Very narrow band, two chamber, high rep rate gas discharge laser system

• US 6,567,450 B2
• Filed: 08/29/2001
• Issued: 05/20/2003
• Est. Priority Date: 12/10/1999
• Status: Expired due to Term

• Current Assignee: Cymer Incorporated (ASML Holding NV)
• Original Assignee: Cymer Incorporated (ASML Holding NV)
• Inventors: Sandstrom, Richard L., Das, Palash P., Brown, Daniel J. W., Fomenkov, Igor V., Ershov, Alexander I., Partlo, William N., Ujazdowski, Richard C., Ness, Richard M., Besaucele, Herve A., Anderson, Stuart L., Myers, David W., Onkels, Eckehard D., Pan, Xiaojiang J.
• Primary Examiner(s): Leung, Quyen
• Assistant Examiner(s): FORDE, DELMA ROSA
• Application Number:
  US09/943,343
• Publication Number:
  US 20020044586A1
• Time in Patent Office: 629 Days
• Field of Search: 372/25, 372/55, 372/57, 372/58, 372/59
• US Class Current: 372/55
• CPC Class Codes: G01J 9/00 Measuring optical phase difference devices or arrangements for controlling the phase of light beams G02F1/01; Determining degree of coherence; Measuring optical wavelength spectrometry G01J3/00
• CPC Class Codes: G03F 7/70025 by lasers
• CPC Class Codes: G03F 7/70041 by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
• CPC Class Codes: G03F 7/70333 Focus drilling, i.e. increase in depth of focus for exposure by modulating focus during exposure [FLEX]
• CPC Class Codes: G03F 7/70483 Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
• CPC Class Codes: G03F 7/70575 Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
• CPC Class Codes: G03F 7/70933 Purge, e.g. exchanging fluid or gas to remove pollutants
• CPC Class Codes: H01S 3/0057 Temporal shaping, e.g. pulse compression, frequency chirping soliton generation and propagation G02F1/3513, H01S3/063 and H01S3/108
• CPC Class Codes: H01S 3/02 Constructional details housings or packages of fibre lasers H01S3/06704
• CPC Class Codes: H01S 3/03 of gas laser discharge tubes
• CPC Class Codes: H01S 3/036 Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube H01S3/031 takes precedence
• CPC Class Codes: H01S 3/038 Electrodes, e.g. special shape, configuration or composition
• CPC Class Codes: H01S 3/0385 Shape
• CPC Class Codes: H01S 3/0387 Helical shape
• CPC Class Codes: H01S 3/0404 Air- or gas cooling, e.g. by dry nitrogen
• CPC Class Codes: H01S 3/041 for gas lasers H01S3/0401 takes precedence
• CPC Class Codes: H01S 3/08004 incorporating a dispersive element, e.g. a prism for wavelength selection H01S3/0811, H01S3/08022 take precedence
• CPC Class Codes: H01S 3/08009 using a diffraction grating
• CPC Class Codes: H01S 3/08036 using intracavity dispersive, polarising or birefringent elements
• CPC Class Codes: H01S 3/0943 of a gas laser
• CPC Class Codes: H01S 3/097 : by gas discharge of a gas laser
• CPC Class Codes: H01S 3/09702 : Details of the driver electronics and electric discharge circuits
• CPC Class Codes: H01S 3/09705 : with particular means for stabilising the discharge
• CPC Class Codes: H01S 3/0971 : transversely excited H01S3/0975 takes precedence
• CPC Class Codes: H01S 3/0975 : using inductive or capacitive excitation
• CPC Class Codes: H01S 3/104 : in gas lasers
• CPC Class Codes: H01S 3/105 : by controlling the mutual position or the reflecting properties of the reflectors of the cavity , e.g. by controlling the cavity lengthH01S3/10076, H01S3/13 take precedence
• CPC Class Codes: H01S 3/1055 : one of the reflectors being constituted by a diffraction grating
• CPC Class Codes: H01S 3/1305 : Feedback control systems
• CPC Class Codes: H01S 3/134 : in gas lasers
• CPC Class Codes: H01S 3/137 : for stabilising of frequency
• CPC Class Codes: H01S 3/139 : by controlling the mutual position or the reflecting properties of the reflectors of the cavity , e.g. by controlling the cavity length
• CPC Class Codes: H01S 3/22 : Gases
• CPC Class Codes: H01S 3/2207 : Noble gas ions, e.g. Ar+>, Kr+>
• CPC Class Codes: H01S 3/223 : the active gas being polyatomic, i.e. containing two or more atoms H01S3/227 takes precedence
• CPC Class Codes: H01S 3/225 : comprising an excimer or exciplex
• CPC Class Codes: H01S 3/2251 : ArF, i.e. argon fluoride is comprised for lasing around 193 nm
• CPC Class Codes: H01S 3/2256 : KrF, i.e. krypton fluoride is comprised for lasing around 248 nm
• CPC Class Codes: H01S 3/2258 : F2, i.e. molecular fluoride is comprised for lasing around 157 nm
• CPC Class Codes: H01S 3/2333 : Double-pass amplifiers
• CPC Class Codes: H01S 3/2366 : comprising a gas as the active medium H01S3/10092, H01S3/2383 take precedence

Abstract

An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

Claims

1. A very narrow band two chamber high repetition rate gas discharge laser system comprising:

A) a first laser unit comprising;

1) a first discharge chamber containing;

a) a first laser gas

b) a first pair of elongated spaced apart electrodes defining a first discharge region,

2) a fist fan for producing sufficient gas velocities of said first laser gas in said first discharge region to clear from said first discharge region, following each pulse, substantially all discharge produced ions prior to a next pulse when operating at a repetition rate in the range of 4,000 pulses per second or greater,

3) a first heat exchanger system capable of removing at least 16 kw of heat energy from said first laser gas,

4) a line narrowing unit for narrowing spectral bandwidths of light pulses produced in said first discharge chamber,

B) a second laser unit comprising;

1) a second discharge chamber containing;

a) a second laser gas,

b) a second pair of elongated spaced apart electrodes defining a second discharge region

2) a second fan for producing sufficient gas velocities of said second laser gas in said second discharge region to clear from said second discharge region, following each pulse, substantially all discharge produced ions prior to a next pulse when operating at a repetition rate in the range of 4,000 pulses per second or greater,

3) a second heat exchanger system capable of removing at least 16 kw of heat energy from said second laser gas,

C) a pulse power system configured to provide electrical pulses to said fist pair of electrodes and to said second pair of electrodes sufficient to produce laser pulses at rates of about 4,000 pulses per second with precisely controlled pulse energies in the range of about 5 to 10 mJ or greater, and

D) a laser beam measurement and control system for measuring pulse energy, wavelength and bandwidth of laser output pulses produced by said two chamber laser system and controlling said laser output pulses in a feedback control arrangement.

2. A laser system as in claim 1 wherein said first laser unit is configured as a master oscillator and said second laser unit is configured as a power amplifier.

3. A laser system as in claim 2 wherein said laser gas comprises argon, fluoride and neon.

4. A laser system as in claim 2 wherein said laser gas comprises krypton, fluorine and neon.

5. A laser system as in claim 2 wherein said laser gas comprises fluorine and a buffer gas chosen from a group consisting of neon, helium or a mixture of neon and helium.

6. A laser system as in claim 2 wherein said power amplifier is configured for two beam passes through the second discharge region.

7. A laser system as in claim 1 and further comprising an optical table for supporting resonant cavity optics of said first laser unit independent of said first discharge chamber.

8. A laser system as in claim 7 wherein said optical table is generally U-shaped and defines a U-cavity and wherein said first discharge chamber is mounted within the U-cavity.

9. A laser system as in claim 1 wherein each of said first and second laser chambers define a gas flow path with a gradually increasing cross section downstream of said electrodes to permit recovery of a large percentage of static pressure drop occurring in the discharge regions.

10. A laser as in claim 2 and wherein said chamber also comprises a vane structure upstream of said discharge region for normalizing gas velocity upstream of said discharge region.

11. A laser as in claim 1 wherein said first fan and said second fan each are tangential fans and each comprises a shaft driven by two brushless DC motors.

12. A laser as in claim 11 wherein said motors are water cooled motors.

13. A laser as in claim 11 wherein each of said motors comprise a stator and each of said motors comprise a magnetic rotor contained in a pressure cup separating a said stator from said laser gas.

14. A laser as in claim 11 wherein said tangential fan comprise a blade structure machined from said aluminum stock.

15. A laser as in claim 11 wherein said blade structure has an outside diameter of about five inches.

16. A laser as in claim 11 wherein said motors are sensorless motors and further comprising a master motor controller for controlling one of said motors and a slave motor controller for controlling the other motor.

17. A laser as in claim 11 wherein each of said tangential fans comprise blades which are angled with respect to said shaft.

18. A laser as in claim 1 wherein said finned heat exchanger system is water cooled.

19. A laser as in claim 18 wherein said heat exchanger system comprises at least four separate water cooled heat exchangers.

20. A laser as in claim 18 wherein heat exchanger system comprises at least one heat exchanger having a tubular water flow passage wherein at least one turbulator is located in said path.

21. A laser as in claim 20 wherein each of said four heat exchangers comprise a tubular water flow passage containing a turbulator.

22. A laser as in claim 1 wherein said pulse power power system comprise water cooled electrical components.

23. A laser as in claim 22 wherein at least one of said water cooled components is a component operated at high voltages in excess of 12,000 volts.

24. A laser as in claim 23 wherein said high voltage is isolated from ground using an inductor through which cooling water flows.

25. A laser as in claim 1 wherein said pulse power system comprises a resonant charging system to charge a charging capacitor to a precisely controlled voltage.

26. A laser as in claim 25 wherein said resonance charging system comprises a De-Qing circuit.

27. A laser as in claim 25 wherein said resonance charging system comprises a bleed circuit.

28. A laser as in claim 25 wherein said resonant charging system comprises a De-Qing circuit and a bleed circuit.

29. A laser as in claim 1 wherein said pulse power system comprises a charging system comprised of at least three power supplies arranged in parallel.

30. A laser as in claim 1 wherein said laser beam measurement and control system comprises an etalon unit, a photo diode array, a programmable logic device, and optics to focus laser light from said etalon unit on to said photo diode array wherein said programmable logic device is programmed to analyze data from said photodiode array to determine locations on said photo diode array of etalon fringes.

31. A laser as in claim 30 wherein said measurement an control system also comprises a microprocessor programmed to calculate wavelength and bandwidth from fringe data located by said programmable logic device.

32. A laser as in claim 30 wherein said programmable logic device is programmed with an algorithm for calculating wavelength and bandwidth based on measurement of said fringes.

33. A laser as in claim 32 wherein said programmable logic device is configured to make calculations of wavelength and bandwidth faster than {fraction (1/4,000)} of a second.

34. A laser as in claim 30 wherein said etalon unit comprises a defractive diffusing element.

35. A laser as in claim 1 and further comprising a line narrowing unit comprising a tuning mirror driven at least in part by a PZT drive.

36. A laser as in claim 35 wherein said tuning mirror is also driven in part by a stepper motor.

37. A laser as in claim 35 and further comprising a pretuning means.

38. A laser as in claim 35 and further comprising an active tuning means comprising a learning algorithm.

39. A laser as in claim 35 and further comprising an adaptive feed forward algorithm.

40. A laser as in claim 35 wherein said line narrowing unit comprises a grating defining a grating face and a purge means for forcing purge gas adjacent to said grating face.

41. A laser as in claim 40 wherein said purge gas is nitrogen.

42. A laser as in claim 40 wherein said purge gas is helium.

43. A laser as in claim 1 and further comprising a nitrogen purge system comprising a nitrogen purge system comprising a nitrogen filter.

44. A laser as in claim 1 and further comprising a nitrogen comprising a purge module comprising flow monitors said laser also comprising purge exhaust tubes for transporting exhaust purge gas from said laser.

45. A laser as in claim 1 and further comprising a shutter unit comprising an electrically operated shutter and a power meter which can be positioned in a laser output beam path with a command signal.

46. A laser as in claim 1 and further comprising a beam seal system providing a first beam seal between a first window of said first chamber and line narrowing unit and a second beam seal between a second window of said first chamber and an output coupler unit, each of said beam seals comprising a metal bellows.

47. A laser as in claim 46 wherein each of said first and second beam seals are configured to permit easy replacement of said laser chamber.

48. A laser as in claim 46 wherein each of said beam seals contain no elastomer, provide vibration isolation from said chamber, provide beam train isolation from atmospheric gases and permit unrestricted replacement of said laser chamber without disturbance of said LNP or said output coupler unit.

49. A laser as in claim 1 wherein said measurement and control system comprises a primary beam splitter for splitting off a small percentage of output pulses from said laser, a second beam splitter for directing a portion of said small percentage to said pulse energy detector and a means isolating a volume bounded said primary beam splitter, said secondary beam splitter and a window of said pulse energy detector from other portions of said measurement and control system to define an isolated region.

50. A laser as in claim 49 and further comprising a purge means for purging said isolated region with a purge gas.

51. A laser as in claim 50 wherein said laser further comprises an output coupler unit and an output window unit said purge means being configured so that exhaust from said isolated region also purges said output coupler unit and said output window unit.

52. A laser as in claim 1 wherein said pulse power system comprises a first charging capacitor bank and a first pulse compression circuit for providing electrical pulses to said first pair of electrodes and a second charging capacitor bank and a second pulse compression circuit for providing electrical pulses to said second pair of electrodes and a resonant charging system to charge in parallel said first and second charging capacitor banks to a precisely controlled voltage.