Method of fabricating a thin film including a protective layer as a mask
First Claim
1. A method of producing a liquid crystal display device comprising a pair of substrates jointed to each other with a gap therebetween, a liquid crystal disposed in said gap, pixel electrodes and thin film transistors for driving said pixel electrodes provided on one of said substrates, whereinsaid thin film transistor has a laminated structure comprising a semiconductor thin film, an insulating film provided in contact with the surface of said semiconductor thin film, and a gate electrode disposed on the face side or the back side of said semiconductor thin film, and said thin film transistor is formed on one of said substrates in a predetermined plan view shape by:
- a first step for forming a semiconductor thin film having a clean surface over a substrate, a second step of forming a protective film so as to cover said clean surface of said semiconductor thin film, a third step of patterning said semiconductor thin film together with said protective film according to said plan view shape of said thin film transistor, said step of patterning including forming a photoresist over said protective film and etching same, a fourth step of removing said protective film from the upper side of said patterned semiconductor thin film to expose said clean surface, and a fifth step of forming an insulating film in contact with said exposed surface of said semiconductor thin film.
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Accused Products
Abstract
A thin film transistor has a laminated structure comprising a semiconductor thin film, a gate insulator formed in contact with the surface of the semiconductor thin film, and a gate electrode disposed on the face side of the semiconductor thin film, and is formed on a substrate in a predetermined plan view shape. To fabricate the thin film transistor, first, a first step is carried out in which a semiconductor thin film having a clean surface is formed over the substrate. Next, a second step is carried out in which a protective film PF is formed so as to cover the clean surface of the semiconductor thin film. Further, in a third step, the semiconductor thin film is patterned together with the protective film PF according to the predetermined plan view shape of the thin film transistor. Thereafter, a fourth step is carried out in which the protective film PF is removed from the upper side of the patterned semiconductor thin film to expose a clean surface. Subsequently, a fifth step is carried out in which a gate insulator is formed in contact with the exposed surface of the semiconductor thin film.
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Citations
20 Claims
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1. A method of producing a liquid crystal display device comprising a pair of substrates jointed to each other with a gap therebetween, a liquid crystal disposed in said gap, pixel electrodes and thin film transistors for driving said pixel electrodes provided on one of said substrates, wherein
said thin film transistor has a laminated structure comprising a semiconductor thin film, an insulating film provided in contact with the surface of said semiconductor thin film, and a gate electrode disposed on the face side or the back side of said semiconductor thin film, and said thin film transistor is formed on one of said substrates in a predetermined plan view shape by: -
a first step for forming a semiconductor thin film having a clean surface over a substrate, a second step of forming a protective film so as to cover said clean surface of said semiconductor thin film, a third step of patterning said semiconductor thin film together with said protective film according to said plan view shape of said thin film transistor, said step of patterning including forming a photoresist over said protective film and etching same, a fourth step of removing said protective film from the upper side of said patterned semiconductor thin film to expose said clean surface, and a fifth step of forming an insulating film in contact with said exposed surface of said semiconductor thin film. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A liquid crystal display device comprising a pair of substrates jointed to each other with a gap therebetween, a liquid crystal disposed in said gap, pixel electrodes and thin film transistors for driving said pixel electrodes provided on one or said substrates, and a counter electrode provided on the other of said substrates, wherein
said thin film transistor has a laminated structure comprising a semiconductor thin film, an insulating film formed in contact with the surface of said semiconductor thin film, and a gate electrode disposed on the face side or the back side of said semiconductor thin film, and is formed on one of said substrates in a predetermined plan view shape, said semiconductor thin film is provided by forming a semiconductor thin film over said substrate in the state of having a clean surface, thereafter forming a protective film so as to cover said clean surface, then pattering said semiconductor thin film together with said protective film according to said predetermined plan view shape, and removing said protective film to expose said clean surface, said patterning including forming a photoresist over said protective film and etching same, and said insulating film is formed in contact with said exposed surface of said semiconductor thin film.
Specification