Method for shallow trench isolation with removal of strained island edges
First Claim
1. A method of isolation of active islands on a silicon-on-insulator semiconductor device, comprising the steps of:
- providing a silicon-on-insulator semiconductor wafer having a silicon active layer, a dielectric insulation layer and a silicon substrate, in which the silicon active layer is formed on the dielectric insulation layer and the dielectric insulation layer is formed on the silicon substrate;
etching through the silicon active layer to form an isolation trench, the isolation trench defining an active island in the silicon active layer, the active island having at least one upper sharp corner;
rounding the at least one upper sharp corner of the active island, whereby at least one strained edge portion of the active island is formed;
removing at least a part of the at least one strained edge portion; and
at least partially filling the isolation trench with a dielectric trench isolation material to form a shallow trench isolation structure.
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Accused Products
Abstract
A method of isolation of active islands on a silicon-on-insulator semiconductor device, including steps of (1) providing a silicon-on-insulator semiconductor wafer having a silicon active layer, a dielectric insulation layer and a silicon substrate; (2) etching through the silicon active layer to form an isolation trench, the isolation trench defining an active island in the silicon active layer, the active island having at least one upper sharp corner; (3) rounding the at least one upper sharp corner of the active island, whereby at least one strained edge portion of the active island is formed; (4) removing at least a part of the at least one strained edge portion; and (5) at least partially filling the isolation trench with a dielectric trench isolation material to form a shallow trench isolation structure. An SOI wafer semiconductor device having a STI isolation structure free from a strained edge portion and a bird'"'"'s beak.
98 Citations
16 Claims
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1. A method of isolation of active islands on a silicon-on-insulator semiconductor device, comprising the steps of:
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providing a silicon-on-insulator semiconductor wafer having a silicon active layer, a dielectric insulation layer and a silicon substrate, in which the silicon active layer is formed on the dielectric insulation layer and the dielectric insulation layer is formed on the silicon substrate;
etching through the silicon active layer to form an isolation trench, the isolation trench defining an active island in the silicon active layer, the active island having at least one upper sharp corner;
rounding the at least one upper sharp corner of the active island, whereby at least one strained edge portion of the active island is formed;
removing at least a part of the at least one strained edge portion; and
at least partially filling the isolation trench with a dielectric trench isolation material to form a shallow trench isolation structure. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method of shallow trench isolation of active islands on a silicon-on-insulator semiconductor device, comprising the steps of:
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providing a silicon-on-insulator semiconductor wafer having a silicon active layer, a dielectric insulation layer and a silicon substrate, in which the silicon active layer is formed on the dielectric insulation layer and the dielectric insulation layer is formed on the silicon substrate;
forming a hard mask layer over the silicon active layer;
etching through the hard mask layer and the silicon active layer to form an isolation trench, the isolation trench defining an active island in the silicon active layer, the active island having at least one upper sharp corner;
rounding the at least one upper sharp corner of the active island to form at least one upper rounded corner, whereby at least one strained edge portion of the active island is formed;
trimming the hard mask layer;
removing at least a part of the at least one strained edge portion by etching the at least one strained edge portion using the trimmed hard mask layer as an etch mask; and
filling the isolation trench with a dielectric trench isolation material to form a shallow trench isolation structure. - View Dependent Claims (16)
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Specification