Apparatus and method for analyzing functional failures in integrated circuits

• US 6,549,022 B1
• Filed: 06/02/2000
• Issued: 04/15/2003
• Est. Priority Date: 06/02/2000
• Status: Active Grant

• Current Assignee: Globalfoundries US Incorporated (GlobalFoundries, Inc.), Science & Technology Corporation
• Original Assignee: Advanced Micro Devices, Inc., Sandia Corporation (Martin Marietta Corporation)
• Inventors: Tangyunyong, Paiboon, Cole, Edward I. Jr., Hawkins, Charles F., Bruce, Victoria J., Bruce, Michael R., Ring, Rosalinda M.
• Primary Examiner(s): Cuneo, Kamand
• Assistant Examiner(s): TANG, MINH NHUT
• Application Number:
  US09/586,505
• Time in Patent Office: 1,047 Days
• Field of Search: 324/73.1, 324/750-752, 324/765, 324/158.1, 324/500, 324/537, 250/234-235, 250/559.07, 250/311, 250/492.2
• US Class Current: 324/754.23
• CPC Class Codes: G01R 31/308 using non-ionising electromagnetic radiation, e.g. optical radiation investigating or analysing materials by the use of optical means G01N21/00; image analysis G06T7/00

Abstract

An apparatus and method are presented for identifying and mapping functional failures in an integrated circuit (IC) due to timing errors therein based on the generation of functional failures in the IC. This is done by providing a set of input test vectors to the IC and adjusting one or more: of the IC voltage, temperature or clock frequency; the rate at which the test vectors are provided to the IC; or the power level of a focused laser beam used to probe the IC and produce localized heating which changes the incidence of the functional failures in the IC which can be sensed for locating the IC circuit elements responsible for the functional failures. The present invention has applications for optimizing the design and fabrication of ICs, for failure analysis, and for qualification or validation testing of ICs.

Claims

1. An apparatus for analyzing an integrated circuit (IC) to identify at least one circuit element responsible for producing a functional failure in the IC, comprising:

(a) means for operating the IC under conditions wherein the functional failure occurs, with the functional failure producing over time a fraction of defective output states and a remainder of good output states at an output from the IC in response to a set of input test vectors repeatedly provided to the IC;

(b) a laser producing a beam having a photon energy less than a bandgap energy of a substrate whereon the IC is formed;

(c) means for focusing and scanning the laser beam across the IC, thereby producing localized heating within the IC that generates a change in the fraction of defective output states from the IC, the focusing and scanning means further providing a position signal to indicate the location of the laser beam on the IC at any instant in time; and

(d) means, receiving inputs of the position signal and the change in the fraction of defective output states from the IC, for mapping the location of each circuit element within the IC responsible for the change in the fraction of defective output states from the IC.

2. The apparatus of claim 1 wherein the circuit element within the IC producing the functional failure is a resistive interconnection.

3. The apparatus of claim 1 wherein the circuit element within the IC producing the functional failure comprises a transistor.

4. The apparatus of claim 3 wherein the transistor is a switching transistor.

5. The apparatus of claim 1 wherein the means for operating the IC under conditions wherein the functional failure occurs comprises means for controlling a power level of the laser beam.

6. The apparatus of claim 1 wherein the means for operating the IC under conditions wherein the functional failure occurs comprises a constant-voltage power supply providing an operating voltage to the IC.

7. The apparatus of claim 6 wherein the means for operating the IC under conditions wherein the functional failure occurs further comprises a temperature-controlled stage for holding the IC and maintaining the IC at a selected temperature.

8. The apparatus of claim 6 wherein the means for operating the IC under conditions wherein the functional failure occurs further comprises a clock for operating the IC at a selected frequency.

9. The apparatus of claim 6 wherein the means for operating the IC under conditions wherein the functional failure occurs further comprises means for controlling a rate at which the set of input test vectors are repeatedly provided to the IC.

10. The apparatus of claim 9 wherein the means for controlling a rate at which the set of input test vectors are repeatedly provided to the IC comprises a digital IC tester or a computer-controlled switch matrix.

11. The apparatus of claim 1 wherein the substrate comprises silicon.

12. The apparatus of claim 1 wherein the photon energy of the laser beam is insufficient to produce a photocurrent in the IC.

13. The apparatus of claim 1 wherein the photon energy of the laser beam is at a wavelength in the range of 1.2 microns to 2.5 microns.

14. The apparatus of claim 13 wherein the photon energy of the laser beam is at a wavelength of about 1.3 microns.

15. The apparatus of claim 1 wherein the means for focusing and scanning the laser beam across the IC comprises a scanning optical microscope.

16. The apparatus of claim 1 wherein the means for focusing and scanning the laser beam across the IC comprises at least one lens or curved mirror for focusing the laser to a spot.

17. The apparatus of claim 16 wherein the laser beam is focused to a spot after being transmitted through the substrate.

18. The apparatus of claim 16 wherein the means for focusing and scanning the laser beam across the IC further comprises a plurality of moveable mirrors arranged to scan the laser beam in two dimensions.

19. The apparatus of claim 1 wherein the mapping means comprises a display for displaying a map indicating the location of the circuit element in the IC responsible for the change in the fraction of defective output states from the IC.

20. The apparatus in claim 19 wherein the mapping means further comprises an image processor.

21. The apparatus of claim 1 wherein the mapping means comprises a computer for storing information about the location of the circuit elements in the IC responsible for the change in the fraction of defective output states from the IC.

22. The apparatus of claim 1 wherein the mapping means comprises a photodetector for detecting a portion of the laser beam reflected or scattered from the IC, with the photodetector providing a detector output signal for generating in combination with the position signal a reflected-light image of the IC being analyzed.

23. An apparatus for analyzing an integrated circuit (IC) to locate any signal propagation paths that produce timing errors within the IC that result in an incorrect value of an output voltage from the IC, comprising:

(a) means for operating the IC under conditions which produce an incidence of the timing errors in the IC in response to a set of input test vectors provided to the IC;

(b) a laser having a laser beam with a photon energy less than a bandgap energy of a semiconductor substrate whereon the IC is formed;

(c) a scanning optical microscope for receiving the laser beam and producing therefrom a focused laser beam which is scanned across a portion of the IC, with the scanning optical microscope further generating a position signal indicative of the position of the focused laser beam at any instant in time, and with the focused laser beam producing localized heating within the IC that changes the incidence of the timing errors in the IC;

(d) means connected to the IC for measuring the output voltage from the IC and generating therefrom an analytical output signal whenever the output voltage switches between the incorrect value and a correct value; and

(e) a display for receiving the position signal and the analytical output signal and generating therefrom a map for locating each signal propagation path within the IC responsible for producing the timing errors.

24. The apparatus of claim 23 wherein the means for operating the IC to produce the incidence of timing errors therein comprises means for controlling a power level of the laser beam.

25. The apparatus of claim 23 wherein the means for operating the IC to produce the incidence of timing errors therein comprises a stage for heating or cooling the IC.

26. The apparatus of claim 23 wherein the means for operating the IC to produce the incidence of timing errors therein comprises a power supply for providing an operating voltage to the IC.

27. The apparatus of claim 23 wherein the means for operating the IC to produce the incidence of timing errors therein comprises a clock for operating the IC at a selected frequency.

28. The apparatus of claim 23 wherein the means for operating the IC to produce the incidence of timing errors therein comprises means for controlling a rate at which the set of input test vectors are provided to the IC.

29. The apparatus of claim 28 wherein the means for controlling the rate at which the set of input test vectors are provided to the IC comprises a digital IC tester or a computer-controlled switch matrix.

30. The apparatus of claim 23 wherein the substrate comprises silicon.

31. The apparatus of claim 23 wherein the photon energy of the laser beam is insufficient to produce a photocurrent in the IC.

32. The apparatus of claim 23 wherein the photon energy of the laser beam is at a wavelength in the range of 1.2 microns to 2.5 microns.

33. The apparatus of claim 32 wherein the wavelength is about 1.3 microns.

34. The apparatus of claim 23 further including an optical filter placed in a path of the laser beam to remove any light having a photon energy greater than or equal to the bandgap energy of the semiconductor substrate.

35. The apparatus of claim 23 wherein the scanning optical microscope comprises at least one lens or curved mirror for focusing the laser beam to a spot.

36. The apparatus of claim 35 wherein the laser beam is focused to a spot after being transmitted through the substrate.

37. The apparatus of claim 23 wherein the scanning optical microscope further includes a photodetector for detecting a portion of the laser beam reflected or scattered from the IC and generating a detector output signal therefrom.

38. The apparatus of claim 37 wherein the display further receives the detector output signal, and in combination with the position signal, the display generates a reflected-light image of the IC for superposition with the map to pinpoint the location of each signal propagation path within the IC responsible for producing the timing errors.

39. The apparatus of claim 23 wherein the means for measuring the output voltage from the IC and generating the analytical output signal comprises a latch which switches between a pair of logic states therein in response to a change in the output voltage from the IC from the incorrect value to the correct value, or from the correct value to the incorrect value.

40. The apparatus of claim 23 further including an image processor for accumulating a plurality of maps over time generated from the position signal and the analytical output signal, and generating therefrom an enhanced-resolution map for more precisely locating each signal propagation path within the IC responsible for producing the timing errors.

41. The apparatus of claim 23 further including a computer for storing information about the location of each signal propagation path producing the timing errors in the IC.

42. The apparatus of claim 23 wherein the signal propagation path that produces the timing errors comprises an interconnection having a resistance different from the resistance of other similar interconnections in the IC which do not produce timing errors.

43. The apparatus of claim 23 wherein the signal propagation path that produces the timing errors includes at least one switching transistor.

44. A method for analyzing an integrated circuit (IC) and identifying any circuit elements in the IC responsible for producing functional failures in the IC, comprising steps for:

(a) controlling operational parameters of the IC to induce a level of incidence of the functional failures therein, with the functional failures producing an incorrect value of an output voltage from the IC in response to a set of input test vectors provided to the IC;

(b) scanning the IC with a focused laser beam having a photon energy less than a bandgap energy of a substrate whereon the IC is formed to locally heat circuit elements within the IC, thereby changing the level of incidence of the functional failures in the IC; and

(c) measuring the change in the level of incidence of the functional failures in the IC as a function of the position of the focused laser beam incident on the IC, thereby locating the circuit elements in the IC responsible for producing the functional failures in the IC.

45. The method of claim 44 further including a step for forming a map of the location of the circuit elements in the IC responsible for producing the functional failures in the IC.

46. The method of claim 45 further including a step for forming a reflected-light image of the IC for superposition with the map for precisely locating the circuit elements in the IC responsible for producing the functional failures in the IC.

47. The method of claim 46 wherein the step for forming the reflected-light image of the IC comprises detecting a portion of the focused laser beam reflected or scattered from the IC.

48. The method of claim 44 wherein the step for controlling operational parameters of the IC to induce the level of incidence of the functional failures therein comprises controlling a voltage for powering the IC, controlling the temperature of the IC, controlling a clock frequency provided to the IC, controlling a rate at which the set of input test vectors is provided to the IC, controlling a power level of the focused laser beam, or a combination thereof.

49. The method of claim 44 wherein the substrate comprises silicon, and the step for scanning the IC with the focused laser beam comprises scanning the IC with a focused laser beam having a wavelength in the range of 1.2 to 2.5 microns.

50. The method of claim 49 wherein the focused laser beam has a wavelength of about 1.3 microns.

51. The method of claim 44 wherein the step for scanning the IC with the focused laser beam comprises scanning the IC from a backside of a substrate whereon the IC is formed, with the focused laser beam being transmitted through the substrate.

52. The method of claim 44 wherein the step for scanning the IC with the focused laser beam further comprises generating a position signal for indicating the location of the focused laser beam on the IC at any instant in time.

53. The method of claim 44 wherein the step for measuring the change in the level of incidence of the functional failures in the IC as a function of the position of the focused laser beam incident on the IC comprises comparing the value of the output voltage from the IC at each clock cycle and detecting a change in the value of the output voltage from the IC.

54. The method of claim 53 further including a step for generating an analytical output signal having an intensity that depends upon the value of the output voltage from the IC, with the analytical output signal being in a first state when the output voltage from the IC has an incorrect value, and with the analytical output signal being in a second state when the output voltage from the IC has a correct value.

55. The method of claim 44 wherein the step for measuring the change in the level of incidence of the functional failures in the IC as a function of the position of the focused laser beam incident on the IC comprises repeatedly scanning the IC with the focused laser beam and accumulating changes in the level of incidence of the functional failures in the IC over time, thereby improving a level of detectability of the circuit elements in the IC responsible for producing the functional failures in the IC.