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Projection exposure method and apparatus

  • US 6,590,636 B2
  • Filed: 09/27/2001
  • Issued: 07/08/2003
  • Est. Priority Date: 01/27/1997
  • Status: Expired due to Fees
First Claim
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1. A scanning exposure method in which a mask and a substrate are moved synchronously, the method comprising:

  • providing a first mask and a second mask for a mask stage, the mask stage having a reflective surface extending in a scanning direction and the first and second masks being arranged along the scanning direction;

    preparing surface curvature data on the reflective surface in relation to positions of the first and second masks to be provided;

    detecting positional information of the mask stage by irradiating the reflective surface with a measuring beam; and

    moving the mask stage based on the surface curvature data and the detected positional information in a direction other than the scanning direction.

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