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Nanostructured deposition and devices

  • US 6,610,355 B2
  • Filed: 11/19/2001
  • Issued: 08/26/2003
  • Est. Priority Date: 09/03/1996
  • Status: Expired due to Term
First Claim
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1. A process of deposition comprising:

  • providing a feed comprising from the group consisting of solids and fluids;

    providing a thermal reactor system to produce a vapor from the feed;

    providing a zone to nucleate nanoscale powders from the vapor;

    providing a thermal quench of said nucleated powders at rates of at least 1000°

    C. per second through a converging-diverging nozzle;

    providing a substrate in the diverging section of the nozzle; and

    forming a nanostructured layer over the substrate.

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