Substrate support tolerant to thermal expansion stresses
First Claim
1. A support capable of holding a substrate in a chamber, the support comprising at least one support section that supports an electrostatic chuck, the support section having a slot exlending through the thickness of the support section without cutting across an entire surface of the support section, the slot being shaped and sized to reduce adverse thermal expansion effects during use of the support in the chamber.
1 Assignment
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Accused Products
Abstract
A chamber 30 for processing a substrate 25 comprises a support 55 including an electrode 70 at least partially covered by a dielectric 60 that is permeable to electromagnetic energy. The electrode 70 may be chargeable to electrostatically hold the substrate 25, to couple energy to a gas in the chamber 30, or both. A base 90 below the support 55 comprises a slot 95 that may be adapted to serve as a thermal expansion slot to reduce thermal stresses.
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Citations
44 Claims
- 1. A support capable of holding a substrate in a chamber, the support comprising at least one support section that supports an electrostatic chuck, the support section having a slot exlending through the thickness of the support section without cutting across an entire surface of the support section, the slot being shaped and sized to reduce adverse thermal expansion effects during use of the support in the chamber.
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11. A substrate support comprising:
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an electrostatic chuck comprising an electrode and a dielectric at least partially covering the electrode; and
a base below the electrode, the base comprising a slot that extends through the thickness of the base without cutting across an entire surface of the base. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20, 42)
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21. A substrate processing chamber comprising:
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a substrate support comprising a dielectric at least partially covering an electrode, and an underlying base comprising a slot that extends through the thickness of the base without cutting across an entire surface of the base;
a gas distributor;
a gas energizer; and
a gas exhaust, whereby a substrate received on the substrate support may be processed by gas introduced through the gas distributor, energized by the gas energizer, and exhausted by the gas exhaust. - View Dependent Claims (22, 23, 43)
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24. A method of fabricating a substrate support, the method comprising the steps of:
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forming an electrostatic chuck by forming an electrode and covering the electrode at least partially with a dielectric;
forming a base to support the electrode; and
forming a thermal expansion slot in the base such that the thermal expansion slot extends through the thickness of the base without cutting across an entire surface of the base. - View Dependent Claims (25, 26, 27, 28, 29, 44)
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- 30. A support capable of holding a substrate in a chamber, the support comprising a plurality of support sections that are joined to one another by at least one bond comprising a plurality of layers, the plurality of layers comprising different materials.
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36. A support capable of holding a substrate in a chamber, the support comprising at least one support section and a slot extending through the thickness of the section, the slot comprising a gap that is shaped and sized to reduce adverse thermal expansion effects during use of the support in the chamber, and the ratio of the size of the gap to a diameter of the support section hyping from about 0.0002 to about 0.025.
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37. A substrate support comprising:
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an electrostatic chuck comprising an electrode and a dielectric at least partially covering the electrode; and
a base below the electrode, the base comprising a slot that comprises a gap, and the ratio of the size of the gap to a diameter of the base being from about 0.0002 to about 0.025.
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38. A substrate support comprising:
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an electrostatic chuck comprising an electrode and a dielectric at least partially covering the electrode; and
a base below the electrode and bonded to the dielectric by a metal layer, the base comprising a slot.
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39. A method of fabricating a substrate support, the method comprising the steps of:
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forming an electrostatic chuck by forming an electrode and covering the electrode at least partially with a dielectric;
forming a base to support the electrode;
forming a thermal expansion slot in the base; and
bonding the dielectric to the base by one or more metal layers.
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40. A method of fabricating a substrate support, the method comprising the steps of:
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forming an electrostatic chuck by forming an electrode and covering the electrode at least partially with a dielectric;
forming a base to support the electrode; and
cutting out a thermal expansion slot in the base.
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Specification