Anti-reflection coating with transparent surface conductive layer
First Claim
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1. An anti-reflection conductive coating applied to a substrate comprising four layers designated as first, second, third, and fourth layers in consecutive numerical order beginning with the layer farthest from the substrate;
- said first layer overlaying the second layer to form a surface layer and comprising a transparent conductive oxide material having a high refraction index substantially greater than 1.50, the first layer having a physical thickness of 10-40 nm;
said second layer overlaying the third layer and comprising an oxide material having a low refraction index substantially less than said high refraction index of said first layer, the second layer having a physical thickness of 30-60 nm;
said third layer overlaying the fourth layer and comprising an oxide material having a high refraction index substantially greater than 1.50, the third layer having a physical thickness of 30-80 nm;
said fourth layer overlaying a front surface of the substrate and comprising oxide material having high refraction index substantially greater than 1.50, the fourth layer having a physical thickness of 40-80 nm.
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Abstract
An anti-reflection coating layer system is composed of 4 oxide layers. The material of surface layer is a transparent conductive coating and has a high refractive index between 1.9 to 2.1. The materials used for the surface layer are a transparent conductive coating such as SnO2, ZnO2, In2O3, and ITO.
48 Citations
11 Claims
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1. An anti-reflection conductive coating applied to a substrate comprising four layers designated as first, second, third, and fourth layers in consecutive numerical order beginning with the layer farthest from the substrate;
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said first layer overlaying the second layer to form a surface layer and comprising a transparent conductive oxide material having a high refraction index substantially greater than 1.50, the first layer having a physical thickness of 10-40 nm;
said second layer overlaying the third layer and comprising an oxide material having a low refraction index substantially less than said high refraction index of said first layer, the second layer having a physical thickness of 30-60 nm;
said third layer overlaying the fourth layer and comprising an oxide material having a high refraction index substantially greater than 1.50, the third layer having a physical thickness of 30-80 nm;
said fourth layer overlaying a front surface of the substrate and comprising oxide material having high refraction index substantially greater than 1.50, the fourth layer having a physical thickness of 40-80 nm. - View Dependent Claims (2, 3, 5, 7, 9, 10, 11)
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4. An anti-reflection conductive coating applied to a substrate comprising four layers designated as first, second, third, and fourth layers in consecutive numerical order beginning with the layer farthest from the substrate;
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said first layer overlaying the second layer to form a surface layer and comprising a transparent conductive oxide material having a high refraction index substantially greater than 1.50, the first layer having a physical thickness of 10-40 nm;
said second layer overlaying the third layer and comprising an oxide material having a low refraction index substantially less than said high refraction index of said first layer, the second layer having a physical thickness of 30-60 nm;
said third layer overlaying the fourth layer and comprising an oxide material having a high refraction index substantially greater than 1.50, the third layer having a physical thickness of 30-80 nm;
said fourth layer overlaying a front surface of the substrate and comprising oxide material having high refraction index substantially greater than 1.50, the fourth layer having a physical thickness of 40-80 nm. wherein said first layer is ITO, said second layer is SiO2, said third layer is a Niobium oxide and said fourth layer is a Silicon-Oxygen compound of Niobium.
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6. An anti-reflection conductive coating applied to a substrate comprising four layers designated as first, second, third, and fourth layers in consecutive numerical order beginning with the layer farthest from the substrate;
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said first layer overlaying the second layer to form a surface layer and comprising a transparent conductive oxide material having a high refraction index substantially greater than 1.50, the first layer having a physical thickness of 10-40 nm;
said second layer overlaying the third layer and comprising an oxide material having a low refraction index substantially less than said high refraction index of said first layer, the second layer having a physical thickness of 30-60 nm;
said third layer overlaying the fourth layer and comprising an oxide material having a high refraction index substantially greater than 1.50, the third layer having a physical thickness of 30-80 nm;
said fourth layer overlaying a front surface of the substrate and comprising oxide material having high refraction index substantially greater than 1.50, the fourth layer having a physical thickness of 40-80 nm. wherein said second layer comprises a material selected from the group consisting of;
SiO2 and SiAlO2.
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8. An anti-reflection conductive coating applied to a substrate comprising four layers designated as first, second, third, and fourth layers in consecutive numerical order beginning with the layer farthest from the substrate;
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said first layer overlaying the second layer to form a surface layer and comprising a transparent conductive oxide material having a high refraction index substantially greater than 1.50, the first layer having a physical thickness of 10-40 nm;
said second layer overlaying the third layer and comprising an oxide material having a low refraction index substantially less than said high refraction index of said first layer, the second layer having a physical thickness of 30-60 nm;
said third layer overlaying the fourth layer and comprising an oxide material having a high refraction index substantially greater than 1.50, the third layer having a physical thickness of 30-80 nm;
said fourth layer overlaying a front surface of the substrate and comprising oxide material having high refraction index substantially greater than 1.50, the fourth layer having a physical thickness of 40-80 nm. wherein said fourth layer comprises a material selected from the group consisting of;
a Tantalum-Silicon oxide, a Niobium oxide, a Titanium-Silicon oxide, and Indium-Silicon oxide, a Tin-Silicon oxide, and mixtures of these oxides.
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Specification