Integrated inductor in semiconductor manufacturing

• US 6,614,093 B2
• Filed: 12/11/2001
• Issued: 09/02/2003
• Est. Priority Date: 12/11/2001
• Status: Expired due to Term

• Current Assignee: Bell Semiconductor, LLC (Hilco Inc. (d/b/a Hilco Global))
• Original Assignee: LSI Logic Corporation (Broadcom, Inc.)
• Inventors: Cole, Richard, Von Thun, Matthew, Ott, George
• Primary Examiner(s): Eckert, George
• Application Number:
  US10/013,572
• Publication Number:
  US 20030109118A1
• Time in Patent Office: 630 Days
• Field of Search: 257/531, 257/10, 257/11, 336/200, 336/225, 361/765, 361/777, 361/782
• US Class Current: 257/531
• CPC Class Codes: H01F 17/0033 with the coil helically wound around a magnetic core
• CPC Class Codes: H01F 41/043 by thick film techniques
• CPC Class Codes: H01L 23/5227 Inductive arrangements or effects of, or between, wiring layers other inductive arrangements H01L23/645
• CPC Class Codes: H01L 23/645 Inductive arrangements H01L23/647, H01L23/66 take precedence
• CPC Class Codes: H01L 27/08 including only semiconductor components of a single kind
• CPC Class Codes: H01L 28/10 Inductors
• CPC Class Codes: H01L 2924/00 Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
• CPC Class Codes: H01L 2924/0002 Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Abstract

An integrated inductor is formed on an integrated circuit or other substrate. The inductor is formed of a stack of almost totally enclosed rings of conductive material in which each ring has a single gap. Vias connect adjacent rings on opposite sides of their gaps so as to form a coil shaped structure. The inductor has applications in filtering, in an oscillator, in an antenna, combined with an active detection circuit, combined with an electron source, in a microelectromechanial systems or MEMS, or the like. The inductor may be formed in a vertical orientation or in a horizontal orientation. Chemical mechanical polishing may be used for planarizing layers.

Claims

1. A device for providing a narrow and highly controlled beam of electrons, comprising:

a substrate;

an inductor formed on the substrate, the inductor having a plurality of rings of conductive material, each of the plurality of rings separated from others of the plurality of rings by one or more solid dielectric layers, each of the plurality of rings having a perimeter and a single gap along the perimeter, adjacent ones of the plurality of rings being interconnected by one or more interconnection elements so as to approximately form a coil shape, the inductor having a first end and a second end, the inductor having a cavity throughout a length of the inductor, the cavity containing air only; and

an electron source at the first end of the inductor, the electron source emitting electrons that form a beam controlled by the inductor.

2. The device for providing a narrow and highly controlled beam of electrons of claim 1, the interconnection elements extending generally perpendicularly with respect to a major planar extension of one of the plurality of rings.

3. The device for providing a narrow and highly controlled beam of electrons of claim 1, the interconnection elements extending at a slant with respect to a major planar extension of one of the plurality of rings.

4. The device for providing a narrow and highly controlled beam of electrons of claim 1, wherein at least one of the one or more solid dielectric layers is a nitride material.

5. The device for providing a narrow and highly controlled beam of electrons of claim 1, wherein at least one of the one or more solid dielectric layers is an organic tetraethyl-oxysilane.

6. The device for providing a narrow and highly controlled beam of electrons of claim 1, wherein a longitudinal axis of the inductor is oriented vertically with respect to a major plane of extension of the substrate.

7. The device for providing a narrow and highly controlled beam of electrons of claim 1, wherein a longitudinal axis of the inductor is oriented horizontally with respect to a major plane of extension of the substrate.

8. The device for providing a narrow and highly controlled beam of electrons of claim 1, wherein the rings of conductive material are formed from at least one of the group consisting of nickel, molybdenum, indium tin oxide, tantalum, tungsten, gold, copper, doped polysilicon, silicide, or silver.

9. The device for providing a narrow and highly controlled beam of electrons of claim 1, wherein each of the rings is formed of a bottom conductive segment, an intermediate conductive segment, and a top conductive segment.

10. The device for providing a narrow and highly controlled beam of electrons of claim 9, wherein the intermediate conductive element includes two plugs in contact with each other.

11. The device for providing a narrow and highly controlled beam of electrons of claim 1, wherein the rings are generally circular.

12. The device for providing a narrow and highly controlled beam of electrons of claim 1, wherein the rings are generally rectangular.

13. A tuneable charge detector, comprising:

a substrate;

an inductor formed on the substrate, the inductor having a plurality of rings of conductive material, each of the plurality of rings separated from others of the plurality of rings by one or more solid dielectric layers, each of the plurality of rings having a perimeter and a single gap along the perimeter, adjacent ones of the plurality of rings being interconnected by one or more interconnection elements so as to approximately form a coil shape, the inductor having a first end and a second end, the inductor having a cavity throughout a length of the inductor, the cavity containing air only; and

a detector at the first end of the inductor, the detector detecting charged particles guided by the inductor.

14. The tuneable charge detector of claim 13, the detector being a silicon PN junction.

15. The tuneable charge detector of claim 13, the interconnection elements extending generally perpendicularly with respect to a major planar extension of one of the plurality of rings.

16. The tuneable charge detector of claim 13, the interconnection elements extending at a slant with respect to a major planar extension of one of the plurality of rings.

17. The tuneable charge detector of claim 13, wherein at least one of the one or more solid dielectric layers is a nitride material.

18. The tuneable charge detector of claim 13, wherein at least one of the one or more solid dielectric layers is an organic tetraethyl-oxysilane.

19. The tuneable charge detector of claim 13, wherein a longitudinal axis of the inductor is oriented vertically with respect to a major plane of extension of the substrate.

20. The tuneable charge detector of claim 13, wherein a longitudinal axis of the inductor is oriented horizontally with respect to a major plane of extension of the substrate.

21. The tuneable charge detector of claim 13, wherein the rings of conductive material are formed from at least one of the group consisting of nickel, molybdenum, indium tin oxide, tantalum, tungsten, gold, copper, doped polysilicon, silicide, or silver.

22. The tuneable charge detector of claim 13, wherein each of the rings is formed of a bottom conductive segment, an intermediate conductive segment, and a top conductive segment.

23. The tuneable charge detector of claim 22, wherein the intermediate conductive element includes two plugs in contact with each other.

24. The tuneable charge detector of claim 13, wherein the rings are generally circular.

25. The tuneable charge detector of claim 13, wherein the rings are generally rectangular.

26. An intertwined inductor pair, comprising, in the following order:

a first ring having a first conductive segment;

a second ring having a second conductive segment;

a third ring having a third conductive segment;

a fourth ring having a fourth conductive segment, the first, second, third, and fourth conductive segments being disposed on a same layer on a substrate, extending principally in a first direction, being parallel to each other, and being arranged spaced apart in a second direction substantially perpendicular to the first direction, each of the first, second, third, and fourth rings extending in a third direction substantially perpendicular to the second direction, each of the first, second, third, and fourth rings having a gap,

wherein the first and the third rings are electrically connected by a first interconnection element to form a first inductor and the second and fourth rings are electrically connected by a second interconnection element to form a second inductor, the first and second inductors being electrically isolated from each other.

27. The intertwined inductor pair of claim 26, wherein the first and second interconnection elements extend in the second direction.

28. The intertwined inductor pair of claim 26, wherein the first and second interconnection elements extend at a non-zero angle with respect to the second direction.

29. An inductor formed in a substrate, comprising:

a plurality of conductive segments forming the inductor, the inductor having a longitudinal axis that substantially extends in parallel with a plane of major extension of a substrate upon which the inductor is formed,

the plurality of conductive segments including a first L shaped conductive segment having a major extension perpendicular to the longitudinal axis of the inductor and a minor extension in a direction parallel to the longitudinal axis of the inductor,

the plurality of conductive segments including a second L shaped conductive segment having a major extension perpendicular to the longitudinal axis of the inductor and a minor extension in a direction parallel to the longitudinal axis of the inductor,

wherein the first and second L shaped conductive segments lie within a same plane and the minor extensions of the first and second L shaped conductive segments are on opposing sides of the inductor.

30. The inductor of claim 29, wherein the minor extension of the second L shaped conductive segment extends toward the major extension of the first conductive segment and the minor extension of the first L shaped conductive segment extends toward the major extension of the second conductive segment.

31. The inductor of claim 29, wherein the minor extension of the second L shaped conductive segment extends away from the major extension of the first conductive segment and the minor extension of the first L shaped conductive segment extends toward the major extension of the second conductive segment.

32. The inductor of claim 29, wherein the first L shaped conductive segment is disposed adjacent to an I shaped rectangular conductive segment and the I shaped rectangular conductive segment is disposed adjacent to the second L shaped conductive segment.

33. The inductor of claim 29, wherein the inductor includes two plugs of conductive material in contact in a direction perpendicular to the plane of major extension of the substrate.

34. The inductor of claim 29, further comprising one or more dielectric layers over the first and second L shaped conductors and a rectangular conductive segment disposed over the one or more dielectric layers, the rectangular conductive segment electrically connecting the first and second L shaped conductors.

35. The inductor of claim 34, wherein the rectangular conductive segment is electrically connected to the first and second L shaped conductors through plugs of conductive material disposed within the one or more dielectric layers.

36. An inductor formed in a substrate, comprising:

a plurality of conductive segments forming the inductor, the inductor having a longitudinal axis that substantially extends in parallel with a plane of major extension of a substrate upon which the inductor is formed,

the plurality of conductive segments including a first L shaped conductive segment having a major extension perpendicular to the longitudinal axis of the inductor and a minor extension in a direction parallel to the longitudinal axis of the inductor,

the plurality of conductive segments including a second L shaped conductive segment having a major extension perpendicular to the longitudinal axis of the inductor and a minor extension in a direction parallel to the longitudinal axis of the inductor,

wherein the first and second L shaped conductive segments are disposed in different parallel planes,

wherein the minor extension of the second L shaped conductive segment extends toward the major extension of the first conductive segment and the minor extension of the first L shaped conductive segment extends toward the major extension of the second conductive segment.

37. The inductor of claim 36, wherein the minor extension of the second L shaped conductive segment extends away from the major extension of the first conductive segment and the minor extension of the first L shaped conductive segment extends toward the major extension of the second conductive segment.

38. The inductor of claim 36, wherein the minor extensions of the first and second L shaped conductive segments are on opposing sides of the inductor.

39. An inductor having a conductive core, comprising:

an inductor formed within a substrate, the inductor having a longitudinal axis extending substantially in parallel to the major plane of extension of the substrate, the inductor formed of conductive substantially rectangular segments and plugs of conductive material, the inductor having a bottom layer of substantially parallel conductive segments, a top layer of substantially parallel conductive segments, and two or more plugs of conductive material in physical contact with each other for electrically connecting each one of the substantially parallel conductive segments of the top layer to a corresponding one of the substantially parallel conductive segments of the bottom layer;

one or more dielectric layers formed between the bottom and top layers of substantially parallel conductive segments; and

a conductive core disposed along the longitudinal axis of the inductor and disposed within the one or more dielectric layers.

40. The inductor of claim 39, wherein the conductive core is formed of at least one of the group consisting of copper, gold, and a ferromagnetic material.

41. The inductor of claim 40, wherein the core of conductive material is encapsulated using a damascene process.

42. The inductor of claim 41, wherein the substantially parallel conductive segments of the top layer are not parallel to the substantially parallel conductive segments of the bottom layer.

43. The inductor of claim 42, wherein the one or more dielectric layers includes a nitride material.