Method and apparatus for rejuvenating polishing slurry

• US 6,527,969 B1
• Filed: 04/19/2000
• Issued: 03/04/2003
• Est. Priority Date: 04/23/1999
• Status: Expired due to Term

• Current Assignee: Pannova Semic, LLC (Vector Capital Corporation)
• Original Assignee: Matsushita Electric Industrial Company Limited (Panasonic Holdings Corporation)
• Inventors: Shimizu, Koji, Matsuzawa, Yutaka, Tanoue, Akihiro
• Primary Examiner(s): Knode, Marian C.
• Assistant Examiner(s): MACARTHUR, SYLVIA
• Application Number:
  US09/552,622
• Time in Patent Office: 1,049 Days
• Field of Search: 156/345.18, 451/60, 451/447, 216/93, 216/88, 216/89, 216/90, 216/91
• US Class Current: 216/93
• CPC Class Codes: B01D 61/147 Microfiltration
• CPC Class Codes: B01D 61/22 Controlling or regulating
• CPC Class Codes: B24B 37/04 designed for working plane surfaces
• CPC Class Codes: B24B 57/02 for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents

Abstract

A method for rejuvenating a polishing slurry that has been used for a chemical-mechanical polishing process includes the steps of: recovering the polishing slurry; and re-dispersing abrasive grains contained in the polishing slurry recovered. Specifically, the abrasive grains may be re-dispersed by adding a dispersant or applying an electromagnetic field or ultrasonic radiation to the polishing slurry recovered.

Claims

1. A method for rejuvenating a polishing slurry to be applied to a chemical-mechanical polishing apparatus for performing chemical-mechanical polishing of wafer, and to be applied to a rejuvenating apparatus, which recovers waste generated by the chemical-mechanical polishing apparatus, rejuvenates polishing slurry, and supplies the rejuvenated polishing slurry to the chemical-mechanical polishing apparatus, the method comprising the steps of:

a) separating a high-concentration waste, which contains contaminants at high concentrations discharged from the chemical-mechanical polishing apparatus during polishing, from a low-concentration waste, which contains contaminants at low concentrations discharged from the chemical-mechanical polishing apparatus during rinsing,

b) neutralizing the low-concentration waste by a neutralizing agent, thereafter rinsing the rejuvenating apparatus using the neutralized low-concentration waste,

c) recovering the polishing slurry from the high-concentration waste;

d) re-dispersing abrasive grains contained in the polishing slurry recovered; and

e) mixing the re-dispersed high-concentration waste with fresh polishing slurry, thereafter supplying to the chemical-mechanical polishing apparatus.

2. The method of claim 1, wherein the step b) comprises the step of adding a dispersant to the polishing slurry recovered.

3. The method of claim 2, wherein the dispersant comprises an anionic high-molecular surfactant.

4. The method of claim 1, wherein the step b) comprises the step of applying an electromagnetic field to the polishing slurry recovered.

5. The method of claim 1, wherein the step b) comprises the step of applying ultrasonic radiation to the polishing slurry recovered.

6. The method of claim 5, wherein the ultrasonic radiation is applied at an output power of about 400 to about 800 W and at a frequency of about 10 to about 30 kHz.

7. The method of claim 1, further comprising the steps of:

c) filtering out fine particles in sizes equal to or smaller than a predetermined lower limit from the polishing slurry recovered;

d) filtering out large particles in sizes equal to or greater than a predetermined upper limit from the polishing slurry recovered; and

e) controlling a hydrogen ion exponent (pH) of the polishing slurry recovered,

wherein all of the steps c), d) and e) are performed after the step a) has been carried out.

8. The method of claim 7, wherein the step b) is performed before the step c) is carried out.

9. An apparatus for rejuvenating a polishing slurry that recovers waste generated by the chemical-mechanical polishing apparatus for performing chemical-mechanical polishing of wafer, rejuvenates polishing slurry, and supplies the rejuvenated polishing slurry to the chemical-mechanical polishing apparatus, the apparatus comprising:

means for separating a high-concentration waste, which contains contaminants at high concentrations discharged from the chemical-mechanical polishing apparatus during polishing, from a low-concentration waste, which contains contaminants at low concentrations discharged from the chemical-mechanical polishing apparatus during rinsing,

means for neutralizing the low-concentration waste by neutralizing agent, thereafter rinsing the rejuvenating apparatus using the neutralized low-concentration waste,

means for recovering the polishing slurry from the high-concentration waste;

means for re-dispersing abrasive grains contained in the polishing slurry recovered; and

means for mixing the re-dispersed high-concentration waste with fresh polishing slurry, thereafter supplying to the chemical-mechanical polishing apparatus.

10. The apparatus of claim 9, wherein the re-dispersing means re-disperses the abrasive grains by adding a dispersant to the polishing slurry recovered.

11. The apparatus of claim 10, wherein the dispersant comprises an anionic high-molecular surfactant.

12. The apparatus of claim 9, wherein the re-dispersing means re-disperses the abrasive grains by applying an electro-magnetic field to the polishing slurry recovered.

13. The apparatus of claim 9, wherein the re-dispersing means re-disperses the abrasive grains by applying ultrasonic radiation to the polishing slurry recovered.

14. The apparatus of claim 13, wherein the ultrasonic radiation is applied at an output power of about 400 to about 800 W and at a frequency of about 10 to about 30 kHz.

15. The apparatus of claim 9, further comprising:

means for filtering out fine particles in sizes equal to or smaller than a predetermined lower limit from the polishing slurry recovered;

means for filtering out large particles in sizes equal to or greater than a predetermined upper limit from the polishing slurry recovered; and

means for controlling a hydrogen ion exponent (pH) of the polishing slurry recovered.

16. The apparatus of claim 15, wherein the large particle filtering means comprises a filter with a pore diameter between 100 μ

m and 200 μ

m, both inclusive.

17. The apparatus of claim 15, wherein the abrasive grains are dispersed again by the re-dispersing means before the fine particles are removed by the fine particle filtering means.