Carbonitride coated component of semiconductor processing equipment and method of manufacturing thereof
First Claim
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1. A process for coating a chamber wall of a plasma etching chamber, the process comprising:
- (a) optionally depositing a first intermediate coating on said chamber wall;
(b) optionally depositing a second intermediate coating on said first intermediate coating or on said chamber wall; and
(c) depositing a carbonitride containing coating on said chamber wall to form an outer erosion resistant surface, said carbonitride containing coating comprising a compound containing at least one element selected from a Group IIB, IIIB, IVB, VB, VIB or VIIB element of the Periodic Table.
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Abstract
A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a carbonitride containing surface and process for manufacture thereof.
102 Citations
21 Claims
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1. A process for coating a chamber wall of a plasma etching chamber, the process comprising:
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(a) optionally depositing a first intermediate coating on said chamber wall;
(b) optionally depositing a second intermediate coating on said first intermediate coating or on said chamber wall; and
(c) depositing a carbonitride containing coating on said chamber wall to form an outer erosion resistant surface, said carbonitride containing coating comprising a compound containing at least one element selected from a Group IIB, IIIB, IVB, VB, VIB or VIIB element of the Periodic Table. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A process for coating a chamber wall of a plasma etching chamber, the process comprising:
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(a) optionally depositing a first intermediate coating on said chamber wall;
(b) optionally depositing a second intermediate coating on said first intermediate coating or on said chamber wall; and
(c) depositing a carbonitride containing coating on said chamber wall to form an outer erosion resistant surface, the carbonitride in said carbonitride containing coating comprising boron carbonitride, zirconium carbonitride or titanium carbonitride. - View Dependent Claims (9, 10)
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11. A chamber wall of a plasma etching chamber comprising:
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an optional first intermediate coating on said chamber wall;
an optional second intermediate coating on said first intermediate coating or on said chamber wall; and
a carbonitride containing coating on said chamber wall that forms an outer corrosion resistant surface, said carbonitride containing coating comprising a compound containing at least one element selected from a Group IIB, IIIB, IVB, VB, VIB or VIIB element of the Periodic Table. - View Dependent Claims (12, 13, 14, 15, 16)
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17. A chamber wall of a plasma etching chamber comprising:
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an optional first intermediate coating on said chamber wall;
an optional second intermediate coating on said first intermediate coating or on said chamber wall; and
a carbonitride containing coating on said chamber wall that forms an outer corrosion resistant surface, said carbonitride in said carbonitride containing coating comprising boron carbonitride, zirconium carbonitride, titanium carbonitride, or mixtures thereof. - View Dependent Claims (18, 19, 20)
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21. A chamber wall of a plasma etching chamber having at least one surface exposed to plasma in the chamber, the chamber wall comprising a carbonitride containing material forming a surface exposed to plasma in the chamber, the carbonitride containing material comprising a compound containing at least one element selected from a Group IIB, IIIB, IVB, VB, VIB or VIIB element of the Periodic Table.
Specification