Calibration method for quantitative elemental analysis

• US 6,603,119 B1
• Filed: 05/09/2000
• Issued: 08/05/2003
• Est. Priority Date: 05/09/2000
• Status: Expired due to Term

• Current Assignee: Bell Semiconductor, LLC (Hilco Inc. (d/b/a Hilco Global))
• Original Assignee: Agere Systems Incorporated (Broadcom, Inc.)
• Inventors: Giannuzzi, Lucille A., Vartuli, Catherine, Stevie, Frederick A.
• Primary Examiner(s): Lee, John R.
• Assistant Examiner(s): Hashmi, Zia R.
• Application Number:
  US09/567,675
• Time in Patent Office: 1,183 Days
• Field of Search: 250/299, 250/282, 250/281, 250/252.1, 250/252.R
• US Class Current: 250/299
• CPC Class Codes: G01N 23/2255 using incident ion beams, e.g. proton beams

Abstract

The present invention provides a method of calibrating an analytical tool. The method, in a illustrative embodiment, includes preparing a calibration standard having a known concentration of an element and obtaining a portion of the calibration standard with a focused beam, wherein the calibration standard is representative of the concentration. The portion of the calibration standard is then used to calibrate an analytical tool.

Claims

1. A method of calibrating an analytical tool, comprising:

preparing a calibration standard having a known concentration of an element;

obtaining a layer of the calibration standard with a focused beam, the layer being representative of the concentration of the element;

providing an analytical tool; and

calibrating the analytical tool with the layer.

2. The method as recited in claim 1 further including obtaining a detection limit of the analytical tool with respect to the concentration.

3. The method as recited in claim 1 wherein preparing a calibration standard includes implanting the calibration standard with a known concentration of the element.

4. The method as recited in claim 3 wherein implanting includes implanting the calibration standard with the element to achieve a concentration of about 1E21 atoms/cm³ of the element.

5. The method as recited in claim 3 wherein implanting the element includes implanting the element by ion implantation.

6. The method as recited in claim 1 wherein preparing a calibration standard includes determining the concentration using secondary ion mass spectrometry (SIMS) or rutherford backscattering spectrometry (RBS).

7. The method as recited in claim 1 wherein obtaining a layer of the calibration standard includes obtaining a layer of the calibration standard with a focused ion beam process.

8. The method as recited in claim 1 wherein obtaining a layer of the calibration standard includes obtaining a layer of the calibration standard with a subatomic particle beam or a laser beam.

9. The method as recited in claim 1 wherein calibrating an analytical tool includes calibrating an analytical tool selected from the group consisting of:

energy dispersive spectrometry (EDS),

microcalorimetry,

auger electron spectroscopy (AES), and

x-ray photoelectron spectroscopy (XPS).

10. The method as recited in claim 1 wherein obtaining a layer includes obtaining a thin layer having a thickness of between about 50 nm and about 5000 nm.

11. The method as recited in claim 10 wherein obtaining a thin layer includes obtaining a thin layer having a length of about 20000 nm and a depth of about 5000 nm.

12. The method as recited in claim 1 further comprising placing the layer in a sample holder, the holder comprising:

a main body having first and second opposing major surfaces, a recess in the first major surface and a main body aperture narrower than the recess and extending from a base of the recess to the second major surface; and

a plug that engages an inner wall of the recess to fix the plug with respect to the main body and fix a grid containing the sample between the base and the plug, the plug having a plug aperture extending therethrough that aligns with the main body aperture to form a path to and through the sample for a beam from a selected one of multiple analytical tools.

13. The method as recited in claim 1 further including determining a detection limit of the analytical tool and wherein preparing a calibration standard includes determining the concentration with a first analytical tool and determining a detection limit of the analytical tool includes determining a detection limit of a second analytical tool.

14. The method as recited in claim 13 wherein the first analytical tool is a secondary ion mass spectrometer and the second analytical tool is selected from the group consisting of:

energy dispersive spectrometry (EDS),

microcalorimetry,

auger electron spectroscopy (AES), and

x-ray photoelectron spectroscopy (XPS).

15. A system for calibrating an analytical tool, comprising:

a first analytical tool capable of determining a concentration of an element located within a calibration standard;

a focused bean apparatus;

a layer extracted from the calibration standard with the focused beam apparatus, the layer being representative of the concentration of the element;

a second analytical tool having a measurement limit of the element less than its concentration, the layer being used to calibrate the second analytical tool.

16. The system as recited in claim 15 wherein the first analytical tool is a secondary ion mass spectrometer (SIMS).

17. The system as recited in claim 15 wherein the calibration standard has a concentration of the element of about 1E21 atoms/cm³ of the element.

18. The system as recited in claim 15 wherein the focused beam apparatus is a focused ion beam apparatus.

19. The system as recited in claim 15 wherein the second analytical tool is selected from the group consisting of:

energy dispersive spectrometry (EDS),

microcalorimetry,

auger electron spectroscopy (AES), and

x-ray photoelectron spectroscopy (XPS).

20. The system as recited in claim 15 wherein the layer is a thin layer having a thickness of between about 50 nm and about 5000 nm.

21. The system as recited in claim 20 wherein the thin layer has a length of about 20000 nm and a depth of about 5000 nm.

22. The system as recited in claim 15 wherein the second analytical tool has a sample holder bay and the system further includes a sample holder configured to hold the calibration standard and cooperatively engage the sample holder bay.

23. The system as recited in claim 22 wherein the sample holder comprises:

a main body having first and second opposing major surfaces, a recess in the first major surface and a main body aperture narrower than the recess and extending from a base of the recess to the second major surface; and

a plug that engages an inner wall of the recess to fix the plug with respect to the main body and fix a grid containing the sample between the base and the plug, the plug having a plug aperture extending therethrough that aligns with the main body aperture to form a path to and through the sample for a beam from a selected one of multiple second analytical tools.