Apparatus and method for endpoint control and plasma monitoring

• US 6,535,779 B1
• Filed: 03/06/1998
• Issued: 03/18/2003
• Est. Priority Date: 03/06/1998
• Status: Expired due to Fees

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Poslavsky, Leonid, Birang, Manush, Kolte, Gregory L., Doyle, Terry Lee, Johansson, Nils, Luscher, Paul E.
• Primary Examiner(s): Sheikh, Ayaz
• Assistant Examiner(s): Backer, Firmin
• Application Number:
  US09/036,217
• Time in Patent Office: 1,838 Days
• Field of Search: 700/121, 700/56, 700/112, 700/114, 700/258, 700/362, 713/500, 713/601, 714/57, 118/714, 118/715, 415/5, 415/7, 340/825.06, 340/825.22
• US Class Current: 700/121
• CPC Class Codes: G05B 2219/25171 Serial, RS232
• CPC Class Codes: G05B 2219/2602 Wafer processing
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: H01J 37/32963 End-point detection
• CPC Class Codes: H01L 22/26 Acting in response to an ongoing measurement without interruption of processing, e.g. endpoint detection, in-situ thickness measurement endpoint detection arrangements in CMP apparatus B24B37/013, in discharge apparatus H01J37/32

Abstract

A substrate processing system having a bi-directional interface and concomitant communication protocol to allow a controller to communicate with an external endpoint system is disclosed. More specifically, the substrate processing system comprises a controller and an endpoint detection system that are coupled together via a RS-232 interface. A SECS compliant communication protocol is employed to effect communication between the controller and endpoint detection system to increase wafer processing information exchange and data exchange.

Claims

1. A process monitoring system capable of monitoring a substrate processing step in a processing chamber, the process monitoring system comprising:

a controller capable of operating the processing chamber to perform the substrate processing step and generating a plurality of first signals comprising a signal that communicates a start of performing the substrate processing step in the processing chamber;

an endpoint destection capable of detecting an endpoint of the substrate processing step and generating one or more second signals that communicate that the endpoint has been reached; and

a bi-directional communication link coupling the endpoint detection system and the controller, the bi-directional communication link adapted to pass the first signals from the controller to the endpoint detection system and the second signals from the endpoint detection system to the controller.

2. A process monitoring system according to claim 1 wherein the bi-directional communication link comprises a serial interface.

3. A process monitoring system according to claim 1 wherein the bi-directional communication link comprises an ethernet interface.

4. A process monitoring system according to claim 1 wherein the first signals generated by the controller and passed by the bi-directional communication link to the endpoint detection system comprise a message to one or more of:

indicate that an RF power applied to the processing chamber has been changed; and

transfer an endpoint detection algorithm.

5. A process monitoring system according to claim 1 wherein the second signals generated by the endpoint detection system and passed by the bi-directional communication link to the controller comprise a message to provide information relating to a fault, a warning, or an event condition in the processing chamber.

6. A process monitoring system according to claim 1 wherein the first or second signals passed by the bi-directional communication link comprise a message to provide one or more of:

a function in a header of a signal;

time information capable of synchronizing the controller with the endpoint detection system;

a value to define a command function;

a status message or a response to a status message;

a request for information;

substrate information;

remote command information; and

host or time information.

7. A method of monitoring a substrate processing step in a processing chamber, the method comprising the steps of:

providing a controller capable of operating the processing chamber to perform the substrate processing step, an endpoint detection system capable of detecting an endpoint of the substrate processing step, and a bi-directional communication link coupling the endpoint detection system and the controller;

generating a plurality of first signals and sending the first signals from the controller to the endpoint detection system by the bi-directional communication link, the first signals comprising a signal that communicates a start of performing the substrate processing step; and

generating one or more second signals and sending the second signals from the endpoint detection system to the controller by the bi-directional communication link, the second signals communicating an endpoint of the substrate processing step.

8. A method according to claim 7 wherein the first or second signals have a format that is in accordance with an equipment standard.

9. A method according to claim 7 wherein said bi-directional communication link comprises a serial or ethernet interface.

10. A method according to claim 7 comprising defining a function of the first or second signals in a header of the first or second signals.

11. A method according to claim 7 wherein the first or second signals provide time information capable of synchronizing the controller with the endpoint detection system.

12. A method according to claim 7 wherein the first or second signals carry a value to define a command function.

13. A method according to claim 7 wherein the first or second signals comprise a status message or a response to a status message.

14. A method according to claim 7 wherein the first or second signals comprise a message requesting information.

15. A method according to claim 7 wherein the first or second signals carry an algorithm number and substrate information.

16. The method of claim 10, where said at least one message is a system status message.

17. The method of claim 16, wherein said system status message carries a fault, a warning, or an event condition from the endpoint detection system.

18. A method according to claim 7 wherein the first or second signals carry substrate information.

19. A method according to claim 7 wherein the first or second signals carry remote command information.

20. A method according to claim 7 wherein the first or second signals carry host or time information.

21. A method according to claim 7 comprising sending a first signal to transfer an endpoint detection algorithm.

22. A method according to claim 7 comprising sending a plurality of messages from the endpoint detection system to the controller and sending a plurality of messages from the controller to the endpoint detection system.

23. A method according to claim 7 comprising sending a first signal comprising a message to one or more of

indicate that an RF power applied to the processing chamber has been changed; and

select an endpoint algorithm.

24. A process monitoring system capable of monitoring substrate processing steps in a plurality of processing chambers, the process monitoring system comprising:

a controller capable of operating the processing chambers to perform the substrate processing steps, and generating a plurality of first signals that communicate a start of performing the substrate processing steps and transfer one or more endpoint detection algorithms;

an endpoint detection system capable of detecting an endpoint of the substrate processing step in each processing chamber and generating one or more second signals communicating that the endpoint has been reached; and

a bi-directional communication link coupling the endpoint detection system and the controller, the bi-directional communication link adapted to pass the first signals from the controller to the endpoint detection system and the second signal from the endpoint detection system to the controller.

25. A process monitoring system according to claim 24 wherein the signals comprise messages, and wherein the bi-directional communication link is adapted to pass a plurality of messages from the endpoint detection system to the controller and from the controller to the endpoint detection system.

26. A process monitoring system according to claim 24 wherein the first signals generated by the controller and passed by the bi-directional communication link comprise a message to indicate that an RF power applied to the processing chamber has been changed.

27. A process monitoring system according to claim 24 wherein the endpoint detection system generates a second signal that comprises a message to provide information relating to a fault, a warning, or an event condition in the processing chamber.

28. A process monitoring system according to claim 24 wherein the first or second signals passed by the bi-directional communication link comprise a message to provide one or more of:

a function in a header of a signal;

time information capable of synchronizing the controller with the endpoint detection system;

a value to define a command function;

a status message or a response to a status message;

a request for information;

substrate information;

remote command information; and

host or time information.

29. A method of monitoring substrate processing steps in a plurality of processing chambers, the method comprising:

providing a controller capable of operating the plurality of processing chambers to perform the substrate processing steps and generating a plurality of first signals that communicate one or more starts of performing the substrate processing steps and transfer one or more endpoint detection algorithms;

providing an endpoint detection system capable of detecting endpoints of the substrate processing steps in each process chamber and generating a plurality of second signals communicating that the endpoints have been reached;

carrying source information on the first signal and second signal; and

sending the first signals from the controller to the endpoint detection system and the second signals from the endpoint detection system to the controller by a bi-directional communication link.

30. A method according to claim 29 wherein the first or second signals have a format that is in accordance with an equipment standard.

31. A method according to claim 29 wherein the bi-directional communication link comprises a serial or ethernet interface.

32. A method according to claim 29 comprising sending a first signal comprising a message to one or more of:

indicate that an RF power applied to the processing chamber has been changed; and

select an endpoint algorithm.

33. A method according to claim 29 comprising sending a second signal comprising a message to provide information relating to a fault, a warning, or an event condition in the processing chamber.

34. A method according to claim 29 wherein the first or second signals comprise a message to provide one or more of:

a function in a header of a signal;

time information capable of synchronizing the controller with the endpoint detection system;

a value to define a command function;

a status message or a response to a status message;

a request for information;

substrate information;

remote command information; and

host or time information.

35. A method of monitoring substrate processing steps in a plurality of processing chambers, the method comprising:

providing a controller capable of operating the processing chambers to perform the substrate processing steps, and generating a plurality of first signals that communicate starting the substrate processing steps and that transfer endpoint detection algorithms to the endpoint detection system;

providing an endpoint detection system capable of detecting one or more endpoints of the substrate processing steps in each processing chamber and generating a plurality of second signals related to the endpoint; and

sending the first signals from the controller to the endpoint detection system and the second signals from the endpoint detection system to the controller by a bi-directional communication link such that the controller receives one of the second signals related to the endpoints within about 50 milliseconds of being sent by the endpoint detection system.

36. A method according to claim 35 wherein the signals have a format that is in accordance with an equipment standard.

37. A method according to claim 35 wherein the bi-directional communication link comprises a serial or ethernet interface.

38. A method according to claim 35 comprising sending a first signal comprising a message to one or more of:

indicate that an RF power applied to the processing chamber has been changed; and

select an endpoint algorithm.

39. A method according to claim 35 comprising sending a second signal comprising a message to provide information relating to a fault, a warning, or an event condition in the processing chamber.

40. A method according to claim 35 wherein the first or second signals comprise a message to provide one or more of:

a function in a header of a signal;

time information capable of synchronizing the controller with the endpoint detection system;

a value to define a command function;

a status message or a response to a status message;

a request for information;

substrate information;

remote command information; and

host or time information.