Magnetron negative ion sputter source
First Claim
1. A negative ion source, comprising:
- an electrode;
a target having a more negative electrical potential than said electrode;
a supply of electrical energy for generating a discharge between said electrode and said target;
at least one magnet positioned so as to generate a magnetic field to confine electrons, generated as a result of said discharge, in close proximity to a first surface of said target; and
a delivery system for delivering cesium to a second surface of said target, said second surface opposing said first surface, wherein said target further comprises a plurality of circular openings through which said cesium diffuses from said second surface to said first surface through a distribution chamber interposed between said delivery system and said target for uniformly distributing cesium on said second surface of said target.
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Accused Products
Abstract
A negative ion source is disclosed which includes an electrode, a target having a more negative electrical potential than the electrode, a supply of electrical energy for generating a discharge between the electrode and the target, and at least one magnet positioned so as to confine electrons, generated as a result of said discharge, in close proximity to a first surface of the target. The negative ion source further includes a delivery system for delivering cesium to a second surface of the target, and a distribution chamber interposed between the delivery system and the target for uniformly distributing cesium on the second surface of said target. The cesium diffuses through openings in the target from the first surface to the second surface. The negative ion source may comprise a conventional magnetron sputter source that has been retrofitted to include a cesium distribution system.
66 Citations
11 Claims
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1. A negative ion source, comprising:
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an electrode;
a target having a more negative electrical potential than said electrode;
a supply of electrical energy for generating a discharge between said electrode and said target;
at least one magnet positioned so as to generate a magnetic field to confine electrons, generated as a result of said discharge, in close proximity to a first surface of said target; and
a delivery system for delivering cesium to a second surface of said target, said second surface opposing said first surface, wherein said target further comprises a plurality of circular openings through which said cesium diffuses from said second surface to said first surface through a distribution chamber interposed between said delivery system and said target for uniformly distributing cesium on said second surface of said target. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
a supply of cesium detachably coupled to a first port;
a reservoir coupled to said first port, said first port for conveying cesium to said reservoir;
a heater in close proximity to said reservoir for heating cesium in said reservoir;
a second port coupled to said reservoir for allowing said reservoir to be subject to a vacuum; and
a valve for metering a flow of cesium from said reservoir to said distribution chamber.
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6. The negative ion source of claim 1 wherein said supply of electrical energy supplies RF energy.
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7. The negative ion source of claim 1 wherein said supply of electrical energy supplies direct current.
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8. The negative ion source of claim 1 wherein the shape of said distribution chamber, said target, and said magnetic field is non circular.
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9. A method of depositing ion on a substrate, comprising the steps:
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generating a discharge between an electrode and a target;
confining electrons, generated as a result of said discharge, to a first area in close proximity to a first surface of said target;
delivering cesium to a second surface of said target through a distribution chamber for uniformly distributing cesium on said second surface; and
diffusing said cesium through a plurality of circular openings in said target from said second surface to said first surface. - View Dependent Claims (10, 11)
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Specification