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Lithographic apparatus, device manufacturing method, and device manufactured thereby

  • US 6,597,429 B2
  • Filed: 04/12/2001
  • Issued: 07/22/2003
  • Est. Priority Date: 04/17/2000
  • Status: Expired due to Term
First Claim
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1. A lithographic projection apparatus comprising:

  • a radiation system which provides a projection beam of radiation;

    a patterning structure support to support projection beam patterning structure which patterns the projection beam according to a desired pattern;

    a substrate table to hold a substrate;

    a projection system which projects the patterned beam onto a target portion of the substrate; and

    a support member constructed and arranged to support a portion of the lithographic projection apparatus along a support direction and having a finite stiffness in a direction that is substantially perpendicular to the support direction, wherein the stiffness of the support member is such that a deformation force in the perpendicular direction by the support member due to a deformation of the support member in the perpendicular direction substantially counteracts an opposite displacing force in the perpendicular direction due to a force substantially parallel to the support direction acting on the support member.

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