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Solutions for cleaning silicon semiconductors or silicon oxides

  • US 6,551,972 B1
  • Filed: 04/28/2000
  • Issued: 04/22/2003
  • Est. Priority Date: 07/10/1997
  • Status: Expired due to Fees
First Claim
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1. A solution for cleaning surfaces of silicon semiconductors or silicon oxides comprising H2O2, NH4OH and at least one component A selected from the group consisting of fluoro-containing compounds selected from the group consisting of NH4F and non-metallic fluoride and N(CH3)4OH, wherein the weight ratio of H2O2 to H2O is between 1:

  • 5 and 1;

    50, the weight ratio of NH4OH to H2O is between 1;

    5 and 1;

    50 and the molar ratio of component A to NH4OH is between 1;

    10 and 1;

    5000.

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