Sliding seal

• US 6,600,547 B2
• Filed: 09/24/2001
• Issued: 07/29/2003
• Est. Priority Date: 09/24/2001
• Status: Expired due to Fees

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Phillips, Alton Hugh, Watson, Douglas C.
• Primary Examiner(s): Adams, Russell
• Assistant Examiner(s): ESPLIN, DAVID B
• Application Number:
  US09/962,963
• Publication Number:
  US 20030058426A1
• Time in Patent Office: 673 Days
• Field of Search: 355/73, 355/30, 277/390, 277/394, 277/395, 277/408, 277/500, 277/549, 277/552
• US Class Current: 355/30
• CPC Class Codes: G03B 27/60 using a vacuum or fluid pressure
• CPC Class Codes: G03F 7/70808 Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
• CPC Class Codes: G03F 7/70833 Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A sliding seal system for providing a fluid seal that is slidable in two linear and one rotational degrees-of-freedom and that is flexible in one linear and two rotational degrees-of-freedom is disclosed. The sliding seal system includes a support member having a working surface arranged to provide a seal interface with a sealing surface on a first body. A flexible membrane is attached to the support member and coupled to a second body. A fluid supply system is provided to deliver a fluid to a region between the working surface of the support member and the sealing surface of the first body to provide buoyant flotation to the seal support member at the working surface. In a preferred embodiment, a fluid exhaust system is also provided to remove the fluid delivered by the fluid supply system. One particularly useful application of the described sliding seal system is in a photolithography system to provide a seal between an exposure apparatus and a wafer chamber.

Claims

1. A sliding seal system that provides a seal between first and second bodies, the sliding seal system comprising:

a support member having a working surface arranged to provide a seal interface with a sealing surface on the first body;

a membrane attached to the support member, and coupled to the second body; and

a fluid supply system that delivers a fluid to a region between the working surface of the support member and the sealing surface of the first body to provide buoyant floatation to the support member at the working surface.

2. A sliding seal system as recited in claim 1 further comprising a fluid exhaust system for removing fluid delivered by the fluid supply system.

3. A sliding seal system as recited in claim 2 wherein the fluid supply system includes a fluid delivery passage and the fluid exhaust system includes a fluid exhaust passage, wherein the fluid exhaust passage is designed to remove fluid delivered through the fluid delivery passage, the fluid supply and exhaust passages being incorporated into at least one of the first body and the support member.

4. A sliding seal system as recited in claim 1 wherein the fluid supply system is at least partially incorporated into the first body.

5. A sliding seal system as recited in claim 1 wherein the fluid supply system is at least partially incorporated into the support member.

6. A sliding seal system as recited in claim 2 wherein:

the fluid supply system includes interior and exterior fluid delivery passages arranged to deliver different fluids to the region between the working surface of the support member and the sealing surface of the first body; and

the fluid exhaust system includes interior and exterior fluid exhaust passages, wherein the interior fluid exhaust passage is designed to remove fluid delivered through the interior fluid delivery passage and the exterior fluid exhaust passage is designed to remove fluid delivered through the exterior fluid delivery passage.

7. A sliding seal system as recited in claim 1 further comprising a fluid distribution channel formed in one of the working surface of the support member and the sealing surface of the first body, the fluid distribution channel distributing the fluid along the region between the working surface of the support member and the sealing surface of the first body.

8. A sliding seal system as recited in claim 2 wherein the fluid supply system includes a first fluid distribution channel and the fluid exhaust system includes a second fluid distribution channel, the first and second distribution channels being formed in one of the working surface of the support member and the sealing surface of the first body.

9. A sliding seal system as recited in claim 1 wherein:

the support member includes a first fixing member and a second fixing member that includes the working surface; and

the membrane is interposed between the first and second fixing members.

10. A sliding seal system as recited in claim 9 wherein the fluid supply system is at least partially incorporated into the second fixing member.

19. A sliding seal system as recited in claim 2 wherein:

the fluid supply system includes first and second delivery passages arranged to deliver the fluid to the region; and

the fluid exhaust system includes a first and second exhaust passages, wherein the first exhaust passage is designed to remove fluid delivered through the first fluid delivery passage and the second exhaust passage is designed to remove fluid delivered through the second fluid delivery passage.

26. An exposure apparatus comprising the sliding seal system of claim 1.

27. A sliding seal system as recited in claim 1 further comprising a fluid distribution channel formed in the working surface of the support member, the fluid distribution channel distribution the fluid along the region between the working surface of the support member and the sealing surface of the first body.

28. A sliding seal system as recited in claim 2 wherein the fluid supply system includes a first fluid distribution channel and the fluid exhaust system includes a second fluid distribution channel, the first and second distribution channels being formed in the working surface of the support member.

11. A sliding seal system for use in a photolithography system to provide a seal between an exposure apparatus and a chamber, the sliding seal system comprising:

a support member having a working surface arranged to provide a seal interface with a sealing surface on the chamber;

a membrane attached to the support member, and coupled to the exposure apparatus;

interior and exterior fluid delivery systems for delivering first and second fluids to a region between the working surface and sealing surface to provide buoyant floatation for the support member; and

interior and exterior fluid exhaust systems, wherein the interior fluid exhaust system is designed to remove the first fluid delivered through the interior fluid delivery system and the exterior fluid exhaust system is designed to remove the second fluid delivered through the exterior fluid delivery system.

12. A sliding seal system as recited in claim 11 wherein the interior and exterior fluid delivery systems and the interior and exterior fluid exhaust system each include fluid delivery passages incorporated into walls of the chamber.

13. A sliding seal system as recited in claim 11 wherein the interior and exterior fluid delivery systems and the interior and exterior fluid exhaust systems each include fluid delivery passages incorporated into the support member.

14. A sliding seal system as recited in claim 13 wherein:

the support member includes a first fixing member and a second fixing member, wherein the second fixing member is positioned adjacent the sealing surface of the chamber;

the membrane is interposed between the first and second fixing members; and

the fluid delivery passages are incorporated into the second fixing member.

15. A sliding seal system as recited in claim 14 wherein no adhesive is used to attach the membrane to the support member.

16. A sliding seal system as recited in claim 12 wherein the membrane is attached to a bottom surface of the support member with an adhesive such that the adhesive is applied exterior to chamber so that any out-gassing from the adhesive occurs outside the chamber.

17. A sliding seal system as recited in claim 11 wherein the interior and exterior fluid delivery systems and the interior and exterior fluid exhaust systems each include fluid distribution channels incorporated into the sealing surface of the chamber.

18. A sliding seal system as recited in claim 11 wherein the interior and exterior fluid delivery systems and the interior and exterior fluid exhaust systems each include fluid distribution channels incorporated into the working surface of the support member.

20. A lithography system comprising:

an illumination system;

an optical system;

a stage that is moveable relative to the optical system;

an enclosure that surrounds at least a portion of the stage, the enclosure having a sealing surface;

a support member having a working surface arranged to provide a seal interface with the sealing surface on the enclosure;

a membrane attached to the support member, and coupled to the optical system; and

a fluid supply system that delivers a fluid to a region between the working surface of the support member and the sealing surface of the enclosure to provide buoyant floatation to the support member at the working surface,

whereby a sliding seal system is formed that provides a seal between the working surface of the enclosure and the optical system.

21. A lithography system as recited in claim 20 further comprising a fluid exhaust system for removing fluid delivered by the fluid supply system.

22. A lithography system as recited in claim 21 wherein:

the fluid supply system includes first and second delivery passages arranged to deliver the fluid to the region; and

the fluid exhaust system includes a first and second exhaust passages, wherein the first exhaust passage is designed to remove fluid delivered through the first fluid delivery passage and the second exhaust passage is designed to remove fluid delivered through the second fluid delivery passage.

23. A lithography system as recited in claim 21 wherein the fluid supply system includes a fluid delivery passage and the fluid exhaust system includes a fluid exhaust passage, wherein the fluid exhaust passage is designed to remove fluid delivered through the fluid delivery passage, the fluid supply and exhaust passages being incorporated into at least one of the enclosure and the support member.

24. A method for making an object using a lithography process, wherein the lithography process utilizes a lithography system as recited in claim 20.

25. A method for patterning a wafer using a lithography process, wherein the lithography process utilizes a lithography system as recited in claim 20.