Method and apparatus for transferring and supporting a substrate
First Claim
Patent Images
1. An apparatus for supporting a substrate, comprising:
- a base plate defining an opening at an interior portion thereof, wherein the base plate is adapted to be mounted on a pedestal and receive one or more lift pins from the pedestal; and
one or more substrate support members mounted on the base plate and forming a portion of an outer perimeter of the opening, wherein the one or more substrate support members comprise an upper portion, a lower portion, and a tapered portion disposed between the upper portion and lower potion for receiving a substrate vertically displaced above the base plate.
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Abstract
A method and apparatus for supporting and transferring a substrate in a semiconductor wafer processing system. In one aspect, a support ring having one or more substrate support members mounted thereon and defining a central opening therein for receipt of a substrate support member during processing is disclosed. In another aspect, a substrate handler blade having a plurality of substrate supports disposed thereon is provided which is adapted to support a substrate thereon and effectuate substrate transfer between the substrate handler blade and the support ring.
82 Citations
22 Claims
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1. An apparatus for supporting a substrate, comprising:
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a base plate defining an opening at an interior portion thereof, wherein the base plate is adapted to be mounted on a pedestal and receive one or more lift pins from the pedestal; and
one or more substrate support members mounted on the base plate and forming a portion of an outer perimeter of the opening, wherein the one or more substrate support members comprise an upper portion, a lower portion, and a tapered portion disposed between the upper portion and lower potion for receiving a substrate vertically displaced above the base plate. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A substrate processing system, comprising:
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a transfer chamber;
at least one processing chamber having;
a pedestal including a support surface and one or more pedestal support members;
a support ring having a base plate defining an opening at an interior portion thereof, wherein the base plate is adapted to be mounted on a support surface and one or more substrate support members mounted on the base plate and forming a portion of an outer perimeter of the opening, wherein the one or more substrate support members comprise an upper portion, a lower portion, and a tapered portion disposed between the upper portion and lower potion and one or more support member openings extending therethrough configured to accept the one or more pedestal substrate support members;
one or more loadlock chambers; and
a substrate handler disposed in the transfer chamber. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15)
the one or more retaining members including;
one or more retaining wings extending parallel along the center portion from the first end of the base plate, wherein the one or more retaining wings justify the substrate to the center portion of the base plate; and
one or more retaining fingers extending from the second end of the base plate, wherein the one or more retaining fingers justify the substrate to the center portion of the base plate.
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14. The substrate processing system of claim 13, wherein the substrate handler blade further comprises one or more inclined support surfaces disposed on the base plate, wherein the one or more inclined support surfaces justify the substrate to the center portion of the base plate.
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15. The substrate processing system of claim 14, wherein the inclined surfaces have an angle of between about 2°
- and about 7°
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- and about 7°
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16. A processing chamber, comprising:
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an enclosure defining a process region;
a pedestal having a substrate support surface and one or more pedestal substrate support members disposed in the enclosure; and
a base plate defining an opening at an interior portion thereof configured to receive the substrate support surface and one or more substrate support members mounted on the base plate and forming a portion of an outer perimeter of the opening, wherein the one or more substrate support members are adapted to accept a substrate and have one or more support member openings extending therethrough configured to accept the one or more pedestal substrate support members. - View Dependent Claims (17, 18, 19, 20)
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21. A substrate handler blade, comprising:
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a base plate having a first end and a second end;
a shoulder coupled to the first end of the base plate;
one or more inclined support surfaces disposed on the base plate and coupled to the shoulder;
one or more retaining wings extending from the first end of the base plate, wherein the one or more retaining wings comprise a base portion, an end portion, and an inclined surface from the base portion to the end portion; and
one or more retaining fingers disposed on the second end of the base plate, wherein the one or more retaining fingers comprise a base portion, an end portion, and an inclined surface from the base portion to the end portion. - View Dependent Claims (22)
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Specification