Trench DMOS transistor with embedded trench schottky rectifier
First Claim
1. An integrated circuit having a plurality of trench Schottky barrier rectifiers within one or more rectifier regions and a plurality of trench DMOS transistors within one or more transistor regions, said integrated circuit comprising:
- a substrate of a first conductivity type;
an epitaxial layer of said first conductivity type over said substrate, said epitaxial layer having a lower doping level than said substrate;
a plurality of body regions of a second conductivity type within said epitaxial layer in said transistor regions;
a plurality of trenches within said epitaxial layer in both said transistor regions and said rectifier regions;
a first insulating layer that lines said trenches;
a polysilicon conductor within said trenches and overlying the first insulating layer;
a plurality of source regions of said first conductivity type within said body regions adjacent to said trenches;
a second insulating layer which is disposed over and is in contact with said polysilicon conductor within said transistor regions; and
an electrode layer over both said transistor regions and said rectifier regions and which is in contact with said second insulating layer;
wherein said integrated circuit contains an epitaxial layer, and wherein said conductive layer is in contact with a portion of said epitaxial layer, in said rectifier region, which has said first conductivity type, and wherein said first and second conductivity types are diverse.
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Accused Products
Abstract
An integrated circuit having a plurality of trench Schottky barrier rectifiers within one or more rectifier regions and a plurality of trench DMOS transistors within one or more transistor regions. The integrated circuit includes: (a) a substrate of a first conductivity type; (b) an epitaxial layer of the first conductivity type over the substrate, wherein the epitaxial layer has a lower doping level than the substrate; (c) a plurality of body regions of a second conductivity type within the epitaxial layer in the transistor regions; (d) a plurality of trenches within the epitaxial layer in both the transistor regions and the rectifier regions; (e) a first insulating layer that lines the trenches; (t) a polysilicon conductor within the trenches and overlying the first insulating layer; (g) a plurality of source regions of the first conductivity type within the body regions at a location adjacent to the trenches; (h) a second insulating layer over the doped polysilicon layer in the transistor regions; and (i) an electrode layer over both the transistor regions and the rectifier regions.
134 Citations
25 Claims
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1. An integrated circuit having a plurality of trench Schottky barrier rectifiers within one or more rectifier regions and a plurality of trench DMOS transistors within one or more transistor regions, said integrated circuit comprising:
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a substrate of a first conductivity type;
an epitaxial layer of said first conductivity type over said substrate, said epitaxial layer having a lower doping level than said substrate;
a plurality of body regions of a second conductivity type within said epitaxial layer in said transistor regions;
a plurality of trenches within said epitaxial layer in both said transistor regions and said rectifier regions;
a first insulating layer that lines said trenches;
a polysilicon conductor within said trenches and overlying the first insulating layer;
a plurality of source regions of said first conductivity type within said body regions adjacent to said trenches;
a second insulating layer which is disposed over and is in contact with said polysilicon conductor within said transistor regions; and
an electrode layer over both said transistor regions and said rectifier regions and which is in contact with said second insulating layer;
wherein said integrated circuit contains an epitaxial layer, and wherein said conductive layer is in contact with a portion of said epitaxial layer, in said rectifier region, which has said first conductivity type, and wherein said first and second conductivity types are diverse.- View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. An integrated circuit, comprising:
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a plurality of trench Schottky barrier rectifiers;
a plurality of trench DMOS transistors defining a transistor region;
a conductive layer which extends continuously over said trench Schottky barrier rectifiers and said trench DMOS transistors;
a body region; and
an insulating layer;
wherein said trench Schottky barrier rectifiers and said trench DMOS transistors are integrated upon a common substrate, wherein the trenches of said trench Schottky barrier rectifiers and said trench DMOS transistors contain polysilicon, wherein the insulating layer is disposed over and is in contact with said polysilicon within said transistor regions and is also in contact with said conductive layer within said transistor regions, and wherein the trench of at least one of said trench Schottky barrier rectifiers is not in contact with said body region.- View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25)
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Specification