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Multi depth substrate fabrication processes

  • US 6,569,607 B2
  • Filed: 05/01/2001
  • Issued: 05/27/2003
  • Est. Priority Date: 05/03/2000
  • Status: Expired due to Term
First Claim
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1. A method of fabricating microstructures on a substrate, comprising the following steps in the order named:

  • a) providing a substrate having a first surface and a first resist layer disposed thereon;

    b) exposing first selected regions of the first resist layer to an environment that renders the first resist layer more soluble in a developer solution;

    c) developing the first resist layer in the developer solution to expose first selected regions of the first surface;

    d) exposing second selected regions of the resist layer to an environment that renders the resist layer more soluble in the developer solution;

    e) etching the first selected regions of the first surface;

    f) developing the first resist layer to expose second selected regions of the first surface; and

    g) etching the first and second selected regions of the first surface.

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