Heating element CVD system

• US 6,593,548 B2
• Filed: 05/14/2002
• Issued: 07/15/2003
• Est. Priority Date: 09/14/2000
• Status: Expired due to Term

• Current Assignee: Anelva Corporation (Canon Inc.), Japan As Represented By President of Japan Advanced Institute of Science and Technology
• Original Assignee: Anelva Corporation (Canon Inc.), Japan As Represented By President of Japan Advanced Institute of Science and Technology
• Inventors: Ishibashi, Keiji, Masuda, Atsushi, Matsumura, Hideki, Tanaka, Masahiko, Karasawa, Minoru
• Primary Examiner(s): Walberg, Teresa
• Assistant Examiner(s): FUQUA, SHAWNTINA T
• Application Number:
  US10/130,207
• Publication Number:
  US 20020189545A1
• Time in Patent Office: 427 Days
• Field of Search: 219/390, 219/405, 219/411, 219/409, 219/541, 118/724, 118/725, 118/728, 118/50.1, 392/416, 392/418
• US Class Current: 219/390
• CPC Class Codes: C23C 16/24 Deposition of silicon only
• CPC Class Codes: C23C 16/345 Silicon nitride
• CPC Class Codes: C23C 16/44 characterised by the method of coating C23C16/04 takes precedence
• CPC Class Codes: C23C 16/452 by activating reactive gas streams before their introduction into the reaction chamber, e.g. by ionisation or addition of reactive species
• CPC Class Codes: C23C 16/45519 Inert gas curtains

Abstract

A heating element CVD device capable of providing a high productivity and decomposing and/or activating the material gas led into a processing container by a heating element and stacking film on a substrate disposed in the processing container, wherein the connection part area of the heating element to a connection terminal for connecting the hearing element to a power supply mechanism is not exposed to a space inside the processing container, specifically, the connection part area is covered by a cylindrical body or a platy body covering the connection part area while providing a space part thereof from the hearing element, or the connection part area allows the space part to be present in a space thereof from the connection terminal and is covered by the cylindrical body or platy body covering the connection part area while providing the space part in a space thereof from the heating element, and hydrogen gas is led from the connection terminal side into the processing container through the space part, whereby the portion of the heating element near the connection part to the power supply mechanism can be prevented from being deteriorated by the material gas, the material gas can be prevented from reacting with cleaning gas during the cleaning for removing the film adhered to the inside of the processing container, the service life of the heating element can be increased, and a film forming environment can be stabilized.

Claims

1. A heating element CVD system comprising:

a processing container in which a predetermined processing is performed to a substrate held by a substrate holder disposed therein;

an evacuation system which is connected to the processing container and evacuates it to a vacuum;

a raw material gas supply system for supplying a predetermined raw material gas into the processing container; and

a heating element which is disposed in the processing container and is supplied with electric power from a power supply mechanism, thereby being heated to high temperatures, wherein the raw material gas introduced into the processing container from the raw material gas supply system is decomposed and/or activated by the heating element kept at high temperatures to form a thin film on the substrate held by the substrate holder, wherein one or a plurality of connection terminal holders is placed in the processing chamber;

each of the said connection terminal holders holds a plurality of connection terminals at a predetermined position with electrically insulating therebetween;

each of the said connection terminals connects the heating elements to the power supply mechanism electrically;

the said heating elements connected to the connection terminals are supported in face with the substrate holder; and

a connection region of the heating element connected to the connection terminal is not exposed to a space in the processing container.

2. A heating element CVD system according to claim 1, wherein the connection region of the heating element connected to the connection terminal is covered with a cylindrical body or a plate that is made of an insulating substance, a metal, or a composite of these materials and covers the connection region with a gap between the cylindrical body or the plate and the heating element.

3. A heating element CVD system according to claim 1, wherein the connection region of the heating element connected to the connection terminal is covered with a cylindrical body or a plate that is made of an insulating substance, a metal, or a composite of these materials and covers the connection region with a connection terminal inside hollow portion between the cylindrical body or the plate and the connection terminal and with a gap between the cylindrical body or the plate and the heating element.

4. A heating element CVD system according to claim 1, wherein the each of connection terminal is constituted by a connection terminal body and a cap put on the connection terminal body with a gap between itself and the heating element, and wherein a connection terminal inside hollow portion is formed between the cap and the connection terminal body.

5. A heating element CVD system according to claim 1, wherein each connection terminal holder has a first inside hollow portion, and wherein the connection region of the heating element connected to each of a plurality of connection terminals held at the predetermined position of the connection terminal holder in the electrically insulated state is covered with a cylindrical body or a plate made of an insulating material or a metal or a composite material of these materials, which covers the connection region with the connection terminal inside hollow portion between the cylindrical body or the plate and the connection terminal and with a gas passing hole between the cylindrical body or the plate and the heating element, and wherein the connection terminal inside hollow portion communicates with the first inside hollow portion to which a gas introduction system for introducing gas is connected.

6. A heating element CVD system according to claim 1, wherein each connection terminal holder has a first inside hollow portion, and wherein each of a plurality of connection terminals held at the predetermined position of the connection terminal holder in the electrically insulated state is constituted by a connection terminal body and a cap put on the connection terminal body with a gas passing hole between the cap and the heating element, and wherein a connection terminal inside hollow portion is formed between the cap and the connection terminal body, and wherein the connection terminal inside hollow portion communicates with the first inside hollow portion to which a gas introduction system for introducing gas is connected.

7. A heating element CVD system according to claim 4, wherein as to the cap, a cylindrical body or a plate that covers the connection region of the heating element connected to the connection terminal without contacting the heating element and that is made of a insulating material or a metal or a composite material of these materials are mounted.

8. A heating element CVD system according to claim 6, wherein as to the cap, a cylindrical body or a plate that covers the connection region of the heating element connected to the connection terminal without contacting the heating element and that is made of a insulating material or a metal or a composite material of these materials are mounted.

9. A heating element CVD system according to claim 5, the gas is any one gas of hydrogen, argon, helium, neon, krypton, xenon, nitrogen, or ammonia, or a mixed gas of two or more kinds of these gases.

10. A heating element CVD system according to claim 6, wherein the gas is any one gas of hydrogen, argon, helium, neon, krypton, xenon, nitrogen, or ammonia, or a mixed gas of two or more kinds of these gases.

11. A heating element CVD system according to claim 7, wherein the gas is any one gas of hydrogen, argon, helium, neon, krypton, xenon, nitrogen, or ammonia, or a mixed gas of two or more kinds of these gases.

12. A heating element CVD system according to claim 8, wherein the gas is any one gas of hydrogen, argon, helium, neon, krypton, xenon, nitrogen, or ammonia, or a mixed gas of two or more kinds of these gases.

13. A heating element CVD system according to claim 1, wherein a connection part between the connection terminal and power supply mechanism, or the connection part between the connection terminal and the power supply mechanism and a wiring part for electrically connecting the connection terminals is built in the connection terminal holder.

14. A heating element CVD system according to claim 5, wherein each connection terminal holder has the first inside hollow portion, and wherein a connection part between the connection terminal and power supply mechanism, or the connection part of the connection terminal and the power supply mechanism and a wiring part for electrically connecting the connection terminals is arranged in the first inside hollow portion.

15. A heating element CVD system according to claim 6, wherein each connection terminal holder has the first inside hollow portion, and wherein a connection part between the connection terminal and power supply mechanism, or the connection part of the connection terminal and the power supply mechanism and a wiring part for electrically connecting the connection terminals is arranged in the first inside hollow portion.

16. A heating element CVD system according to claim 1, wherein each connection terminal holder communicates with a space in the processing container only through a plurality of gas blowing holes made in the surface on the side in face with the substrate holder and has a second inside hollow portion connected to the raw material gas supply system.

17. A heating element CVD system according to claim 1, wherein each connection terminal holder holds a plurality of heating elements in face with the substrate holder, and wherein the gap between at least one or more heating element of the plurality of heating elements and the connection terminal holder is different from the gap between the other heating element and the connection terminal holder.

18. A heating element CVD system according to claim 1, wherein each connection terminal holder holds a plurality of heating elements in face with the substrate holder, and wherein the distances between the neighboring heating elements of the plurality of heating elements are different from each other in part.

19. A heating element CVD system according to claim 1, wherein each connection terminal holder holds a plurality of heating elements in face with the substrate holder, and wherein the gap between at least one or more heating element of the plurality of heating elements and the connection terminal holder is different from the gap between the other heating element and the connection terminal holder, and wherein the distances between the neighboring heating elements of the plurality of heating elements are different from each other in part.