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Run-to-run controller for use in microelectronic fabrication

  • US 6,587,744 B1
  • Filed: 06/20/2000
  • Issued: 07/01/2003
  • Est. Priority Date: 06/22/1999
  • Status: Expired due to Fees
First Claim
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1. A run-to-run control system for controlling manufacturing processes, comprising:

  • a plurality of processing tools;

    a plurality of metrology tools for monitoring operation of said processing tools each metrology tool adapted to obtain metrology data from a corresponding processing tool; and

    a supervising station, said supervising station comprising;

    an interface for receiving metrology data from each of said metrology tools;

    a memory;

    a plurality of variable parameter tables, one for each of said processing tools, stored in said memory, said variable parameter tables collectively associated with a manufacturing process or recipe, each variable parameter table being downloaded to a respective processing tool prior to operation of the respective processing tool; and

    at least one model structure relating received metrology data received from a prior metrology tool to a target set-point for a subsequent processing tool, and another model structure adapted to control operation of the subsequent processing tool in a feed-back control loop, wherein one or more variables of a subsequent variable parameter tables associated with the subsequent processing tool are modified in response to application of said received metrology data according to said at least one model structure.

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