Exposure device

• US 6,538,682 B2
• Filed: 12/28/2001
• Issued: 03/25/2003
• Est. Priority Date: 12/28/2000
• Status: Active Grant

• Current Assignee: Fujifilm Corporation (Fujifilm Holdings Corporation)
• Original Assignee: Fuji Photo Film Co Limited (Fujifilm Holdings Corporation)
• Inventors: Ohkubo, Kazunobu
• Primary Examiner(s): Mathews, Alan A.
• Application Number:
  US10/029,177
• Publication Number:
  US 20020085187A1
• Time in Patent Office: 452 Days
• Field of Search: 347/238, 347/241, 347/242, 347/244, 355/18, 355/41
• US Class Current: 347/241
• CPC Class Codes: G03B 27/52 Details
• CPC Class Codes: G03F 7/70375 Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
• CPC Class Codes: G03F 7/70391 Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays

Abstract

The present invention provides an exposure device in which availability of the emitted light is high, optical crosstalk is reduced, and an image can be formed at high resolution. Concave microlenses are formed on one surface of the exposure device facing a photosensitive material, and organic EL elements are formed on the other surface. The organic EL elements are disposed at some of portions at which anode lines and cathode lines intersect each other. A diameter D of an aperture of the microlens is n times an array pitch p of each organic EL element, n lines of the cathode lines are formed, and the organic EL elements arranged on one cathode line are shifted from those on another cathode line in a main-scanning direction by the array pitch p. Accordingly, exposure spots, which are exposed by the organic EL elements incorporated in the n lines of the cathode lines, are offset without overlapping one another, and the entire photosensitive material can be exposed.

Claims

1. An exposure device comprising:

a transparent substrate;

rows which are formed on the transparent substrate, the rows including electric field light emitting elements arranged in a main-scanning direction and separated from one another at a predetermined spacing, the rows being arranged in a sub-scanning direction, and the electric field light emitting elements each including a light emitting portion; and

microlenses, each one of which is formed on the transparent substrate so as to correspond to one of the electric field light emitting elements and focuses light emitted from the light emitting portion of the one electric field light emitting element for exposing an object to be exposed, wherein

the one microlens has an aperture which is larger than an array pitch of the one corresponding electric field light emitting element, and

the electric field light emitting elements are arranged such that a portion corresponding to a gap between portions exposed by the light emitting portions of one of the rows can be exposed by one of the light emitting portions of an adjacent one of the rows.

2. The device of claim 1, wherein each of the light emitting portions of the electric light field emitting elements is formed so as to have a predetermined dimension in at least one of the main-scanning direction and the sub-scanning direction, a number of the rows arranged in the sub-scanning direction is n, where n is an integer of at least 2, an array pitch between the electric field light emitting elements within each row is px, and the electric field light emitting elements are arranged such that an array pitch in the main-scanning direction of the light emitting portions of the one row relative to the light emitting portions of the adjacent row is p, wherein p satisfies the relationship p=px/n.

3. The device of claim 2, wherein an aperture diameter D of the one microlens satisfies relationships D≦

px, and D≦

(py²+p²)^1/2, wherein py represents an array pitch in the sub-scanning direction of the row of elements.

4. The device of claim 1, wherein a number of the rows arranged in the sub-scanning direction is n, where n is an integer of at least 2, the electric field light emitting elements are arranged such that the light emitting portions of the one row are displaced in the main-scanning direction relative to the light emitting portions of the adjacent row by an array pitch p, and an aperture diameter D of the one microlens is substantially n times the array pitch p.

5. The device of claim 2, wherein a number of the rows arranged in the sub-scanning direction is n, where n is an integer of at least 2, the electric field light emitting elements are arranged such that the light emitting portions of the one row are displaced in the main-scanning direction relative to the light emitting portions of the adjacent row by an array pitch p, and an aperture diameter D of the one microlens is substantially n times the array pitch p.

6. The device of claim 1, wherein the microlens is a convex lens formed at a light emitting side of the transparent substrate.

7. The device of claim 1, wherein the microlens is a distribution refracting lens formed inside the transparent substrate.

8. The device of claim 1, wherein the microlens is a combination lens of a convex lens formed at a light emitting side of the transparent substrate and a distribution refracting lens formed inside the transparent substrate.

9. The device of claim 1, wherein the electric field light emitting element is an organic electric field light emitting element.

10. The device of claim 1, wherein the neighboring microlenses are formed in close contact with one another.

11. The device of claim 10, wherein the respective apertures of the neighboring microlenses partially overlap.

12. An exposure device comprising:

a transparent substrate;

rows which are formed on the transparent substrate, the rows including electric field light emitting elements arranged in a main-scanning direction and separated from one another at a predetermined spacing, the rows being arranged in a sub-scanning direction, the electric field light emitting elements each including a light emitting portion, and the electric field light emitting elements being arranged so as to form a plurality of sets, each set including electric field light emitting elements that have mutually different light emitting wavelengths arranged in one of the main-scanning direction and the sub-scanning direction; and

microlenses each one of which is formed on the transparent substrate so as to correspond to one of the sets of electric field light emitting elements, and focuses light emitted from the light emitting portions of the one set for exposing an object to be exposed, wherein

the each one of the microlenses has an aperture which is larger than an array pitch of each of the electric field light emitting elements forming the one set of electric field light emitting elements, and

the electric field light emitting elements are arranged so that a portion corresponding to a gap between portions exposed by light emitting portions of one light emitting wavelength in one of the rows can be exposed by one of light emitting portions, of the one light emitting wavelength in an adjacent one of the rows.

13. The device of claim 12, wherein the microlens is a convex lens formed at a light emitting side of the transparent substrate.

14. The device of claim 12, wherein the microlens is a distribution refracting lens formed inside the transparent substrate.

15. The device of claim 12, wherein the microlens is a combination lens of a convex lens formed at a light emitting side of the transparent substrate and a distribution refracting lens formed inside the transparent substrate.

16. The device of claim 12, wherein the electric field light emitting element is an organic electric field light emitting element.

17. The device of claim 12, wherein the neighboring microlenses are formed in close contact with one another.

18. The device of claim 17, wherein the respective apertures of the neighboring microlenses partially overlap.