Low pressure vapor phase deposition of organic thin films

• US 6,558,736 B2
• Filed: 04/19/2002
• Issued: 05/06/2003
• Est. Priority Date: 11/17/1997
• Status: Expired due to Term

• Current Assignee: The Trustees of Princeton University (Princeton University)
• Original Assignee: The Trustees of Princeton University (Princeton University)
• Inventors: Burrows, Paul E., Ban, Vladimir S., Forrest, Stephen R.
• Primary Examiner(s): MEEKS, TIMOTHY HOWARD
• Application Number:
  US10/125,400
• Publication Number:
  US 20020155230A1
• Time in Patent Office: 382 Days
• Field of Search: 427/64, 427/66, 427/255.6, 427/255.5, 427/255.23, 117/925, 117/927
• US Class Current: 427/64
• CPC Class Codes: C23C 14/12 Organic material
• CPC Class Codes: C23C 14/50 Substrate holders
• CPC Class Codes: C23C 14/54 Controlling or regulating the coating process
• CPC Class Codes: C23C 14/568 Transferring the substrates through a series of coating stations C23C14/562 takes precedence
• CPC Class Codes: C23C 16/30 Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
• CPC Class Codes: C23C 16/45561 Gas plumbing upstream of the reaction chamber
• CPC Class Codes: H10K 71/00 Manufacture or treatment specially adapted for the organic devices covered by this subclass
• CPC Class Codes: H10K 71/10 Deposition of organic active material
• CPC Class Codes: H10K 71/164 using vacuum deposition
• CPC Class Codes: H10K 71/40 Thermal treatment, e.g. annealing in the presence of a solvent vapour
• CPC Class Codes: H10K 85/324 comprising aluminium, e.g. Alq3
• CPC Class Codes: H10K 85/631 Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine

Abstract

Methods for preparing organic thin films on substrates, the method comprising the steps of providing a plurality of organic precursors in the vapor phase, and reacting the plurality or organic precursors at a sub-atmospheric pressure. Also included are thin films made by such a method and apparatuses used to conduct such a method. The method is well-suited to the formation of organic light emitting devices and other display-related technologies.

Claims

1. A method for fabricating an organic film comprising:

providing a substrate in a vacuum chamber;

forming a first molecular beam through a first infector in the chamber, wherein the first molecular beam comprises an inert carrier gas and one or more first organic precursor material;

impinging the first molecular on the substrate so as to deposit the one or more first organic precursor materials on the substrate to form an organic film on the substrate;

wherein, during said impinging vapor phase molecules of the one or more first organic precursor materials in said molecular beam have a mean free path that is larger than the dimensions of the chamber.

2. The method of claim 1, wherein the method further includes forming a second molecular beam through a second injector in the chamber, wherein the second molecular beam comprises one or more additional organic precursor materials;

and

impinging the second molecular beam on the substrate so as to deposit the one or more additional organic precursor materials on the substrate to form the organic film on the substrate, wherein the organic film comprises the one or more first organic precursor materials and the one or more additional organic precursor materials.

3. The method of claim 2, wherein the method further includes reacting at least one of the one or more first precursor materials with at least one of the one or more additional precursor materials on the surface of the substrate to form the organic film.

4. The method of claim 1, wherein at least one of the first organic precursor materials or additional organic materials is provided by bubbling the carrier gas through the organic precursor material.

5. The method of claim 2, wherein at least one of the additional organic materials is provided by heating the organic precursor material in a Knudsen cell.

6. The method of claim 3, wherein the organic film is a non-linear optical film.

7. The method of claim 6, wherein at least one of the first organic precursor materials is selected from the group consisting of 4′

-dimethylamino-4-stilbazole, 4′

-dimethylamino-4-methylstilbazolium thiophenoxide, 4′

-methoxy-4-methylstilbazole, 4′

-dimethylamino-4-ethylstilbazolium iodide and 4′

-dimethylamino-4-ethylstilbazolium hydroxide.

8. The method of claim 6, wherein at least one of the additional organic precursor materials is selected from the group consisting of methyl tosylate, methyl methanesulfonate, methyl trifluoromethanesulfonate, acetyl toluenesulfonate and methyl trifluoroacetate.

9. The method of claim 6, wherein the non-linear optical film is selected from the group consisting of 4′

-dimethylamino-N-methyl-4-stilbazolium tosylate, 4′

-dimethylamino-4-methylstilbazolium methanesulfonate, 4′

-dimethylamino-4-methylstilbazolium trifluoromethanesulfonate, 4′

-methoxy-4-methylstilbazolium tosylate, 4′

-dimethylamino-4-acetylstilbazolium tosylate, and 4′

-dimethylamino-4-methylstilbazolium trifluoroacetate.

10. The method of claim 1, wherein the organic film is a light emitting layer.

11. The method of claim 2, wherein the organic film comprises a charge transfer complex.

12. The method of claim 1, wherein the one or more first organic precursor materials include tetrathisferlvalene and 7,7,8,8-tetracyanoquinodimethane.

13. The method of claim 2, wherein the organic film comprises a guest material in a host material matrix.

14. The method of claim 1, wherein the host material is selected from the group consisting of tris(8-quinoline)aluminum and bis-(8-hydroxyquinoline)aluminum oxyphenyl.

15. The method of claim 1, wherein the guest material is selected from the group consisting of 4-(dicyanomethylene)-2-methyl-6-(p-dimethylaminostyryl)-4H-pyran, 5,10,15,20-tetraphenyl-21H,23H-porphine, DCM2, rubrene and coumarin.

16. The method of claim 1, wherein the substrate comprises a polymer film material, a glass material or a semiconductor material.

17. The method of claim 1, wherein the substrate comprises a layer of indium tin oxide.

18. The method of claim 1, wherein the substrate comprises polyester coated with indium tin oxide.

19. The method of claim 1, wherein the substrate comprises polyester coated with indium tin oxide, which indium tin oxide is coated with a hole transporting layer.

20. The method of claim 1, further comprising rotating the substrate in the chamber.

21. The method of claim 1, wherein the chamber has a base pressure of from 10⁻

8 to 10<sup>−

11</sup> Torr.