Glass substrates coated with a stack of thin layers having reflective properties in the infra-red and/or solar ranges
First Claim
1. A transparent substrate, comprising a stack of thin layers having at least one layer with properties in the infra-red range, which comprises on a carrier substrate in order:
- a) a first undercoating comprising a dielectric material;
b) optionally, a primer metallic coating, the metal thereof being selected from the group consisting of Nb, Ta, Ti, and an alloy of at least two of these metals;
c) at least one layer having properties in the infra-red range; and
d) a second overcoating, comprising dielectric material;
wherein in order to prevent modification of properties of the stack when a carrier substrate thereof is submitted to a thermal treatment of bending or tempering;
i) the first underlying coating comprising dielectric material has at least a first barrier layer for the diffusion of alkaline ions and oxygen; and
ii) the second overcoating comprising dielectric material has at least a second barrier layer for the diffusion of oxygen; and
further wherein iii) an oxide layer is intercalated between the first underlying coating and the layer having properties in the infrared range, and an oxide layer is also intercalated between the layer having properties in the infrared range and the second overcoating;
the first underlying coating and second overcoating being selected from the group consisting of silicon nitride, silicon oxide, aluminum nitride, and silicon oxynitride.
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Accused Products
Abstract
A transparent substrate particularly of glass, provided with a stack of thin layers having at least one metallic layer (4) having properties in the infrared range particularly having low emissivity and two coatings having a base of dielectric material located one (8) under and the other (9) over the layer having properties in the infrared range, as well as a protective metallic layer (5) place immediately over an in contact with the layer having properties in the infrared range, characterized in that in order to prevent the modification of properties of the stack, particularly optical and thermal properties, in the case where the substrate is submitted to a thermal treatment of the tempering or bending kind, firstly the second coating (9) having a base of dielectric material, includes a barrier layer for the diffusion of oxygen chosen from the following materials: components of silicon SiO2, SiOxCy, SiONNy, nitrates such as Si3N4 or AlN, carbides such as SiC, TiC, CrC, TaC of a thickness of at least 10 nanometers and preferably of at least 20 nanometers, and secondly the layer having properties in the infrared range is directly in contact with the underlying dielectric coating.
50 Citations
31 Claims
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1. A transparent substrate, comprising a stack of thin layers having at least one layer with properties in the infra-red range, which comprises on a carrier substrate in order:
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a) a first undercoating comprising a dielectric material;
b) optionally, a primer metallic coating, the metal thereof being selected from the group consisting of Nb, Ta, Ti, and an alloy of at least two of these metals;
c) at least one layer having properties in the infra-red range; and
d) a second overcoating, comprising dielectric material;
wherein in order to prevent modification of properties of the stack when a carrier substrate thereof is submitted to a thermal treatment of bending or tempering;
i) the first underlying coating comprising dielectric material has at least a first barrier layer for the diffusion of alkaline ions and oxygen; and
ii) the second overcoating comprising dielectric material has at least a second barrier layer for the diffusion of oxygen; and
further whereiniii) an oxide layer is intercalated between the first underlying coating and the layer having properties in the infrared range, and an oxide layer is also intercalated between the layer having properties in the infrared range and the second overcoating;
the first underlying coating and second overcoating being selected from the group consisting of silicon nitride, silicon oxide, aluminum nitride, and silicon oxynitride. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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- 8. A transparent substrate, comprising the following stack of thin layers on a carrier substrate:
- 10. A transparent substrate, comprising the following stack of thin layers on a carrier substrate:
- 12. A transparent substrate, comprising the following stack of thin layers on a carrier substrate:
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14. A transparent substrate, comprising a stack of thin layers having at least one layer with properties in the infra-red range, which comprises on a carrier substrate in order:
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a) a first undercoating comprising a dielectric material;
b) an optional primer metallic coating, the metal thereof being selected from the group consisting of Nb, Ta, Ti, and an alloy of at least two of these metals;
c) at least one layer having properties in the infra-red range; and
d) a second overcoating, comprising dielectric material;
wherein in order to prevent modification of properties of the stack when a carrier substrate thereof is submitted to a thermal treatment of bending or tempering;
i) the first underlying coating comprising dielectric material has at least a first barrier layer for the diffusion of alkaline ions and oxygen; and
ii) the second overcoating comprising dielectric material has at least a second barrier layer for the diffusion of oxygen;
wherein the first underlying coating and second overcoating are selected from the group consisting of SiOC, SiC, TiC, CrC and TaC. - View Dependent Claims (15, 16, 17, 18, 19)
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20. A transparent substrate, comprising a stack of thin layers having at least one layer with properties in the infra-red range, which comprises on a carrier substrate in order:
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a) a first undercoating comprising a dielectric material;
b) an optional primer metallic coating, the metal thereof being selected from the group consisting of Nb, Ta, Ti, and an alloy of at least two of these metals;
c) at least one layer having properties in the infra-red range; and
d) a second overcoating, comprising dielectric material;
in order to prevent modification of properties of the stack when a carrier substrate thereof is submitted to a thermal treatment of bending or tempering;
i) the first underlying coating comprising dielectric material has at least a first barrier layer for the diffusion of alkaline ions and oxygen; and
ii) the second overcoating comprising dielectric material has at least a second barrier layer for the diffusion of oxygen;
wherein the first underlying coating and second overcoating are such that one is selected from the group consisting of silicon nitride, silicon oxide, aluminum nitride and silicon oxynitride; and
the other is selected from the group consisting of SiOC, SiC, TiC, CrC and TaC.- View Dependent Claims (21, 22, 23, 24, 25)
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26. A transparent substrate, comprising a stack of thin layers having at least one layer with properties in the infra-red range, which comprises on a carrier substrate in order:
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a) a first undercoating comprising a dielectric material;
b) an optional primer metallic coating, the metal thereof being selected from the group consisting of Nb, Ta, Ti, and an alloy of at least two of these metals;
c) at least one layer having properties in the infra-red range; and
d) a second overcoating, comprising dielectric material;
in order to prevent modification of properties of the stack when a carrier substrate thereof is submitted to a thermal treatment of bending or tempering;
i) the first underlying coating comprising dielectric material has at least a first barrier layer for the diffusion of alkaline ions and oxygen; and
ii) the second overcoating comprising dielectric material has at least a second barrier layer for the diffusion of oxygen;
wherein the first underlying coating and second overcoating are selected from the group consisting of SiOC, SiC, TiC, CrC and TaC; and
wherein the thickness of the barrier layer belonging to the second overcoatin, is at least 10 nm.- View Dependent Claims (27, 28, 29, 30, 31)
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Specification