
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1. A computer storage for storing instructions for determining an optimum process point for fabricating a device feature of a critical dimension, the instructions comprising:

  • selecting a measuring point on a computer representation of a wafer corresponding to the feature of the critical dimension;

    calculating modeled behavior values and their rates of change over a range of corresponding values of a first process parameter representative of mask material edge position;

    selecting an optimum threshold value having the largest rate of change around said measuring point; and

    determining the first process parameter value corresponding to the optimum threshold value.

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