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Electrically programmable photolithography mask

  • US 6,528,217 B2
  • Filed: 03/28/2002
  • Issued: 03/04/2003
  • Est. Priority Date: 02/27/1998
  • Status: Expired due to Term
First Claim
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1. A method of programming an electronically programmable mask, the method comprising:

  • creating a first region of the electronically programmable mask which allows for approximately 100% transmission of light from a light source;

    creating a second region of the electronically programmable mask that allows a lesser percentage of light from the light source than the first region, such that a phase of light passing through the second region is approximately 180 degrees out-of-phase with light passing through the first region;

    creating a third region of the electronically programmable mask that allows a lesser percentage of light from the light source than the first region, such that a phase of light passing through the third region is approximately 180 degrees out-of-phase with light passing through the first region; and

    transmitting light through the electronically programmable mask from the light source.

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