Exposure method and apparatus
First Claim
1. An exposure apparatus for exposing a substrate with an image of a pattern on a mask via a projection optical system, comprising:
- a mask stage which is supported movably with respect to a base member and which is movable in a predetermined direction while holding the mask, the mask stage having a reflective portion;
a mask side reaction force-reducing member which is supported movably with respect to the base member at the outside of the mask stage and which is movable to offset any reaction force generated when the mask stage is driven, the mask side reaction force-reducing member being disposed above the reflective portion of the mask stage;
an interferometer which radiates a measuring beam to the reflective portion to detect a position of the mask stage; and
a driving member which is arranged between the mask stage and the mask side reaction force-reducing member and which drives the mask stage, wherein;
the mask stage includes a first stage member which is movable in a predetermined direction; and
a second stage member which is movable in the predetermined direction together with the first stage member while holding the mask and which is finely movable with respect to the first stage member in a plane parallel to a plane of the base member on which the mask stage is moved, so that a position of the mask is adjusted.
1 Assignment
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Accused Products
Abstract
An exposure apparatus and method exposes a substrate with an image of a pattern on a mask via a projection optical system. The exposure apparatus and method reduce the influence of the driving reaction force of the reticle stage and/or the wafer stage on, for example, the positioning accuracy of the reticle and the wafer so that exposure can be performed highly accurately. The exposure apparatus having a mask stage which includes a first stage member which is movable in a predetermined direction and a second stage member which is movable in the predetermined direction together with the first stage member while holding the mask and which is finely movable with respect to the first stage member in a plane parallel to a plane of the base member on which the mask stage is moved, so that a position of the mask is adjusted.
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Citations
20 Claims
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1. An exposure apparatus for exposing a substrate with an image of a pattern on a mask via a projection optical system, comprising:
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a mask stage which is supported movably with respect to a base member and which is movable in a predetermined direction while holding the mask, the mask stage having a reflective portion;
a mask side reaction force-reducing member which is supported movably with respect to the base member at the outside of the mask stage and which is movable to offset any reaction force generated when the mask stage is driven, the mask side reaction force-reducing member being disposed above the reflective portion of the mask stage;
an interferometer which radiates a measuring beam to the reflective portion to detect a position of the mask stage; and
a driving member which is arranged between the mask stage and the mask side reaction force-reducing member and which drives the mask stage, wherein;
the mask stage includes a first stage member which is movable in a predetermined direction; and
a second stage member which is movable in the predetermined direction together with the first stage member while holding the mask and which is finely movable with respect to the first stage member in a plane parallel to a plane of the base member on which the mask stage is moved, so that a position of the mask is adjusted.- View Dependent Claims (2, 3, 4, 5, 6)
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7. An exposure method for exposing a substrate with an image of a pattern on a mask via a projection optical system, comprising:
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moving a mask stage including a first stage member which is supported movably with respect to a base member and a second stage member which is movable together with the first stage member and holds the mask, while moving a mask side reaction force-reducing member, which is supported movably with respect to the base member and which is arranged at the outside of the first stage member to offset any driving reaction force of the mask stage;
finely moving the second stage member with respect to the first stage member in a plane which is parallel to a plane of the base member on which the mask stage is moved so that a position of the mask is adjusted; and
irradiating a measuring beam to a reflective portion of the second stage to detect a position of the mask, the reflective portion of the second stage being disposed below the mask side reaction force-reducing member. - View Dependent Claims (8)
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9. A method for producing an exposure apparatus for exposing a substrate with an image of a pattern on a mask via a projection optical system, the method comprising assembling the following components in a predetermined positional relationship:
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a mask stage including a first stage member which is movable in a predetermined direction and a second stage member which is movable in the predetermined direction together with the first stage member while holding the mask and which is finely movable with respect to the first stage member, in a plane parallel to a plane on which the first stage member is moved, to adjust a position of the mask;
a mask side reaction force-reducing member which is movable to offset any reaction force generated when the mask stage is driven, at the outside of the mask stage;
a driving member which is arranged between the mask stage and the mask side reaction force-reducing member and which drives the mask stage; and
an interferometer which radiates a measuring beam to a reflective portion of the second stage to detect a position of the second stage, the reflective portion of the second stage being disposed below the mask side reaction force-reducing member. - View Dependent Claims (10)
the mask stage is supported movably by a mask base; and
the mask base and the projection optical system are supported by an identical support member.
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11. An exposure apparatus which exposes a pattern of a mask, comprising:
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a mask stage which moves while holding the mask, the mask stage having a reflective portion;
a reaction force-reducing member disposed outside of the mask stage which moves in a direction opposite to the direction of movement of the mask stage, the reaction force-reducing member being disposed above the reflective portion of the mask stage;
a driver having a first portion connected to the mask stage and a second portion connected to the reaction force-reducing member to move the mask stage; and
a position detector which radiates a measuring beam to the reflective portion of the mask stage to detect a position of the mask stage. - View Dependent Claims (12, 13, 14, 15)
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16. A stage apparatus comprising:
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a movable stage having a reflective portion;
a reaction force-reducing member disposed outside of the movable stage which moves in a direction opposite to the direction of movement of the movable stage, the reaction force-reducing member being disposed above the reflective portion of the movable stage;
a driver having a first portion connected to the movable stage and a second portion connected to the reaction force-reducing member to move the movable stage; and
a position detector which radiates a measuring beam to the reflective portion of the movable stage to detect a position of the movable stage. - View Dependent Claims (17, 18, 19, 20)
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Specification