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Systems and methods for low contamination, high throughput handling of workpieces for vacuum processing

  • US 6,568,552 B1
  • Filed: 08/30/2000
  • Issued: 05/27/2003
  • Est. Priority Date: 11/28/1997
  • Status: Expired due to Fees
First Claim
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1. An apparatus for selectively allowing workpieces to enter a chamber having a low contamination environment, the apparatus comprising:

  • a door member comprising an outer frame portion and an inner plate portion, the outer frame portion forming a recessed cavity for receiving the inner plate portion;

    a connector for coupling the outer frame portion to the chamber, the connector configured to vertically guide the door member to a first position and a second position, the first position substantially covering an aperture formed in the chamber and the second position substantially exposing the aperture; and

    an extendable connector, coupled between the outer frame portion and the inner plate portion, configured to extend the inner plate portion when the door member is in the first position to form a seal with a peripheral portion of the aperture.

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