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Method of fabricating a thin film including a protective layer as a mask

  • US 6,599,783 B2
  • Filed: 05/24/2001
  • Issued: 07/29/2003
  • Est. Priority Date: 05/25/2000
  • Status: Expired due to Fees
First Claim
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1. A method of producing a liquid crystal display device comprising a pair of substrates jointed to each other with a gap therebetween, a liquid crystal disposed in said gap, pixel electrodes and thin film transistors for driving said pixel electrodes provided on one of said substrates, whereinsaid thin film transistor has a laminated structure comprising a semiconductor thin film, an insulating film provided in contact with the surface of said semiconductor thin film, and a gate electrode disposed on the face side or the back side of said semiconductor thin film, and said thin film transistor is formed on one of said substrates in a predetermined plan view shape by:

  • a first step for forming a semiconductor thin film having a clean surface over a substrate, a second step of forming a protective film so as to cover said clean surface of said semiconductor thin film, a third step of patterning said semiconductor thin film together with said protective film according to said plan view shape of said thin film transistor, said step of patterning including forming a photoresist over said protective film and etching same, a fourth step of removing said protective film from the upper side of said patterned semiconductor thin film to expose said clean surface, and a fifth step of forming an insulating film in contact with said exposed surface of said semiconductor thin film.

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