Photo-sensor cross-section for increased quantum efficiency

• US 6,545,258 B2
• Filed: 03/30/2001
• Issued: 04/08/2003
• Est. Priority Date: 03/30/2001
• Status: Expired due to Term

• Current Assignee: Pixim, Inc. (Sony Group Corp.)
• Original Assignee: Pixim, Inc. (Sony Group Corp.)
• Inventors: Yang, David X. D., Bidermann, William R., Tian, Hui, Wei, Yi-Hen
• Primary Examiner(s): Epps, Georgia
• Assistant Examiner(s): HARRINGTON, ALICIA M
• Application Number:
  US09/822,036
• Publication Number:
  US 20020139922A1
• Time in Patent Office: 739 Days
• Field of Search: 250/214.1, 250/208.1, 250/239, 250/216, 257/80, 257/81, 257/82, 257/83, 257/84, 257/422, 257/433, 257/291, 257/290, 438/57, 438/69, 438/73, 438/75, 438/91, 438/94, 438/93, 438/96, 438/144
• US Class Current: 250/214.1
• CPC Class Codes: H01L 31/103 the potential barrier being of the PN homojunction type

Abstract

Photo-sensors, such as photo-diodes, are formed using regions with cross-sections that increase the overall quantum efficiency of the resulting photo-sensor. The cross-sections have additional (e.g., interior) side-wall interfaces, and, in some embodiments, an additional, relatively shallow bottom interface. The increased total side-wall area and any additional shallow bottom area increase the total photo-junction volume located near the surface of the device. As a result, a greater fraction of photons having relatively small absorption lengths (e.g., blue light) will be absorbed within a photo-junction, thereby increasing the quantum efficiency for those photons. The present invention enables photo-sensors to be implemented with more uniform spectral response.

Claims

1. An integrated circuit having a photo-sensing element, the photo-sensing element comprising:

(a) a first region formed within a substrate defining a horizontal substrate plane; and

(b) a second region located within the first region, wherein;

a cross-section of the photo-sensing element vertical to the substrate plane defines;

(1) a set of interior side-wall interfaces between the first region and the second region;

(2) a set of exterior side-wall interfaces between the first region and the substrate; and

(3) a set of one or more horizontal interfaces between the first region and the substrate, such that a horizontal line can be drawn through the vertical cross-section that would cross a first exterior side-wall interface, followed by a first interior side-wall interface, followed by a second interior side-wall interface, followed by a second exterior side-wall interface; and

the second region is contiguous with the substrate.

2. The invention of claim 1, wherein the photo-sensing element is a photo-diode, a photo-transistor, a photo-gate, photo-conductor, a charge-coupled device, a charge-transfer device, or a charge-injection device.

3. The invention of claim 1, wherein the first region has a layout shape defined by an inner polygon circumscribed within an outer polygon, wherein the interior of the inner polygon defines the second region.

4. The invention of claim 1, wherein the second region forms a channel running to at least one side of the first region, wherein the second region is contiguous with the substrate at the at least one side of the first region.

5. The invention of claim 4, wherein the channel formed by the second region runs across the first region such that the second region is contiguous with the substrate at opposing sides of the first region.

6. The invention of claim 4, wherein the channel formed by the second region runs across the first region such that the second region is contiguous with the substrate at only one side of the first region.

7. A method for fabricating an integrated circuit having a photo-sensing element comprising:

forming a first region formed within a substrate defining a horizontal substrate plane; and

forming a second region located within the first region, wherein;

a cross-section of the photo-sensing element vertical to the substrate plane defines;

a set of interior side-wall interfaces between the first region and the second region;

a set of exterior side-wall interfaces between the first region and the substrate; and

a set of one or more horizontal interfaces between the first region and the substrate, such that a horizontal line can be drawn through the vertical cross-section that would cross a first exterior side-wall interface, followed by a first interior side-wall interface, followed by a second interior side-wall interface, followed by a second exterior side-wall interface; and

the second region is contiguous with the substrate.

8. The invention of claim 7, wherein the photo-sensing element is a photo-diode, a photo-transistor, a photo-gate, photo-conductor, a charge-coupled device, a charge-transfer device, or a charge-injection device.

9. The invention of claim 7, wherein the first region has a layout shape defined by an inner polygon circumscribed within an outer polygon, wherein the interior of the inner polygon defines the second region.

10. The invention of claim 7, wherein the second region forms a channel running to at least one side of the first region, wherein the second region is contiguous with the substrate at the at least one side of the first region.

11. The invention of claim 10, wherein the channel formed by the second region runs across the first region such that the second region is contiguous with the substrate at opposing sides of the first region.

12. The invention of claim 10, wherein the channel formed by the second region runs across the first region such that the second region is contiguous with the substrate at only one side of the first region.