×

Method of determining lethality of defects in circuit pattern inspection, method of selecting defects to be reviewed, and inspection system of circuit patterns involved with the methods

  • US 6,556,955 B2
  • Filed: 12/12/2001
  • Issued: 04/29/2003
  • Est. Priority Date: 01/22/1998
  • Status: Expired due to Term
First Claim
Patent Images

1. A method of reviewing defects, comprising the steps of:

  • inputting information of defects on a substrate including coordinate data and size of the defects detected by a detection apparatus;

    identifying cluster of defects detected on the substrate by using the inputted information;

    selecting defects to be reviewed from the cluster identified;

    reviewing the selected defects; and

    classifying the reviewed defects.

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×