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Process and apparatus for applying charged particles to a substrate, process for forming a layer on a substrate, products made therefrom

  • US 6,544,599 B1
  • Filed: 07/31/1996
  • Issued: 04/08/2003
  • Est. Priority Date: 07/31/1996
  • Status: Expired due to Term
First Claim
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1. A method for deposition of particles onto a substrate, the method comprising:

  • (a) providing dry particles with electrostatic charges to form dry charged particles;

    (b) providing the substrate with an electrostatic potential suitable to electrostatically attract the dry charged particles;

    (c) contacting the dry charged particles with the substrate to form a particle coated substrate;

    (d) growing a polycrystalline layer on the particle coated substrate;

    wherein the particles comprise at least one selected from the group consisting of cubic boron nitride, tungsten carbide, silicon carbide, aluminum oxide, silicon nitride, yttrium-based superconductors, thallium-based superconductors, and combinations thereof, and wherein the substrate comprises at least one selected from the group consisting of silica, silicon, alumina, molybdenum, steel, silicon carbide, tungsten carbide, tungsten, silicon nitride, nickel, yttrium-based superconductors, thallium-based superconductors and combinations thereof; and

    (e) forming a crystalline layer onto the particles, wherein the crystalline layer comprises at least one selected from the group consisting of cubic boron nitride, tungsten carbide, silicon carbide, aluminum oxide, silicon nitride, and combinations thereof.

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